Lori D. WASHINGTON

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-thermal CVD chambers with shared gas delivery and exhaust system
- Patent number 12,037,701
- Issue date Jul 16, 2024
- Applied Materials, Inc.
- Zhiyuan Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structure and material engineering methods for optoelectronic devic...
- Patent number 12,015,042
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Papo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for high growth rate deposition for forming different cells...
- Patent number 11,393,683
- Issue date Jul 19, 2022
- UTICA LEASECO, LLC
- Lori D. Washington
- C30 - CRYSTAL GROWTH
Information Patent Grant
Optoelectronic devices manufactured using different growth substrates
- Patent number 11,075,313
- Issue date Jul 27, 2021
- UTICA LEASECO, LLC
- Nikhil Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing optoelectronic devices using different gro...
- Patent number 10,873,001
- Issue date Dec 22, 2020
- Alta Devices, Inc.
- Nikhil Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Growth structure under a release layer for manufacturing of optoele...
- Patent number 10,811,557
- Issue date Oct 20, 2020
- Alta Devices, Inc.
- Andrew J. Ritenour
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for chemical vapor deposition (CVD) in a movable liner asse...
- Patent number 10,718,051
- Issue date Jul 21, 2020
- Alta Devices, Inc.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tiled showerhead for a semiconductor chemical vapor deposition reactor
- Patent number 10,066,297
- Issue date Sep 4, 2018
- Alta Devices, Inc.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Movable liner assembly for a deposition zone in a CVD reactor
- Patent number 9,982,346
- Issue date May 29, 2018
- Alta Devices, Inc.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of decontamination of process chamber after in-situ chamber...
- Patent number 9,932,670
- Issue date Apr 3, 2018
- Applied Materials, Inc.
- Jie Su
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of high growth rate deposition for group III/V materials
- Patent number 9,834,860
- Issue date Dec 5, 2017
- Alta Devices, Inc.
- Lori D. Washington
- C30 - CRYSTAL GROWTH
Information Patent Grant
Multi-gas straight channel showerhead
- Patent number 9,644,267
- Issue date May 9, 2017
- Applied Materials, Inc.
- Brian H. Burrows
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor with gas flow virtual walls
- Patent number 9,212,422
- Issue date Dec 15, 2015
- Alta Devices, Inc.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tiled showerhead for a semiconductor chemical vapor deposition reactor
- Patent number 9,175,393
- Issue date Nov 3, 2015
- Alta Devices, Inc.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-gas straight channel showerhead
- Patent number 8,481,118
- Issue date Jul 9, 2013
- Applied Materials, Inc.
- Brian H. Burrows
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a transistor and modulating channel stress
- Patent number 8,105,908
- Issue date Jan 31, 2012
- Applied Materials, Inc.
- Sunderraj Thirupapuliyur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-gas straight channel showerhead
- Patent number 7,976,631
- Issue date Jul 12, 2011
- Applied Materials, Inc.
- Brian H. Burrows
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a transistor
- Patent number 7,968,413
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Faran Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a transistor
- Patent number 7,833,869
- Issue date Nov 16, 2010
- Applied Materials, Inc.
- Faran Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring precursor amounts in bubbler sources
- Patent number 7,781,016
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Ronald Stevens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for depositing a gaseous mixture onto a substrate...
- Patent number 7,674,352
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- David Bour
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pre-cleaning of substrates in epitaxy chambers
- Patent number 7,651,948
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Yihwan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Parasitic particle suppression in growth of III-V nitride films usi...
- Patent number 7,585,769
- Issue date Sep 8, 2009
- Applied Materials, Inc.
- David Bour
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stacked-substrate processes for production of nitride semiconductor...
- Patent number 7,575,982
- Issue date Aug 18, 2009
- Applied Materials, Inc.
- David Bour
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dislocation-specific lateral epitaxial overgrowth to reduce disloca...
- Patent number 7,560,364
- Issue date Jul 14, 2009
- Applied Materials, Inc.
- David Bour
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radial temperature control for lattice-mismatched epitaxy
- Patent number 7,534,714
- Issue date May 19, 2009
- Applied Materials, Inc.
- Lori Washington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-side epitaxy processes for production of nitride semiconductor...
- Patent number 7,470,599
- Issue date Dec 30, 2008
- Applied Materials, Inc.
- Sandeep Nijhawan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dislocation-specific dielectric mask deposition and lateral epitaxi...
- Patent number 7,459,380
- Issue date Dec 2, 2008
- Applied Materials, Inc.
- David Bour
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a transistor
- Patent number 7,413,957
- Issue date Aug 19, 2008
- Applied Materials, Inc.
- Faran Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stress measurement and stress balance in films
- Patent number 7,374,960
- Issue date May 20, 2008
