Kunihiro Miyazaki

Person

Oita, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Processing liquid generator and substrate processing apparatus usin...
- Patent number 11,670,522
- Issue date Jun 6, 2023
- Shibaura Mechatronics Corporation
- Konosuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device and substrate processing method
- Patent number 10,406,566
- Issue date Sep 10, 2019
- SHIBAURA MECHATRONICS CORPORATION
- Jun Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,281,210
- Issue date May 7, 2019
- Shibaura Mechatronics Corporation
- Kunihiro Miyazaki
- F26 - DRYING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,966,282
- Issue date May 8, 2018
- Shibaura Mechatronics Corporation
- Kunihiro Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method and apparatus for semiconductor device
- Patent number 8,841,205
- Issue date Sep 23, 2014
- Kabushiki Kaisha Toshiba
- Masaki Kamimura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Manufacturing method for semiconductor device and semiconductor device
- Patent number 8,148,717
- Issue date Apr 3, 2012
- Kabushiki Kaisha Toshiba
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus and substrate cleaning method
- Patent number 8,066,020
- Issue date Nov 29, 2011
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- B08 - CLEANING
Information Patent Grant
Manufacturing method for semiconductor device and semiconductor device
- Patent number 7,902,030
- Issue date Mar 8, 2011
- Kabushiki Kaisha Toshiba
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate treating method, semiconductor component an...
- Patent number 7,875,557
- Issue date Jan 25, 2011
- Seiko Epson Corporation
- Hiroyuki Matsuo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Manufacturing method for semiconductor device and semiconductor device
- Patent number 7,875,527
- Issue date Jan 25, 2011
- Kabushiki Kaisha Toshiba
- Yasuhiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and cleaning apparatus
- Patent number 7,850,818
- Issue date Dec 14, 2010
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing semiconductor device and cleaning apparatus
- Patent number 7,635,601
- Issue date Dec 22, 2009
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device, and a semiconductor...
- Patent number 7,439,183
- Issue date Oct 21, 2008
- Kabushiki Kaisha Toshiba
- Kunihiro Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, a method of forming a trench isolation structure, a...
- Patent number 7,365,012
- Issue date Apr 29, 2008
- Seiko Epson Corporation
- Hiroyuki Matsuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material supply system in semiconductor device manufacturing plant
- Patent number 7,305,275
- Issue date Dec 4, 2007
- Ebara Corporation
- Kunihiro Miyazaki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Manufacturing apparatus of semiconductor device having introducing...
- Patent number 7,141,120
- Issue date Nov 28, 2006
- Kabushiki Kaisha Toshiba
- Kunihiro Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus
- Patent number 6,832,616
- Issue date Dec 21, 2004
- Kabushiki Kaisha Toshiba
- Kunihiro Miyazaki
- B08 - CLEANING
Information Patent Grant
Etching for manufacture of semiconductor devices
- Patent number 6,645,876
- Issue date Nov 11, 2003
- Kabushiki Kaisha Toshiba
- Mami Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning a semiconductor substrate
- Patent number 6,444,047
- Issue date Sep 3, 2002
- Kabushiki Kaisha Toshiba
- Kunihiro Miyazaki
- B08 - CLEANING
Information Patent Grant
Surface processing method and surface processing device for silicon...
- Patent number 5,868,855
- Issue date Feb 9, 1999
- Kabushki Kaisha Toshiba
- Yuji Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for generating ozone and methods of its use
- Patent number 5,792,326
- Issue date Aug 11, 1998
- Minoru Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ozonizer
- Patent number 5,794,114
- Issue date Aug 11, 1998
- Ebara Corporation
- Minoru Harada
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Fluorescent X-ray analyzing apparatus
- Patent number 5,732,120
- Issue date Mar 24, 1998
- Rigaku Industrial Corporation
- Takashi Shoji
- G01 - MEASURING TESTING
Information Patent Grant
Surface processing method effected for total-reflection X-ray fluor...
- Patent number 5,686,314
- Issue date Nov 11, 1997
- Kabushiki Kaisha Toshiba
- Kunihiro Miyazaki
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus used for total reflection fluorescent X-ray analysis on a...
- Patent number 5,636,256
- Issue date Jun 3, 1997
- Kabushiki Kaisha Toshiba
- Tuyoshi Matumura
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for generating ozone and methods of its use
- Patent number 5,632,868
- Issue date May 27, 1997
- Ebara Corporation
- Minoru Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for analyzing contaminative element concentrat...
- Patent number 5,528,648
- Issue date Jun 18, 1996
- Kabushiki Kaisha Toshiba
- Fumio Komatsu
- G01 - MEASURING TESTING
Information Patent Grant
Contaminating-element analyzing method
- Patent number 5,497,407
- Issue date Mar 5, 1996
- Kabushiki Kaisha Toshiba
- Fumio Komatsu
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for analyzing contaminative element concentrat...
- Patent number 5,490,194
- Issue date Feb 6, 1996
- Kabushiki Kaisha Toshiba
- Fumio Komatsu
- G01 - MEASURING TESTING
