Lee H. Veneklasen

Person

Castro Valley, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of exposing a target to a charged particle beam
- Patent number 6,924,494
- Issue date Aug 2, 2005
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for writing with a raster scanned beam
- Patent number 6,828,570
- Issue date Dec 7, 2004
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for secondary electron emission microscope wi...
- Patent number 6,803,572
- Issue date Oct 12, 2004
- KLA-Tencor Technologies Corporation
- Lee Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion lens with magnetic shield for charged particle beam system
- Patent number 6,768,117
- Issue date Jul 27, 2004
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time prediction of and correction of proximity resist heating...
- Patent number 6,720,565
- Issue date Apr 13, 2004
- Applied Materials, Inc.
- Robert Innes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for inspection of semiconductor wafers and masks using a...
- Patent number 6,610,980
- Issue date Aug 26, 2003
- KLA-Tencor Corporation
- Lee Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for secondary electron emission microscope wi...
- Patent number 6,586,733
- Issue date Jul 1, 2003
- KLA Tencor
- Lee Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus having traversing circuit boards
- Patent number 6,563,124
- Issue date May 13, 2003
- Applied Materials, Inc.
- Lee Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle system error diagnosis
- Patent number 6,541,770
- Issue date Apr 1, 2003
- Applied Materials, Inc.
- Lee H. Veneklasen
- G01 - MEASURING TESTING
Information Patent Grant
Testing of interconnection circuitry using two modulated charged pa...
- Patent number 6,515,282
- Issue date Feb 4, 2003
- Applied Materials, Inc.
- Lee H. Veneklasen
- G01 - MEASURING TESTING
Information Patent Grant
Moving photocathode with continuous regeneration for image conversi...
- Patent number 6,476,401
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge neutralization of electron beam systems
- Patent number 6,465,795
- Issue date Oct 15, 2002
- Applied Materials, Inc.
- Juan R. Madonado
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for forming a charged particle beam of arbitra...
- Patent number 6,455,863
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Sergey Babin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron gun having magnetic collimator
- Patent number 6,392,333
- Issue date May 21, 2002
- Applied Materials, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time prediction of proximity resist heating and correction of...
- Patent number 6,373,071
- Issue date Apr 16, 2002
- Applied Materials, Inc.
- Robert Innes
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Minimization of electron fogging in electron beam lithography
- Patent number 6,326,635
- Issue date Dec 4, 2001
- Etec Systems, Inc.
- Robert Innes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annular differential seal for electron beam apparatus using isolati...
- Patent number 6,300,630
- Issue date Oct 9, 2001
- Etec Systems, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Raster scan gaussian beam writing strategy and method for pattern g...
- Patent number 6,274,290
- Issue date Aug 14, 2001
- Etec Systems, Inc.
- Lee H. Veneklasen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Raster shaped beam, electron beam exposure strategy using a two dim...
- Patent number 6,262,429
- Issue date Jul 17, 2001
- Etec Systems, Inc.
- Stephen A. Rishton
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for controlling a beam shape
- Patent number 6,259,106
- Issue date Jul 10, 2001
- Etec Systems, Inc.
- Volker Boegli
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Compact photoemission source, field and objective lens arrangement...
- Patent number 6,215,128
- Issue date Apr 10, 2001
- Etec Systems, Inc.
- Marian Mankos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shaped shadow projection for an electron beam column
- Patent number 6,011,269
- Issue date Jan 4, 2000
- Etec Systems, Inc.
- Lee H. Veneklasen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Magnetic lens and deflector with inner and outer pole pieces with c...
- Patent number 6,002,135
- Issue date Dec 14, 1999
- Etec Systems, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operating a solid state particle detector within a magnetic deflect...
- Patent number 5,900,667
- Issue date May 4, 1999
- Etec Systems, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Raster shaped beam writing strategy system and method for pattern g...
- Patent number 5,876,902
- Issue date Mar 2, 1999
- Etec Systems, Inc.
- Lee H. Veneklasen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for run-time correction of proximity effects i...
- Patent number 5,847,959
- Issue date Dec 8, 1998
- Etec Systems, Inc.
- Lee H. Veneklasen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Conical baffle for reducing charging drift in a particle beam system
- Patent number 5,838,006
- Issue date Nov 17, 1998
- Etec Systems, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum compatible linear motion device
- Patent number 5,784,925
- Issue date Jul 28, 1998
- Etec Systems, Inc.
- David Trost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composite concentric-gap magnetic lens and deflector with conical p...
- Patent number 5,729,022
- Issue date Mar 17, 1998
- Etec Systems, Inc.
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and fabrication of gated electron-emitting device having...
- Patent number 5,552,659
- Issue date Sep 3, 1996
- Silicon Video Corporation
- John M. Macaulay
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of exposing a target to a charged particle beam
- Publication number 20040217304
- Publication date Nov 4, 2004
- Lee H. Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and methods for secondary electron emission microscope wi...
- Publication number 20040000642
- Publication date Jan 1, 2004
- Lee Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for writing with a raster scanned beam
- Publication number 20030183782
- Publication date Oct 2, 2003
- Lee H. Veneklasen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Real-time prediction of and correction of proximity resist heating...
- Publication number 20020148978
- Publication date Oct 17, 2002
- APPLIED MATERIALS, INC.
- Robert Innes
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam apparatus having traversing circuit boards
- Publication number 20020134912
- Publication date Sep 26, 2002
- APPLIED MATERIALS, INC.
- Lee Veneklasen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Raster shaped beam, electron beam exposure strategy using a two dim...
- Publication number 20020104970
- Publication date Aug 8, 2002
- Stacey J. Winter
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus for inspection of semiconductor wafers and masks using a...
- Publication number 20020070340
- Publication date Jun 13, 2002
- Lee Veneklasen
- H01 - BASIC ELECTRIC ELEMENTS

