Mark A. Fodor

Person

Redwood City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Confined process volume PECVD chamber
- Patent number 8,778,813
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Ramprakash Sankarakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber with heated chamber liner
- Patent number 8,444,926
- Issue date May 21, 2013
- Applied Materials, Inc.
- Mark A. Fodor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems for plasma enhanced chemical vapor deposition and bevel edg...
- Patent number 8,197,636
- Issue date Jun 12, 2012
- Applied Materials, Inc.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for centering a substrate in a process chamber
- Patent number 7,922,440
- Issue date Apr 12, 2011
- Applied Materials, Inc.
- Dale R. Du Bois
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate support with clamping electrical connector
- Patent number 7,354,288
- Issue date Apr 8, 2008
- Applied Materials, Inc.
- Kazutoshi Maehara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate heater assembly
- Patent number 7,024,105
- Issue date Apr 4, 2006
- Applied Materials Inc.
- Mark A. Fodor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for cleaning an exhaust line in a semiconducto...
- Patent number 6,689,930
- Issue date Feb 10, 2004
- Applied Materials Inc.
- Ben Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for cleaning an exhaust line in a semiconductor processin...
- Patent number 6,680,420
- Issue date Jan 20, 2004
- Applied Materials Inc.
- Ben Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for reducing perfluorocompound gases from subs...
- Patent number 6,517,913
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low profile thick film heaters in multi-slot bake chamber
- Patent number 6,506,994
- Issue date Jan 14, 2003
- Applied Materials, Inc.
- Yen-Kun Victor Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed frequency CVD process
- Patent number 6,358,573
- Issue date Mar 19, 2002
- Applied Materials, Inc.
- Sebastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heated electrostatic particle trap for in-situ vacuum line cleaning...
- Patent number 6,354,241
- Issue date Mar 12, 2002
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Parallel plate apparatus for in-situ vacuum line cleaning for subst...
- Patent number 6,193,802
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Ben Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for cleaning a vacuum line in a CVD system
- Patent number 6,194,628
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Ben Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for reducing perfluorocompound gases from subs...
- Patent number 6,187,072
- Issue date Feb 13, 2001
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed frequency CVD apparatus
- Patent number 6,098,568
- Issue date Aug 8, 2000
- Applied Materials, Inc.
- Sebastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic protection for heated metal surfaces of plasma processing c...
- Patent number 5,959,409
- Issue date Sep 28, 1999
- Applied Materials, Inc.
- Charles N. Dornfest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic susceptor with embedded metal electrode and brazing materia...
- Patent number 5,817,406
- Issue date Oct 6, 1998
- Applied Materials, Inc.
- David W. Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of filling pores in anodized aluminum parts
- Patent number 5,705,225
- Issue date Jan 6, 1998
- Applied Materials, Inc.
- Charles Dornfest
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Ceramic protection for heated metal surfaces of plasma processing c...
- Patent number 5,680,013
- Issue date Oct 21, 1997
- Applied Materials, Inc.
- Charles N. Dornfest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic susceptor with embedded metal electrode and eutectic connec...
- Patent number 5,633,073
- Issue date May 27, 1997
- Applied Materials, Inc.
- David W. Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterned susceptor to reduce electrostatic force in a CVD chamber
- Patent number 5,531,835
- Issue date Jul 2, 1996
- Applied Materials, Inc.
- Mark A. Fodor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slotted conical spring washer
- Patent number 5,496,142
- Issue date Mar 5, 1996
- Applied Materials, Inc.
- Mark A. Fodor
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...