- Applied Materials, Inc.
- David Bour
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MOVABLE CENTRAL REFLECTORS OF SEMICONDUCTOR PROCESSING EQUIPMENT, A...
- Publication number 20240360587
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS EXHAUST FRAMES INCLUDING PATHWAYS HAVING SIZE VARIATIONS, AND R...
- Publication number 20240360590
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-THERMAL CVD CHAMBERS WITH SHARED GAS DELIVERY AND EXHAUST SYSTEM
- Publication number 20240318351
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Zhiyuan YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUSCEPTOR IMPROVEMENT
- Publication number 20240274464
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Matthew Gabriel GOODMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS
- Publication number 20240248298
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS
- Publication number 20240248282
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS
- Publication number 20240248297
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE PIECE OR TWO PIECE SUSCEPTOR
- Publication number 20240141493
- Publication date May 2, 2024
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODEL-BASED PURGE GAS FLOW
- Publication number 20230212742
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW MASS SUBSTRATE SUPPORT
- Publication number 20220364263
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Shawn Joseph BONHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-THERMAL CVD CHAMBERS WITH SHARED GAS DELIVERY AND EXHAUST SYSTEM
- Publication number 20210324514
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Zhiyuan YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE & MATERIAL ENGINEERING METHODS FOR OPTOELECTRONIC DEVICES...
- Publication number 20210265416
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Papo CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MOCVD EFFLUENT ABATEMENT
- Publication number 20210260525
- Publication date Aug 26, 2021
- UTICA LEASECO, LLC
- Gang HE
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHODS OF MANUFACTURING OPTOELECTRONIC DEVICES USING DIFFERENT GRO...
- Publication number 20200119222
- Publication date Apr 16, 2020
- Alta Devices, Inc.
- Nikhil JAIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTOELECTRONIC DEVICES MANUFACTURED USING DIFFERENT GROWTH SUBSTRATES
- Publication number 20200119216
- Publication date Apr 16, 2020
- Alta Devices, Inc.
- Nikhil JAIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROWTH STRUCTURE UNDER A RELEASE LAYER FOR MANUFACTURING OF OPTOELE...
- Publication number 20180366609
- Publication date Dec 20, 2018
- Alta Devices, Inc.
- Andrew J. RITENOUR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVABLE LINER ASSEMBLY FOR A DEPOSITION ZONE IN A CVD REACTOR
- Publication number 20180251897
- Publication date Sep 6, 2018
- Alta Devices, Inc.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH GROWTH RATE DEPOSITION FOR GROUP III/V MATERIALS
- Publication number 20180019117
- Publication date Jan 18, 2018
- Alta Devices, Inc.
- Lori D. WASHINGTON
- C30 - CRYSTAL GROWTH
Information Patent Application
TILED SHOWERHEAD FOR A SEMICONDUCTOR CHEMICAL VAPOR DEPOSITION REACTOR
- Publication number 20160047042
- Publication date Feb 18, 2016
- Alta Devices, Inc.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DECONTAMINATION OF PROCESS CHAMBER AFTER IN-SITU CHAMBER...
- Publication number 20140116470
- Publication date May 1, 2014
- Applied Materials, Inc.
- Jie SU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-GAS STRAIGHT CHANNEL SHOWERHEAD
- Publication number 20140014745
- Publication date Jan 16, 2014
- Applied Materials, Inc.
- Brian H. BURROWS
- C30 - CRYSTAL GROWTH
Information Patent Application
MOVABLE LINER ASSEMBLY FOR A DEPOSITION ZONE IN A CVD REACTOR
- Publication number 20130052371
- Publication date Feb 28, 2013
- ALTA DEVICES, INC.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD REACTOR WITH GAS FLOW VIRTUAL WALLS
- Publication number 20130052346
- Publication date Feb 28, 2013
- ALTA DEVICES, INC.
- Gregg Higashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-GAS STRAIGHT CHANNEL SHOWERHEAD
- Publication number 20120024388
- Publication date Feb 2, 2012
- Brian H. Burrows
- C30 - CRYSTAL GROWTH
Information Patent Application
CLOSED LOOP MOCVD DEPOSITION CONTROL
- Publication number 20110308453
- Publication date Dec 22, 2011
- Applied Materials, Inc.
- Jie Su
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD APPARATUS
- Publication number 20110121503
- Publication date May 26, 2011
- Applied Materials, Inc.
- Brian H. Burrows
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DECONTAMINATION OF PROCESS CHAMBER AFTER IN-SITU CHAMBER...
- Publication number 20110117728
- Publication date May 19, 2011
- Applied Materials, Inc.
- Jie Su
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH GROWTH RATE DEPOSITION FOR GROUP III/V MATERIALS
- Publication number 20110083601
- Publication date Apr 14, 2011
- ALTA DEVICES, INC.
- Lori D. WASHINGTON
- C30 - CRYSTAL GROWTH
Information Patent Application
EPITAXIAL GROWTH OF COMPOUND NITRIDE SEMICONDUCTOR STRUCTURES
- Publication number 20110070721
- Publication date Mar 24, 2011
- Applied Materials, Inc.
- Sandeep Nijhawan
- C30 - CRYSTAL GROWTH
Information Patent Application
DECONTAMINATION OF MOCVD CHAMBER USING NH3 PURGE AFTER IN-SITU CLEA...
- Publication number 20100273291
- Publication date Oct 28, 2010
- Applied Materials, Inc.
- Olga Kryliouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Lori D. WASHINGTON

Person

Patents Grantslast 30 patents

Multi-thermal CVD chambers with shared gas delivery and exhaust system

Structure and material engineering methods for optoelectronic devic...

