Kiyoshi Ishikawa

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Process for preparing chemical liquid of silylating agent and surfa...
- Patent number 9,868,090
- Issue date Jan 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for forming resist pattern
- Patent number 9,405,199
- Issue date Aug 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Mai Sugawara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,865,395
- Issue date Oct 21, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Analog-to-digital converter and correction method thereof
- Patent number 8,378,863
- Issue date Feb 19, 2013
- Fujitsu Limited
- Kiyoshi Ishikawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Application liquid and method for formation of a silica-based coati...
- Patent number 8,323,745
- Issue date Dec 4, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tokonori Yamadaya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming pattern, and material for forming coating film
- Patent number 8,124,312
- Issue date Feb 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming fine patterns
- Patent number 8,043,798
- Issue date Oct 25, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Digital-to-analog converter and successive approximation type analo...
- Patent number 8,035,542
- Issue date Oct 11, 2011
- Fujitsu Limited
- Kiyoshi Ishikawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Successive approximation analog-digital converter circuit using cap...
- Patent number 7,969,343
- Issue date Jun 28, 2011
- Fujitsu Limited
- Kiyoshi Ishikawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Pattern coating material and pattern forming method
- Patent number 7,932,013
- Issue date Apr 26, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,727,701
- Issue date Jun 1, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma Hojo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of formation of resist patterns
- Patent number 7,524,604
- Issue date Apr 28, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and method for forming resist pattern
- Patent number 7,449,276
- Issue date Nov 11, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma Hojo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Printed wiring board with improved impedance matching
- Patent number 7,183,491
- Issue date Feb 27, 2007
- Fujitsu Limited
- Kiyoshi Ishikawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electron beam negative working resist composition
- Patent number 6,153,354
- Issue date Nov 28, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiko Katsumata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 6,087,068
- Issue date Jul 11, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 6,083,665
- Issue date Jul 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-amplification-type negative resist composition
- Patent number 6,042,988
- Issue date Mar 28, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-amplification-type negative resist composition and method...
- Patent number 5,955,241
- Issue date Sep 21, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image forming apparatus and image forming method used in the same
- Patent number 5,953,134
- Issue date Sep 14, 1999
- Fuji Xerox Co., Ltd.
- Akihiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 5,939,510
- Issue date Aug 17, 1999
- Tokyo Ohka Kogya Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-sensitization photoresist composition com...
- Patent number 5,928,837
- Issue date Jul 27, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 5,925,495
- Issue date Jul 20, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithography
- Patent number 5,908,738
- Issue date Jun 1, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 5,902,713
- Issue date May 11, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compact image formation apparatus facilitating jam removal
- Patent number 5,797,068
- Issue date Aug 18, 1998
- Fuji Xerox Co., Ltd.
- Naohito Otsuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 5,789,136
- Issue date Aug 4, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithography
- Patent number 5,756,255
- Issue date May 26, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 5,700,625
- Issue date Dec 23, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Paper feed cassette
- Patent number 4,826,147
- Issue date May 2, 1989
- Rank Xerox Limited
- Satoshi Shino
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL

