Lawrence Wong

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chamber with individually controllable plasma generation regions fo...
- Patent number 10,957,518
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing reactor with a magnetic electron-blocking filter...
- Patent number 10,784,085
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time measurement of a surface charge profile of an electrostat...
- Patent number 10,656,194
- Issue date May 19, 2020
- Applied Materials, Inc.
- Haitao Wang
- G01 - MEASURING TESTING
Information Patent Grant
Method of real time in-situ chamber condition monitoring using sens...
- Patent number 10,395,904
- Issue date Aug 27, 2019
- Applied Materials, Inc.
- Lawrence Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple electrode substrate support assembly and phase control system
- Patent number 10,153,139
- Issue date Dec 11, 2018
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of real time in-situ chamber condition monitoring using sens...
- Patent number 10,141,166
- Issue date Nov 27, 2018
- Applied Materials, Inc.
- Lawrence Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling plasma near the edge of a subs...
- Patent number 10,017,857
- Issue date Jul 10, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for selective coil excitation in inductively coup...
- Patent number 9,659,751
- Issue date May 23, 2017
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of multiple zone symmetric gas injection for inductively cou...
- Patent number 9,472,379
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Steven Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatially discrete multi-loop RF-driven plasma source having plural...
- Patent number 9,412,563
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Kartik Ramaswamy
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Independent control of RF phases of separate coils of an inductivel...
- Patent number 9,161,428
- Issue date Oct 13, 2015
- Applied Materials, Inc.
- Kenneth S. Collins
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of differential counter electrode tuning in an RF plasma rea...
- Patent number 8,734,664
- Issue date May 27, 2014
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for VHF impedance match tuning
- Patent number 8,578,879
- Issue date Nov 12, 2013
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for characterizing a magnetic field in a magnetically enh...
- Patent number 8,148,977
- Issue date Apr 3, 2012
- Applied Materials, Inc.
- Kartik Ramaswamy
- G01 - MEASURING TESTING
Information Patent Grant
Plasma process uniformity across a wafer by controlling a variable...
- Patent number 8,080,479
- Issue date Dec 20, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by controlling RF phase be...
- Patent number 8,076,247
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with reduced electrical skew using electrical bypass...
- Patent number 7,988,815
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,972,469
- Issue date Jul 5, 2011
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor with variable...
- Patent number 7,968,469
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process uniformity across a wafer by apportioning ground ret...
- Patent number 7,884,025
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Improving plasma process uniformity across a wafer by apportioning...
- Patent number 7,879,731
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin, rinse, and dry station with adjustable nozzle assembly for se...
- Patent number 6,786,224
- Issue date Sep 7, 2004
- Lam Research Corporation
- Larry Ping-Kwan Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of pressure fluctuation dampening
- Patent number 6,685,440
- Issue date Feb 3, 2004
- Lam Research Corporation
- Larry Ping-Kwan Wong
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Adjustable nozzle assembly for semiconductor wafer backside rinsing
- Patent number 6,419,170
- Issue date Jul 16, 2002
- Lam Research Corporation
- Larry Ping-Kwan Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure fluctuation dampening system
- Patent number 6,406,273
- Issue date Jun 18, 2002
- Lam Research Corporation
- Larry Ping-Kwan Wong
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Method for validating pre-process adjustments to a wafer cleaning s...
- Patent number 6,368,416
- Issue date Apr 9, 2002
- Lam Research Corporation
- Larry Ping-Kwan Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid delivery stablization for wafer preparation systems
- Patent number 6,267,142
- Issue date Jul 31, 2001
- Lam Research Corporation
- Larry Ping-Kwan Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure fluctuation dampening system
- Patent number 6,247,903
- Issue date Jun 19, 2001
- Lam Research Corporation
- Larry Ping-Kwan Wong
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...

