Martin Dauelsberg

Person

Aachen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Temperature-controlled gas supply line with dilution gas flows supp...
- Patent number 10,472,718
- Issue date Nov 12, 2019
- Aixtron SE
- Markus Gersdorff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distributor for a CVD reactor
- Patent number 10,221,482
- Issue date Mar 5, 2019
- Aixtron SE
- Thomas Krücken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas inlet member of a CVD reactor
- Patent number 9,587,312
- Issue date Mar 7, 2017
- Aixtron SE
- Hugo Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor having a process-chamber ceiling which can be lowered
- Patent number 8,157,915
- Issue date Apr 17, 2012
- Aixtron Inc.
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor comprising a gas inlet member
- Patent number 8,152,924
- Issue date Apr 10, 2012
- Aixtron Inc.
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inlet system for an MOCVD reactor
- Patent number 7,625,448
- Issue date Dec 1, 2009
- Aixtron AG
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas-admission element for CVD processes, and device
- Patent number 7,294,207
- Issue date Nov 13, 2007
- Aixtron AG
- Gerd Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing in particular crystalline layers, and device...
- Patent number 6,972,050
- Issue date Dec 6, 2005
- Aixtron AG
- Michael Bremser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing in particular crystalline layers
- Patent number 6,932,866
- Issue date Aug 23, 2005
- Aixtron AG
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for depositing one or more layers on a substrate
- Patent number 6,849,241
- Issue date Feb 1, 2005
- Aixtron AG
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR IDENTIFYING SUBSTRATES WHICH ARE FAULTY OR HAVE BEEN INC...
- Publication number 20230295807
- Publication date Sep 21, 2023
- AIXTRON SE
- Utz Herwig HAHN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE-CONTROLLED GAS SUPPLY LINE WITH DILUTION GAS FLOWS SUPP...
- Publication number 20180265984
- Publication date Sep 20, 2018
- AIXTRON SE
- Markus GERSDORFF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INLET MEMBER OF A CVD REACTOR
- Publication number 20150007771
- Publication date Jan 8, 2015
- AIXTRON SE
- Hugo Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas distributor for a CVD reactor
- Publication number 20140231550
- Publication date Aug 21, 2014
- Thomas Krücken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner...
- Publication number 20120263877
- Publication date Oct 18, 2012
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD REACTOR
- Publication number 20120156396
- Publication date Jun 21, 2012
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOLATION FOR MULTI-SINGLE-WAFER PROCESSING APPARATUS
- Publication number 20100012036
- Publication date Jan 21, 2010
- Hugo Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD REACTOR HAVING A PROCESS-CHAMBER CEILING WHICH CAN BE LOWERED
- Publication number 20090064935
- Publication date Mar 12, 2009
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cvd Reactor Comprising a Gas Inlet Member
- Publication number 20080308040
- Publication date Dec 18, 2008
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SMALL VOLUME SYMMETRIC FLOW SINGLE WAFER ALD APPARATUS
- Publication number 20080072821
- Publication date Mar 27, 2008
- Jeremic J. Dalton
- C30 - CRYSTAL GROWTH
Information Patent Application
Inlet system for an MOCVD reactor
- Publication number 20080069953
- Publication date Mar 20, 2008
- Aixtron AG
- Martin Dauelsberg
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for depositing in particular crystalline layers
- Publication number 20050011435
- Publication date Jan 20, 2005
- Martin Dauelsberg
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for depositing in particular crystalline layers, and device...
- Publication number 20040013801
- Publication date Jan 22, 2004
- Michael Bremser
- C30 - CRYSTAL GROWTH
Information Patent Application
Gas-admission element for CVD processes, and device
- Publication number 20030177977
- Publication date Sep 25, 2003
- Gerd Strauch
- C30 - CRYSTAL GROWTH
Information Patent Application
Device and method for depositing one or more layers on a substrate
- Publication number 20030056720
- Publication date Mar 27, 2003
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Martin Dauelsberg

Person

Patents Grantslast 30 patents

Temperature-controlled gas supply line with dilution gas flows supp...

Gas distributor for a CVD reactor

Gas inlet member of a CVD reactor

CVD reactor having a process-chamber ceiling which can be lowered

CVD reactor comprising a gas inlet member

Inlet system for an MOCVD reactor

Gas-admission element for CVD processes, and device

Method for depositing in particular crystalline layers, and device...

Method for depositing in particular crystalline layers

Device and method for depositing one or more layers on a substrate

Patents Applicationslast 30 patents

METHOD FOR IDENTIFYING SUBSTRATES WHICH ARE FAULTY OR HAVE BEEN INC...

TEMPERATURE-CONTROLLED GAS SUPPLY LINE WITH DILUTION GAS FLOWS SUPP...

GAS INLET MEMBER OF A CVD REACTOR

Gas distributor for a CVD reactor

CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner...

CVD REACTOR

ISOLATION FOR MULTI-SINGLE-WAFER PROCESSING APPARATUS

CVD REACTOR HAVING A PROCESS-CHAMBER CEILING WHICH CAN BE LOWERED

Cvd Reactor Comprising a Gas Inlet Member

SMALL VOLUME SYMMETRIC FLOW SINGLE WAFER ALD APPARATUS

Inlet system for an MOCVD reactor

Method for depositing in particular crystalline layers

Method for depositing in particular crystalline layers, and device...

Gas-admission element for CVD processes, and device

Device and method for depositing one or more layers on a substrate