Margaret C. Lawson

Person

LaGrangeville, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cleanability assessment of sublimate from lithography materials
- Patent number 9,551,696
- Issue date Jan 24, 2017
- GLOBALFOUNDRIES Inc.
- Mark S. Chace
- B08 - CLEANING
Information Patent Grant
Patterning process
- Patent number 8,759,220
- Issue date Jun 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top antireflective coating composition containing hydrophobic and a...
- Patent number 8,304,178
- Issue date Nov 6, 2012
- International Business Machines Corporation
- Mahmoud Khojasteh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 8,202,678
- Issue date Jun 19, 2012
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High resolution imaging process using an in-situ image modifying layer
- Patent number 7,709,187
- Issue date May 4, 2010
- International Business Machines Corporation
- Kaushal Patel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top coat material and use thereof in lithography processes
- Patent number 7,700,262
- Issue date Apr 20, 2010
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Top antireflective coating composition containing hydrophobic and a...
- Patent number 7,608,390
- Issue date Oct 27, 2009
- International Business Machines Corporation
- Mahmoud Khojasteh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 7,563,563
- Issue date Jul 21, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Top coat material and use thereof in lithography processes
- Patent number 7,335,456
- Issue date Feb 26, 2008
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Underlayer compositions for multilayer lithographic processes
- Patent number 6,927,015
- Issue date Aug 9, 2005
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Grant
Underlayer compositions for multilayer lithographic processes
- Patent number 6,818,381
- Issue date Nov 16, 2004
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist compositions with polymers having pendant groups containing...
- Patent number 6,534,239
- Issue date Mar 18, 2003
- International Business Machines Corporation
- Pushkara Rao Varanasi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of reducing post-development defects in and around openings...
- Patent number 6,420,101
- Issue date Jul 16, 2002
- Infineon Technologies A G
- Zhijian Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing post-development defects in and around openings...
- Patent number 6,372,408
- Issue date Apr 16, 2002
- Infineon Technologies AG
- Zhijian Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition including polyalkylmethacrylate co-polymer...
- Patent number 5,561,194
- Issue date Oct 1, 1996
- International Business Machines Corporation
- Kathleen M. Cornett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CLEANABILITY ASSESSMENT OF SUBLIMATE FROM LITHOGRAPHY MATERIALS
- Publication number 20150369789
- Publication date Dec 24, 2015
- International Business Machines Corporation
- Mark S. Chace
- G01 - MEASURING TESTING
Information Patent Application
TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND A...
- Publication number 20100047712
- Publication date Feb 25, 2010
- International Business Machines Corporation
- Mahmoud Khojasteh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...
- Publication number 20090291392
- Publication date Nov 26, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
APPARATUS AND METHOD FOR MEASURING THE QUANTITY OF CONDENSABLE MATE...
- Publication number 20080248208
- Publication date Oct 9, 2008
- Mark Stephen Chace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES
- Publication number 20080166568
- Publication date Jul 10, 2008
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High Resolution Imaging Process Using an In-Situ Image Modifying Layer
- Publication number 20080145793
- Publication date Jun 19, 2008
- International Business Machines Corporation
- Kaushal Patel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES
- Publication number 20080038676
- Publication date Feb 14, 2008
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND A...
- Publication number 20080032228
- Publication date Feb 7, 2008
- International Business Machines Corporation
- Mahmoud Khojasteh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wet developable bottom antireflective coating composition and metho...
- Publication number 20070243484
- Publication date Oct 18, 2007
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top coat material and use thereof in lithography processes
- Publication number 20050266354
- Publication date Dec 1, 2005
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Underlayer compositions for multilayer lithographic processes
- Publication number 20050019704
- Publication date Jan 27, 2005
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Application
High resolution photoresist compositions
- Publication number 20030003391
- Publication date Jan 2, 2003
- Shipley Company, L.L.C.
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compositions with polymers having pendant groups containing...
- Publication number 20020182534
- Publication date Dec 5, 2002
- International Business Machines Corporation
- Pushkara Rao Varanasi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Underlayer compositions for multilayer lithographic processes
- Publication number 20020058204
- Publication date May 16, 2002
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE

Margaret C. Lawson

Person

Patents Grantslast 30 patents

Cleanability assessment of sublimate from lithography materials

Patterning process

Top antireflective coating composition containing hydrophobic and a...

Wet developable bottom antireflective coating composition and metho...

High resolution imaging process using an in-situ image modifying layer

Top coat material and use thereof in lithography processes

Top antireflective coating composition containing hydrophobic and a...

Wet developable bottom antireflective coating composition and metho...

Top coat material and use thereof in lithography processes

Underlayer compositions for multilayer lithographic processes

Underlayer compositions for multilayer lithographic processes

Resist compositions with polymers having pendant groups containing...

Method of reducing post-development defects in and around openings...

Method of reducing post-development defects in and around openings...

Photoresist composition including polyalkylmethacrylate co-polymer...

Patents Applicationslast 30 patents

CLEANABILITY ASSESSMENT OF SUBLIMATE FROM LITHOGRAPHY MATERIALS

TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND A...

WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...

APPARATUS AND METHOD FOR MEASURING THE QUANTITY OF CONDENSABLE MATE...

TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES

High Resolution Imaging Process Using an In-Situ Image Modifying Layer

TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES

TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND A...

Wet developable bottom antireflective coating composition and metho...

Top coat material and use thereof in lithography processes

Underlayer compositions for multilayer lithographic processes

High resolution photoresist compositions

Resist compositions with polymers having pendant groups containing...

Underlayer compositions for multilayer lithographic processes