Patents Applicationslast 30 patents

Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20160145742
- Publication date May 26, 2016
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...
- Publication number 20120211164
- Publication date Aug 23, 2012
- Applied Materials, Inc.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20120205046
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFINED PROCESS VOLUME PECVD CHAMBER
- Publication number 20110294303
- Publication date Dec 1, 2011
- Applied Materials, Inc.
- Ramprakash Sankarakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION
- Publication number 20110159211
- Publication date Jun 30, 2011
- Applied Materials, Inc.
- Dale R. Du Bois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIG FOOT LIFT PIN
- Publication number 20090314211
- Publication date Dec 24, 2009
- Applied Materials, Inc.
- Dale R. Du Bois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20090236214
- Publication date Sep 24, 2009
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE EDGE REGION
- Publication number 20090017635
- Publication date Jan 15, 2009
- APPLIED MATERIALS, INC.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CENTERING A SUBSTRATE IN A PROCESS CHAMBER
- Publication number 20090017228
- Publication date Jan 15, 2009
- Dale R. Du Bois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...
- Publication number 20090014127
- Publication date Jan 15, 2009
- APPLIED MATERIALS, INC.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH HEATED CHAMBER LINER
- Publication number 20080178797
- Publication date Jul 31, 2008
- MARK A. FODOR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDWARE DEVELOPMENT TO REDUCE BEVEL DEPOSITION
- Publication number 20080152838
- Publication date Jun 26, 2008
- Applied Materials, Inc.
- SOOVO SEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate support with clamping electrical connector
- Publication number 20060272774
- Publication date Dec 7, 2006
- APPLIED MATERIALS, INC.
- Kazutoshi Maehara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hardware development to reduce bevel deposition
- Publication number 20050196971
- Publication date Sep 8, 2005
- Applied Materials, Inc.
- Soovo Sen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process kit design for deposition chamber
- Publication number 20050150452
- Publication date Jul 14, 2005
- Soovo Sen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate heater assembly
- Publication number 20050078953
- Publication date Apr 14, 2005
- APPLIED MATERIALS, INC.
- Mark A. Fodor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW PROFILE THICK FILM HEATERS IN MULTI-SLOT BAKE CHAMBER
- Publication number 20020190051
- Publication date Dec 19, 2002
- APPLIED MATERIALS, INC.
- Yen-Kun Victor Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for cleaning a vacuum line in a CVD system
- Publication number 20010016674
- Publication date Aug 23, 2001
- Applied Materials , Inc.
- Ben Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mark A. Fodor

Person

Patents Grantslast 30 patents

Confined process volume PECVD chamber

Processing chamber with heated chamber liner

Systems for plasma enhanced chemical vapor deposition and bevel edg...

Apparatus and method for centering a substrate in a process chamber

Substrate support with clamping electrical connector

Substrate heater assembly

Method and apparatus for cleaning an exhaust line in a semiconducto...

Apparatus for cleaning an exhaust line in a semiconductor processin...

Method and apparatus for reducing perfluorocompound gases from subs...

Low profile thick film heaters in multi-slot bake chamber

Mixed frequency CVD process

Heated electrostatic particle trap for in-situ vacuum line cleaning...

Parallel plate apparatus for in-situ vacuum line cleaning for subst...

Method and apparatus for cleaning a vacuum line in a CVD system

Method and apparatus for reducing perfluorocompound gases from subs...

Mixed frequency CVD apparatus

Ceramic protection for heated metal surfaces of plasma processing c...

Ceramic susceptor with embedded metal electrode and brazing materia...

Method of filling pores in anodized aluminum parts

Ceramic protection for heated metal surfaces of plasma processing c...

Ceramic susceptor with embedded metal electrode and eutectic connec...

Patterned susceptor to reduce electrostatic force in a CVD chamber

Slotted conical spring washer

Patents Applicationslast 30 patents

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

CONFINED PROCESS VOLUME PECVD CHAMBER

SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION

BIG FOOT LIFT PIN

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE EDGE REGION

APPARATUS AND METHOD FOR CENTERING A SUBSTRATE IN A PROCESS CHAMBER

SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...

PROCESSING CHAMBER WITH HEATED CHAMBER LINER

HARDWARE DEVELOPMENT TO REDUCE BEVEL DEPOSITION

Substrate support with clamping electrical connector

Hardware development to reduce bevel deposition

Process kit design for deposition chamber

Substrate heater assembly

LOW PROFILE THICK FILM HEATERS IN MULTI-SLOT BAKE CHAMBER

Method and apparatus for cleaning a vacuum line in a CVD system