Information Patent Grant
Analyzer for total reflection fluorescent x-ray and its correcting...
- Patent number 5,457,726
- Issue date Oct 10, 1995
- Kabushiki Kaisha Toshiba
- Kunihiro Miyazaki
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING LIQUID GENERATOR AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20180033651
- Publication date Feb 1, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20170259308
- Publication date Sep 14, 2017
- SHIBAURA MECHATRONICS CORPORATION
- Jun MATSUSHITA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20160093486
- Publication date Mar 31, 2016
- SHIBAURA MECHATRONICS CORPORATION
- Kunihiro MIYAZAKI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20160025409
- Publication date Jan 28, 2016
- SHIBAURA MECHATRONICS CORPORATION
- Kunihiro MIYAZAKI
- F26 - DRYING
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20150090297
- Publication date Apr 2, 2015
- SHIBAURA MECHATRONICS CORPORATION
- Jun MATSUSHITA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20150090298
- Publication date Apr 2, 2015
- Shibaura Mechantronics Corporation
- Yuji NAGASHIMA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20150090296
- Publication date Apr 2, 2015
- SHIBAURA MECHATRONICS CORPORATION
- Yuji NAGASHIMA
- B08 - CLEANING
Information Patent Application
CLEANING SOLUTION PRODUCING APPARATUS, CLEANING SOLUTION PRODUCING...
- Publication number 20140041694
- Publication date Feb 13, 2014
- SHIBAURA MECHATRONICS CORPORATION
- Kunihiro MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD AND APPARATUS FOR SEMICONDUCTOR DEVICE
- Publication number 20120052600
- Publication date Mar 1, 2012
- Kabushiki Kaisha Toshiba
- Masaki Kamimura
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20120031441
- Publication date Feb 9, 2012
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- B08 - CLEANING
Information Patent Application
Manufacturing method for semiconductor device and semiconductor device
- Publication number 20110127578
- Publication date Jun 2, 2011
- Kabushiki Kaisha Toshiba
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method for semiconductor device and semiconductor device
- Publication number 20110089525
- Publication date Apr 21, 2011
- Kabushiki Kaisha Toshiba
- Yasuhiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20110034015
- Publication date Feb 10, 2011
- Kabushiki Kaisha Toshiba
- Kenichi Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110001170
- Publication date Jan 6, 2011
- Kabushiki Kaisha Toshiba
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND HEAT TREATMENT AP...
- Publication number 20100151696
- Publication date Jun 17, 2010
- Takayuki ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device and cleaning apparatus
- Publication number 20100059180
- Publication date Mar 11, 2010
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20090309133
- Publication date Dec 17, 2009
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20090212387
- Publication date Aug 27, 2009
- Yasuhiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer cleaning method and equipment
- Publication number 20080202559
- Publication date Aug 28, 2008
- Kabushiki Kaisha Toshiba Dainippon Screen Mfg.Co., Ltd.
- Kunihiro Miyazaki
- G01 - MEASURING TESTING
Information Patent Application
Semiconductor manufacturing apparatus for use in process of cleanin...
- Publication number 20080006295
- Publication date Jan 10, 2008
- Kunihiro Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device and cleaning apparatus
- Publication number 20070178613
- Publication date Aug 2, 2007
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning apparatus and substrate cleaning method
- Publication number 20070095363
- Publication date May 3, 2007
- Hiroshi Tomita
- B08 - CLEANING
Information Patent Application
Semiconductor substrate treating method, semiconductor component an...
- Publication number 20060144421
- Publication date Jul 6, 2006
- Hiroyuki Matsuo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor manufacturing apparatus and chemical exchanging method
- Publication number 20060042756
- Publication date Mar 2, 2006
- Kunihiro Miyazaki
- B08 - CLEANING
Information Patent Application
Method of manufacturing a semiconductor device, and a semiconductor...
- Publication number 20060046487
- Publication date Mar 2, 2006
- Kabushiki Kaisha Toshiba
- Kunihiro Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method, a method of forming a trench isolation structure, a...
- Publication number 20060033178
- Publication date Feb 16, 2006
- Hiroyuki Matsuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material supply system in semiconductor device manufacturing plant
- Publication number 20050177273
- Publication date Aug 11, 2005
- EBARA CORPORATION
- Kunihiro Miyazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer cleaning method and equipment
- Publication number 20050081886
- Publication date Apr 21, 2005
- Kunihiro Miyazaki
- G01 - MEASURING TESTING
Information Patent Application
Manufacturing apparatus of semiconductor device having introducing...
- Publication number 20030099535
- Publication date May 29, 2003
- Kunihiro Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treating apparatus
- Publication number 20030024553
- Publication date Feb 6, 2003
- Kunihiro Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS

Kunihiro Miyazaki

Person

Patents Grantslast 30 patents

Processing liquid generator and substrate processing apparatus usin...

Substrate processing device and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Manufacturing method and apparatus for semiconductor device

Manufacturing method for semiconductor device and semiconductor device

Substrate cleaning apparatus and substrate cleaning method

Manufacturing method for semiconductor device and semiconductor device

Semiconductor substrate treating method, semiconductor component an...

Manufacturing method for semiconductor device and semiconductor device

Method of manufacturing semiconductor device and cleaning apparatus

Method of manufacturing semiconductor device and cleaning apparatus

Method of manufacturing a semiconductor device, and a semiconductor...

Etching method, a method of forming a trench isolation structure, a...

Material supply system in semiconductor device manufacturing plant

Manufacturing apparatus of semiconductor device having introducing...

Substrate treating apparatus

Etching for manufacture of semiconductor devices

Method of cleaning a semiconductor substrate

Surface processing method and surface processing device for silicon...

Method and apparatus for generating ozone and methods of its use

Ozonizer

Fluorescent X-ray analyzing apparatus

Surface processing method effected for total-reflection X-ray fluor...

Apparatus used for total reflection fluorescent X-ray analysis on a...

Method and apparatus for generating ozone and methods of its use

Method and apparatus for analyzing contaminative element concentrat...

Contaminating-element analyzing method

Method and apparatus for analyzing contaminative element concentrat...

Analyzer for total reflection fluorescent x-ray and its correcting...

Patents Applicationslast 30 patents

PROCESSING LIQUID GENERATOR AND SUBSTRATE PROCESSING APPARATUS USIN...

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

CLEANING SOLUTION PRODUCING APPARATUS, CLEANING SOLUTION PRODUCING...

MANUFACTURING METHOD AND APPARATUS FOR SEMICONDUCTOR DEVICE

SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD

Manufacturing method for semiconductor device and semiconductor device

Manufacturing method for semiconductor device and semiconductor device

HEAT TREATMENT APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND HEAT TREATMENT AP...

Method of manufacturing semiconductor device and cleaning apparatus

MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

Wafer cleaning method and equipment

Semiconductor manufacturing apparatus for use in process of cleanin...

Method of manufacturing semiconductor device and cleaning apparatus

Substrate cleaning apparatus and substrate cleaning method

Semiconductor substrate treating method, semiconductor component an...

Semiconductor manufacturing apparatus and chemical exchanging method

Method of manufacturing a semiconductor device, and a semiconductor...

Etching method, a method of forming a trench isolation structure, a...

Material supply system in semiconductor device manufacturing plant

Wafer cleaning method and equipment

Manufacturing apparatus of semiconductor device having introducing...

Substrate treating apparatus