Patents Applicationslast 30 patents

Information Patent Application
CHAMBER WITH INDIVIDUALLY CONTROLLABLE PLASMA GENERATION REGIONS FO...
- Publication number 20200312630
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Real Time In-Situ Chamber Condition Monitoring Using Sens...
- Publication number 20190096641
- Publication date Mar 28, 2019
- Applied Materials, Inc.
- Lawrence Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE ELECTRODE SUBSTRATE SUPPORT ASSEMBLY AND PHASE CONTROL SYSTEM
- Publication number 20180366306
- Publication date Dec 20, 2018
- Applied Materials, Inc.
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR FOR PROCESSING A WORKPIECE WITH AN ARRAY OF PLASMA P...
- Publication number 20170092470
- Publication date Mar 30, 2017
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRODE SUBSTRATE SUPPORT ASSEMBLY AND PHASE CONTROL SYSTEM
- Publication number 20160372307
- Publication date Dec 22, 2016
- Applied Materials, Inc.
- YANG YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING PLASMA NEAR THE EDGE OF A SUBS...
- Publication number 20160322242
- Publication date Nov 3, 2016
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING REACTOR WITH A MAGNETIC ELECTRON-BLOCKING FILTER...
- Publication number 20160225466
- Publication date Aug 4, 2016
- Applied Materials, Inc.
- Kartik Ramaswamy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
REAL-TIME MEASUREMENT OF A SURFACE CHARGE PROFILE OF AN ELECTROSTAT...
- Publication number 20160116518
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- HAITAO WANG
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF REAL TIME IN-SITU CHAMBER CONDITION MONITORING USING SENS...
- Publication number 20160048111
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Lawrence Wong
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEM AND METHOD FOR SELECTIVE COIL EXCITATION IN INDUCTIVELY COUP...
- Publication number 20160027616
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MULTIPLE ZONE SYMMETRIC GAS INJECTION FOR INDUCTIVELY COU...
- Publication number 20150371824
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Steven LANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED SPATIALLY DISCRETE MULTI-LOOP RF-DRIVEN PLASMA...
- Publication number 20150075717
- Publication date Mar 19, 2015
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIALLY DISCRETE MULTI-LOOP RF-DRIVEN PLASMA SOURCE HAVING PLURAL...
- Publication number 20150075716
- Publication date Mar 19, 2015
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL COUNTER ELECTRODE TUNING IN A PLASMA REACTOR WITH AN R...
- Publication number 20140069584
- Publication date Mar 13, 2014
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DIFFERENTIAL COUNTER ELECTRODE TUNING IN AN RF PLASMA REA...
- Publication number 20140034612
- Publication date Feb 6, 2014
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL COUNTER ELECTRODE TUNING IN A PLASMA REACTOR WITH AN R...
- Publication number 20140034239
- Publication date Feb 6, 2014
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDEPENDENT CONTROL OF RF PHASES OF SEPARATE COILS OF AN INDUCTIVEL...
- Publication number 20130284370
- Publication date Oct 31, 2013
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWO-PHASE OPERATION OF PLASMA CHAMBER BY PHASE LOCKED LOOP
- Publication number 20130284369
- Publication date Oct 31, 2013
- Applied Materials, Inc.
- Satoru Kobayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA PROCESSING USING RF RETURN PATH VARIABLE IMPEDANCE CONTROLLE...
- Publication number 20130277333
- Publication date Oct 24, 2013
- Nipun Misra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR VHF IMPEDANCE MATCH TUNING
- Publication number 20110023780
- Publication date Feb 3, 2011
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH RF GENERATOR AND AUTOMATIC IMPEDANCE MATCH WITH...
- Publication number 20110009999
- Publication date Jan 13, 2011
- Applied Materials, Inc.
- Chunlei Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CHARACTERIZING A MAGNETIC FIELD IN A MAGNETICALLY ENH...
- Publication number 20100188077
- Publication date Jul 29, 2010
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- G01 - MEASURING TESTING
Information Patent Application
CAPACITIVELY COUPLED PLASMA ETCH CHAMBER WITH MULTIPLE RF FEEDS
- Publication number 20100015357
- Publication date Jan 21, 2010
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOLDED COAXIAL RESONATORS
- Publication number 20090257927
- Publication date Oct 15, 2009
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS...
- Publication number 20090025878
- Publication date Jan 29, 2009
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE
- Publication number 20090025879
- Publication date Jan 29, 2009
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080257261
- Publication date Oct 23, 2008
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20080260966
- Publication date Oct 23, 2008
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...
- Publication number 20080182417
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...
- Publication number 20080182418
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Lawrence Wong

Person

Patents Grantslast 30 patents

Chamber with individually controllable plasma generation regions fo...

