Kristin Schupke

Person

Weixdorf, DE

People

Patents Grantslast 30 patents

Information Patent Grant
NiSi rework procedure to remove platinum residuals
- Patent number 8,835,298
- Issue date Sep 16, 2014
- GLOBALFOUNDRIES Inc.
- Sivakumar Kumarasamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HNO3 single wafer clean process to strip nickel and for MOL post etch
- Patent number 8,835,318
- Issue date Sep 16, 2014
- GLOBALFOUNDRIES Inc.
- Clemens Fitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a capacitor
- Patent number 7,863,149
- Issue date Jan 4, 2011
- Qimonda AG
- Srivatsa Kundalgurki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a capacitor structure
- Patent number 7,615,444
- Issue date Nov 10, 2009
- Qimonda AG
- Odo Wunnicke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon anisotropically
- Patent number 7,479,461
- Issue date Jan 20, 2009
- Infineon Technologies AG
- Teng-Wang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer gate stack structure comprising a metal layer for a FET...
- Patent number 7,078,748
- Issue date Jul 18, 2006
- Infineon Technologies AG
- Matthias Goldbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a contact hole plane in a memory module
- Patent number 7,018,781
- Issue date Mar 28, 2006
- Infineon Technologies, AG
- Hans-Georg Fröhlich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bipolar transistor and method of producing same
- Patent number 7,005,723
- Issue date Feb 28, 2006
- Infineon Technologies AG
- Armin Tilke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a cavity in a monocrystalline silicon substrat...
- Patent number 6,821,863
- Issue date Nov 23, 2004
- Infineon Technologies AG
- Martin Popp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process for recessing polysilicon in trench structures
- Patent number 6,740,595
- Issue date May 25, 2004
- Infineon Technologies AG
- Stephan Kudelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a trench capacitor for a semiconductor memory
- Patent number 6,734,077
- Issue date May 11, 2004
- Infineon Technologies AG
- Matthias Förster
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HNO3 SINGLE WAFER CLEAN PROCESS TO STRIP NICKEL AND FOR MOL POST ETCH
- Publication number 20130234335
- Publication date Sep 12, 2013
- GLOBALFOUNDRIES INC.
- Clemens Fitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NISI REWORK PROCEDURE TO REMOVE PLATINUM RESIDUALS
- Publication number 20130234213
- Publication date Sep 12, 2013
- GLOBALFOUNDRIES INC.
- Sivakumar KUMARASAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of producing a semiconductor structure
- Publication number 20080230839
- Publication date Sep 25, 2008
- Joern Regul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure in a substrate for the manufacturing of a semiconductor d...
- Publication number 20080009139
- Publication date Jan 10, 2008
- Thomas Hecht
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method for forming a capacitor structure and a capacitor structure
- Publication number 20080003740
- Publication date Jan 3, 2008
- Odo Wunnicke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a groove-like structure in a semiconductor de...
- Publication number 20070212849
- Publication date Sep 13, 2007
- Frank Ludwig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wet Treatment of Hafnium Containing Materials
- Publication number 20070141850
- Publication date Jun 21, 2007
- Audrey Dupont
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Solution for wet treatment of hafnium containing materials, use of...
- Publication number 20070012662
- Publication date Jan 18, 2007
- Audrey Dupont
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for fabricating a capacitor
- Publication number 20060079049
- Publication date Apr 13, 2006
- Srivatsa Kundalgurki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER GATE STACK STRUCTURE COMPRISING A METAL LAYER FOR A FET...
- Publication number 20050275046
- Publication date Dec 15, 2005
- Matthias Goldbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching a substrate
- Publication number 20050221620
- Publication date Oct 6, 2005
- Teng-Wang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liner mask for semiconductor applications
- Publication number 20050191564
- Publication date Sep 1, 2005
- Teng-Wang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching silicon anisotropically
- Publication number 20050079714
- Publication date Apr 14, 2005
- Teng-Wang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a contact hole plane in a memory module
- Publication number 20050003308
- Publication date Jan 6, 2005
- Infineon Technologies AG
- Hans-Georg Frohlich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bipolar transistor and method of producing same
- Publication number 20040212045
- Publication date Oct 28, 2004
- Infineon Technologies AG
- Armin Tilke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch process for recessing polysilicon in trench structures
- Publication number 20030194867
- Publication date Oct 16, 2003
- Infineon Technologies North America Corp.
- Stephan Kudelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for producing a cavity in a monocrystalline silicon substrat...
- Publication number 20030136994
- Publication date Jul 24, 2003
- Martin Popp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a semiconductor component
- Publication number 20030114018
- Publication date Jun 19, 2003
- Martin Gutsche
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating a trench capacitor for a semiconductor memory
- Publication number 20030068867
- Publication date Apr 10, 2003
- Matthias Forster
- H01 - BASIC ELECTRIC ELEMENTS

Kristin Schupke

Person

Patents Grantslast 30 patents

NiSi rework procedure to remove platinum residuals

HNO3 single wafer clean process to strip nickel and for MOL post etch

Method for fabricating a capacitor

Method for forming a capacitor structure

Method of etching silicon anisotropically

Multi-layer gate stack structure comprising a metal layer for a FET...

Method for fabricating a contact hole plane in a memory module

Bipolar transistor and method of producing same

Method for producing a cavity in a monocrystalline silicon substrat...

Etch process for recessing polysilicon in trench structures

Method for fabricating a trench capacitor for a semiconductor memory

Patents Applicationslast 30 patents

HNO3 SINGLE WAFER CLEAN PROCESS TO STRIP NICKEL AND FOR MOL POST ETCH

NISI REWORK PROCEDURE TO REMOVE PLATINUM RESIDUALS

Method of producing a semiconductor structure

Structure in a substrate for the manufacturing of a semiconductor d...

Method for forming a capacitor structure and a capacitor structure

Method of fabricating a groove-like structure in a semiconductor de...

Wet Treatment of Hafnium Containing Materials

Solution for wet treatment of hafnium containing materials, use of...

Method for fabricating a capacitor

MULTI-LAYER GATE STACK STRUCTURE COMPRISING A METAL LAYER FOR A FET...

Process for etching a substrate

Liner mask for semiconductor applications

Method of etching silicon anisotropically

Method for fabricating a contact hole plane in a memory module

Bipolar transistor and method of producing same

Etch process for recessing polysilicon in trench structures

Method for producing a cavity in a monocrystalline silicon substrat...

Method for fabricating a semiconductor component

Method for fabricating a trench capacitor for a semiconductor memory