This application is a continuation-in-part of U.S. patent application Ser. No. 08/789,247 entitled “Raster Shaped Beam Writing Strategy System And Method For Pattern Generation” filed on Jan. 28, 1997 now U.S. Pat. No. 5,876,902, and assigned to the assignee of the present invention.
Number | Name | Date | Kind |
---|---|---|---|
3573849 | Herriot | Apr 1971 | |
3900737 | Collier et al. | Aug 1975 | |
4213053 | Pfeiffer | Jul 1980 | |
4243866 | Pfeiffer et al. | Jan 1981 | |
4469950 | Taylor et al. | Sep 1984 | |
4806921 | Goodman et al. | Feb 1989 | |
4879605 | Warkentin et al. | Nov 1989 | |
5393987 | Abboud et al. | Feb 1995 |
Number | Date | Country |
---|---|---|
0 166 549 A2 | Jan 1986 | EP |
WO 9428574 | Dec 1994 | WO |
WO 9833198 | Jul 1998 | WO |
Entry |
---|
Elvira Hendrika Mulder, “On The Throughput Optimization of Electron Beam Lithography Systems,” pp. 3-6 and 3-7. |
O.W. Otto and A. K. Griffith, “Proximity correction on the AEBLE-150,” J. Vac. Sci. Technol. B, vol. 6, No. 1, Jan./Feb. 1988, pp. 443-447. |
Muray, et al., “Address data reduction and lithography performance of graybeam writing stratergies for raster scan mask generation”, Journal of Vacuum Science & Technology: Part B, vol. 12, No. 6, Nov./Dec. 1994, pp. 3465-3472. |
Veneklasen, “Optimizing electron beam lithography writing strategy subject to electron optical, pattern, and resist constraints”, Journal of Vacuum Science and Technology: Part B, vol. 9, No. 6, Nov./Dec. 1991, pp. 3063-3069. |
Number | Date | Country | |
---|---|---|---|
Parent | 08/789247 | Jan 1997 | US |
Child | 09/179361 | US |