Plasma processing reactor with a magnetic electron-blocking filter...

Real-time measurement of a surface charge profile of an electrostat...

Method of real time in-situ chamber condition monitoring using sens...

Multiple electrode substrate support assembly and phase control system

Method of real time in-situ chamber condition monitoring using sens...

Method and apparatus for controlling plasma near the edge of a subs...

System and method for selective coil excitation in inductively coup...

Method of multiple zone symmetric gas injection for inductively cou...

Spatially discrete multi-loop RF-driven plasma source having plural...

Independent control of RF phases of separate coils of an inductivel...

Method of differential counter electrode tuning in an RF plasma rea...

Apparatus for VHF impedance match tuning

Apparatus for characterizing a magnetic field in a magnetically enh...

Plasma process uniformity across a wafer by controlling a variable...

Plasma process uniformity across a wafer by controlling RF phase be...

Plasma reactor with reduced electrical skew using electrical bypass...

Plasma processing apparatus

Method of processing a workpiece in a plasma reactor with variable...

Plasma process uniformity across a wafer by apportioning ground ret...

Improving plasma process uniformity across a wafer by apportioning...

Spin, rinse, and dry station with adjustable nozzle assembly for se...

Methods of pressure fluctuation dampening

Adjustable nozzle assembly for semiconductor wafer backside rinsing

Pressure fluctuation dampening system

Method for validating pre-process adjustments to a wafer cleaning s...

Fluid delivery stablization for wafer preparation systems

Pressure fluctuation dampening system

Patents Applicationslast 30 patents

CHAMBER WITH INDIVIDUALLY CONTROLLABLE PLASMA GENERATION REGIONS FO...

Method of Real Time In-Situ Chamber Condition Monitoring Using Sens...

MULTIPLE ELECTRODE SUBSTRATE SUPPORT ASSEMBLY AND PHASE CONTROL SYSTEM

PLASMA REACTOR FOR PROCESSING A WORKPIECE WITH AN ARRAY OF PLASMA P...

MULTIPLE ELECTRODE SUBSTRATE SUPPORT ASSEMBLY AND PHASE CONTROL SYSTEM

METHOD AND APPARATUS FOR CONTROLLING PLASMA NEAR THE EDGE OF A SUBS...

PLASMA PROCESSING REACTOR WITH A MAGNETIC ELECTRON-BLOCKING FILTER...

REAL-TIME MEASUREMENT OF A SURFACE CHARGE PROFILE OF AN ELECTROSTAT...

METHOD OF REAL TIME IN-SITU CHAMBER CONDITION MONITORING USING SENS...

SYSTEM AND METHOD FOR SELECTIVE COIL EXCITATION IN INDUCTIVELY COUP...

METHOD OF MULTIPLE ZONE SYMMETRIC GAS INJECTION FOR INDUCTIVELY COU...

INDUCTIVELY COUPLED SPATIALLY DISCRETE MULTI-LOOP RF-DRIVEN PLASMA...

SPATIALLY DISCRETE MULTI-LOOP RF-DRIVEN PLASMA SOURCE HAVING PLURAL...

DIFFERENTIAL COUNTER ELECTRODE TUNING IN A PLASMA REACTOR WITH AN R...

METHOD OF DIFFERENTIAL COUNTER ELECTRODE TUNING IN AN RF PLASMA REA...

DIFFERENTIAL COUNTER ELECTRODE TUNING IN A PLASMA REACTOR WITH AN R...

INDEPENDENT CONTROL OF RF PHASES OF SEPARATE COILS OF AN INDUCTIVEL...

TWO-PHASE OPERATION OF PLASMA CHAMBER BY PHASE LOCKED LOOP

PLASMA PROCESSING USING RF RETURN PATH VARIABLE IMPEDANCE CONTROLLE...

APPARATUS FOR VHF IMPEDANCE MATCH TUNING

PLASMA REACTOR WITH RF GENERATOR AND AUTOMATIC IMPEDANCE MATCH WITH...

APPARATUS FOR CHARACTERIZING A MAGNETIC FIELD IN A MAGNETICALLY ENH...

CAPACITIVELY COUPLED PLASMA ETCH CHAMBER WITH MULTIPLE RF FEEDS

FOLDED COAXIAL RESONATORS

PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS...

PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...