Lee H. Veneklasen

Person

Patents Grantslast 30 patents

Method of exposing a target to a charged particle beam

Technique for writing with a raster scanned beam

Apparatus and methods for secondary electron emission microscope wi...

Immersion lens with magnetic shield for charged particle beam system

Real-time prediction of and correction of proximity resist heating...

Apparatus for inspection of semiconductor wafers and masks using a...

Apparatus and methods for secondary electron emission microscope wi...

Electron beam apparatus having traversing circuit boards

Charged particle system error diagnosis

Testing of interconnection circuitry using two modulated charged pa...

Moving photocathode with continuous regeneration for image conversi...

Charge neutralization of electron beam systems

Apparatus and method for forming a charged particle beam of arbitra...

Electron gun having magnetic collimator

Real-time prediction of proximity resist heating and correction of...

Minimization of electron fogging in electron beam lithography

Annular differential seal for electron beam apparatus using isolati...

Raster scan gaussian beam writing strategy and method for pattern g...

Raster shaped beam, electron beam exposure strategy using a two dim...

Apparatus and method for controlling a beam shape

Compact photoemission source, field and objective lens arrangement...

Shaped shadow projection for an electron beam column

Magnetic lens and deflector with inner and outer pole pieces with c...

Operating a solid state particle detector within a magnetic deflect...

Raster shaped beam writing strategy system and method for pattern g...

Method and apparatus for run-time correction of proximity effects i...

Conical baffle for reducing charging drift in a particle beam system

Vacuum compatible linear motion device

Composite concentric-gap magnetic lens and deflector with conical p...

Structure and fabrication of gated electron-emitting device having...

Patents Applicationslast 30 patents

Method of exposing a target to a charged particle beam

Apparatus and methods for secondary electron emission microscope wi...

Technique for writing with a raster scanned beam

Real-time prediction of and correction of proximity resist heating...

Electron beam apparatus having traversing circuit boards

Raster shaped beam, electron beam exposure strategy using a two dim...

Apparatus for inspection of semiconductor wafers and masks using a...