Koji Kuwana

Person

Fujiidera-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition comprising a quinone diazide sulfonic a...
- Patent number 5,413,895
- Issue date May 9, 1995
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition comprising a quinone diazide sulfonic diester an...
- Patent number 5,378,586
- Issue date Jan 3, 1995
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, novel phenol compound and quinone diazide sulfo...
- Patent number 5,290,656
- Issue date Mar 1, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing radiation sensitive compound and positive res...
- Patent number 5,283,324
- Issue date Feb 1, 1994
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition containing alkali-soluble resin an...
- Patent number 5,124,228
- Issue date Jun 23, 1992
- Sumitomo Chemical Co., Ltd.
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing a positive resist composition by mixing the c...
- Patent number 5,080,997
- Issue date Jan 14, 1992
- Sumitomo Chemical Company, Limited
- Takeshi Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition containing quinone diazide sulfonic aci...
- Patent number 5,059,507
- Issue date Oct 22, 1991
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Chemically amplified resist composition
- Publication number 20060073411
- Publication date Apr 6, 2006
- Sumitomo Chemical Company, Limited
- Satoshi Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20030180659
- Publication date Sep 25, 2003
- Yoshiyuki Takata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Koji Kuwana

Person

Patents Grantslast 30 patents

Positive resist composition comprising a quinone diazide sulfonic a...

Resist composition comprising a quinone diazide sulfonic diester an...

Resist composition, novel phenol compound and quinone diazide sulfo...

Process for preparing radiation sensitive compound and positive res...

Positive photoresist composition containing alkali-soluble resin an...

Process for preparing a positive resist composition by mixing the c...

Positive resist composition containing quinone diazide sulfonic aci...

Patents Applicationslast 30 patents

Chemically amplified resist composition

Resist composition