Koichiro Inazawa

Person

Peabody, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for multilayer photoresist dry development
- Patent number 8,048,325
- Issue date Nov 1, 2011
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-pressure removal of photoresist and etch residue
- Patent number 7,700,494
- Issue date Apr 20, 2010
- Tokyo Electron Limited, Inc.
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 7,517,468
- Issue date Apr 14, 2009
- Tokyo Electron Limited
- Shuhei Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for multilayer photoresist dry development
- Patent number 7,344,991
- Issue date Mar 18, 2008
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Low-pressure removal of photoresist and etch residue
- Patent number 7,344,993
- Issue date Mar 18, 2008
- Tokyo Electron Limited, Inc.
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 7,285,498
- Issue date Oct 23, 2007
- Tokyo Electron Limited
- Kazuto Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 7,119,011
- Issue date Oct 10, 2006
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for multilayer photoresist dry development
- Publication number 20080128388
- Publication date Jun 5, 2008
- TOKYO ELECTRON LIMITED
- Vaidyanathan BALASUBRAMANIAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-pressure removal of photoresist and etch residue
- Publication number 20060154486
- Publication date Jul 13, 2006
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low-pressure removal of photoresist and etch residue
- Publication number 20060144817
- Publication date Jul 6, 2006
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etching method
- Publication number 20060118517
- Publication date Jun 8, 2006
- TOKYO ELECTRON LIMITED
- Shuhei Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for removing photoresist from a substrate
- Publication number 20050136681
- Publication date Jun 23, 2005
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for etching an organic layer
- Publication number 20050136666
- Publication date Jun 23, 2005
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method
- Publication number 20050085077
- Publication date Apr 21, 2005
- Kazuto Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20040256726
- Publication date Dec 23, 2004
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for bilayer photoresist dry development
- Publication number 20040185380
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Yoshiki Igarashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for multilayer photoresist dry development
- Publication number 20040180269
- Publication date Sep 16, 2004
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Koichiro Inazawa

Person

Patents Grantslast 30 patents

Method and apparatus for multilayer photoresist dry development

Low-pressure removal of photoresist and etch residue

Etching method

Method and apparatus for multilayer photoresist dry development

Low-pressure removal of photoresist and etch residue

Etching method

Semiconductor device and manufacturing method thereof

Patents Applicationslast 30 patents

Method and apparatus for multilayer photoresist dry development

Low-pressure removal of photoresist and etch residue

Low-pressure removal of photoresist and etch residue

Etching method

Method and apparatus for removing photoresist from a substrate

Method and apparatus for etching an organic layer

Etching method

Semiconductor device and manufacturing method thereof

Method and apparatus for bilayer photoresist dry development

Method and apparatus for multilayer photoresist dry development