Methods for high growth rate deposition for forming different cells...

Optoelectronic devices manufactured using different growth substrates

Methods of manufacturing optoelectronic devices using different gro...

Growth structure under a release layer for manufacturing of optoele...

Methods for chemical vapor deposition (CVD) in a movable liner asse...

Tiled showerhead for a semiconductor chemical vapor deposition reactor

Movable liner assembly for a deposition zone in a CVD reactor

Method of decontamination of process chamber after in-situ chamber...

Method of high growth rate deposition for group III/V materials

Multi-gas straight channel showerhead

CVD reactor with gas flow virtual walls

Tiled showerhead for a semiconductor chemical vapor deposition reactor

Multi-gas straight channel showerhead

Methods for forming a transistor and modulating channel stress

Multi-gas straight channel showerhead

Methods for forming a transistor

Methods for forming a transistor

Method for measuring precursor amounts in bubbler sources

System and method for depositing a gaseous mixture onto a substrate...

Pre-cleaning of substrates in epitaxy chambers

Parasitic particle suppression in growth of III-V nitride films usi...

Stacked-substrate processes for production of nitride semiconductor...

Dislocation-specific lateral epitaxial overgrowth to reduce disloca...

Radial temperature control for lattice-mismatched epitaxy

Dual-side epitaxy processes for production of nitride semiconductor...

Dislocation-specific dielectric mask deposition and lateral epitaxi...

Methods for forming a transistor

Stress measurement and stress balance in films

Patents Applicationslast 30 patents

MOVABLE CENTRAL REFLECTORS OF SEMICONDUCTOR PROCESSING EQUIPMENT, A...

GAS EXHAUST FRAMES INCLUDING PATHWAYS HAVING SIZE VARIATIONS, AND R...

MULTI-THERMAL CVD CHAMBERS WITH SHARED GAS DELIVERY AND EXHAUST SYSTEM

SUSCEPTOR IMPROVEMENT

APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS

APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS

APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS

SINGLE PIECE OR TWO PIECE SUSCEPTOR

MODEL-BASED PURGE GAS FLOW

LOW MASS SUBSTRATE SUPPORT

MULTI-THERMAL CVD CHAMBERS WITH SHARED GAS DELIVERY AND EXHAUST SYSTEM

STRUCTURE & MATERIAL ENGINEERING METHODS FOR OPTOELECTRONIC DEVICES...

METHOD AND SYSTEM FOR MOCVD EFFLUENT ABATEMENT

METHODS OF MANUFACTURING OPTOELECTRONIC DEVICES USING DIFFERENT GRO...

OPTOELECTRONIC DEVICES MANUFACTURED USING DIFFERENT GROWTH SUBSTRATES

GROWTH STRUCTURE UNDER A RELEASE LAYER FOR MANUFACTURING OF OPTOELE...

MOVABLE LINER ASSEMBLY FOR A DEPOSITION ZONE IN A CVD REACTOR

HIGH GROWTH RATE DEPOSITION FOR GROUP III/V MATERIALS

TILED SHOWERHEAD FOR A SEMICONDUCTOR CHEMICAL VAPOR DEPOSITION REACTOR

METHOD OF DECONTAMINATION OF PROCESS CHAMBER AFTER IN-SITU CHAMBER...

MULTI-GAS STRAIGHT CHANNEL SHOWERHEAD

MOVABLE LINER ASSEMBLY FOR A DEPOSITION ZONE IN A CVD REACTOR

CVD REACTOR WITH GAS FLOW VIRTUAL WALLS

MULTI-GAS STRAIGHT CHANNEL SHOWERHEAD

CLOSED LOOP MOCVD DEPOSITION CONTROL

CVD APPARATUS

METHOD OF DECONTAMINATION OF PROCESS CHAMBER AFTER IN-SITU CHAMBER...

HIGH GROWTH RATE DEPOSITION FOR GROUP III/V MATERIALS

EPITAXIAL GROWTH OF COMPOUND NITRIDE SEMICONDUCTOR STRUCTURES

DECONTAMINATION OF MOCVD CHAMBER USING NH3 PURGE AFTER IN-SITU CLEA...