Patents Applicationslast 30 patents

Information Patent Application
PROCESS FOR PREPARING CHEMICAL LIQUID OF SILYLATING AGENT AND SURFA...
- Publication number 20160279578
- Publication date Sep 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi ISHIKAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR FORMING RESIST PATTERN
- Publication number 20150044617
- Publication date Feb 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Mai Sugawara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130017501
- Publication date Jan 17, 2013
- TOKYO OHKA KOGYO CO., LTD.
- Tsuyoshi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALOG-TO-DIGITAL CONVERTER AND CORRECTION METHOD THEREOF
- Publication number 20110215956
- Publication date Sep 8, 2011
- FUJITSU LIMITED
- Kiyoshi Ishikawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
MATERIAL FOR FORMING PROTECTIVE FILM AND METHOD FOR FORMING PHOTORE...
- Publication number 20110065053
- Publication date Mar 17, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki YOSHIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DIGITAL-TO-ANALOG CONVERTER AND SUCCESSIVE APPROXIMATION TYPE ANALO...
- Publication number 20100259432
- Publication date Oct 14, 2010
- FUJITSU LIMITED
- Kiyoshi Ishikawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
FINE PATTERN FORMING METHOD AND COAT FILM FORMING MATERIAL
- Publication number 20100255429
- Publication date Oct 7, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPLICATION LIQUID AND METHOD FOR FORMATION OF A SILICA-BASED COATI...
- Publication number 20100247799
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tokunori YAMADAYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ANALOG-TO-DIGITAL CONVERTER CIRCUIT
- Publication number 20100176983
- Publication date Jul 15, 2010
- FUJITSU LIMITED
- Kiyoshi Ishikawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPAT...
- Publication number 20100090372
- Publication date Apr 15, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM
- Publication number 20100035177
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING COMPOSITION FOR NANOIMPRINTING AND METHOD FOR PATTERN...
- Publication number 20090263631
- Publication date Oct 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshinori Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-D...
- Publication number 20090155546
- Publication date Jun 18, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PATTERN COATING MATERIAL AND PATTERN FORMING METHOD
- Publication number 20090029284
- Publication date Jan 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive Resist Composition and Method of Forming Resist Pattern
- Publication number 20080241747
- Publication date Oct 2, 2008
- TOKYO OHKA KOGYO CO., LTD.
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and method for forming resist pattern
- Publication number 20070042288
- Publication date Feb 22, 2007
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of formation of resist patterns
- Publication number 20060247346
- Publication date Nov 2, 2006
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming resist pattern and resist pattern
- Publication number 20060127799
- Publication date Jun 15, 2006
- Naotaka Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20060063102
- Publication date Mar 23, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Naotaka Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Printed wiring board
- Publication number 20040144562
- Publication date Jul 29, 2004
- FUJITSU LIMITED
- Kiyoshi Ishikawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of forming fine patterns
- Publication number 20040104196
- Publication date Jun 3, 2004
- Tsuyoshi Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kiyoshi Ishikawa

Person

Patents Grantslast 30 patents

Process for preparing chemical liquid of silylating agent and surfa...

Method for forming resist pattern

Method of forming resist pattern

Analog-to-digital converter and correction method thereof

Application liquid and method for formation of a silica-based coati...

Method for forming pattern, and material for forming coating film

Method of forming fine patterns

Digital-to-analog converter and successive approximation type analo...

Successive approximation analog-digital converter circuit using cap...

Pattern coating material and pattern forming method

Positive resist composition and method of forming resist pattern

Positive resist composition and method of formation of resist patterns

Positive photoresist composition and method for forming resist pattern

Printed wiring board with improved impedance matching

Electron beam negative working resist composition

Undercoating composition for photolithographic resist

Photoresist laminate and method for patterning using the same

Chemical-amplification-type negative resist composition

Chemical-amplification-type negative resist composition and method...

Image forming apparatus and image forming method used in the same

Undercoating composition for photolithographic resist

Negative-working chemical-sensitization photoresist composition com...

Photoresist laminate and method for patterning using the same

Undercoating composition for photolithography

Chemical-sensitization photoresist composition

Compact image formation apparatus facilitating jam removal

Negative-working photoresist composition

Undercoating composition for photolithography

Negative-working photoresist composition

Paper feed cassette

Patents Applicationslast 30 patents

PROCESS FOR PREPARING CHEMICAL LIQUID OF SILYLATING AGENT AND SURFA...

METHOD FOR FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

ANALOG-TO-DIGITAL CONVERTER AND CORRECTION METHOD THEREOF

MATERIAL FOR FORMING PROTECTIVE FILM AND METHOD FOR FORMING PHOTORE...

DIGITAL-TO-ANALOG CONVERTER AND SUCCESSIVE APPROXIMATION TYPE ANALO...

FINE PATTERN FORMING METHOD AND COAT FILM FORMING MATERIAL

APPLICATION LIQUID AND METHOD FOR FORMATION OF A SILICA-BASED COATI...

ANALOG-TO-DIGITAL CONVERTER CIRCUIT

COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPAT...

METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM

FILM FORMING COMPOSITION FOR NANOIMPRINTING AND METHOD FOR PATTERN...

FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-D...

PATTERN COATING MATERIAL AND PATTERN FORMING METHOD

Positive Resist Composition and Method of Forming Resist Pattern

Positive photoresist composition and method for forming resist pattern

Positive resist composition and method of formation of resist patterns

Method for forming resist pattern and resist pattern

Positive resist composition

Printed wiring board

Method of forming fine patterns