Martin Schriever

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Measuring system for measuring an imaging quality of an EUV lens
- Patent number 9,494,483
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Ralf Frese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for the optical measurement of an optical system...
- Patent number 8,836,929
- Issue date Sep 16, 2014
- Carl Zeiss SMT GmbH
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical apparatus and method for modifying the imaging behavior of...
- Patent number 8,169,595
- Issue date May 1, 2012
- Carl Zeiss SMT GmbH
- Martin Schriever
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for the optical measurement of an optical system...
- Patent number 8,120,763
- Issue date Feb 21, 2012
- Carl Zeiss SMT GmbH
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing imaging performance
- Patent number 7,570,345
- Issue date Aug 4, 2009
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical measuring apparatus and operating method for imaging error...
- Patent number 7,436,521
- Issue date Oct 14, 2008
- Carl Zeiss SMT AG
- Wolfgang Emer
- G01 - MEASURING TESTING
Information Patent Grant
Device and method for wavefront measurement of an optical imaging s...
- Patent number 7,417,745
- Issue date Aug 26, 2008
- Carl Zeiss SMT AG
- Helmut Haidner
- G01 - MEASURING TESTING
Information Patent Grant
Device and method for the optical measurement of an optical system...
- Patent number 7,408,652
- Issue date Aug 5, 2008
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffuser, wavefront source, wavefront sensor and projection exposur...
- Patent number 7,388,696
- Issue date Jun 17, 2008
- Carl Zeiss SMT AG
- Martin Schriever
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for measuring the wavefront of an optical system
- Patent number 7,336,371
- Issue date Feb 26, 2008
- Carl Zeiss SMT AG
- Helmut Haidner
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for wavefront detection
- Patent number 7,333,216
- Issue date Feb 19, 2008
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining the influencing of the state o...
- Patent number 7,286,245
- Issue date Oct 23, 2007
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G01 - MEASURING TESTING
Information Patent Grant
Method of optimizing imaging performance
- Patent number 7,233,386
- Issue date Jun 19, 2007
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining optical properties and projection exposure sy...
- Patent number 7,230,220
- Issue date Jun 12, 2007
- Carl Zeiss SMT AG
- Steffen Lauer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric measuring device and projection exposure installati...
- Patent number 7,158,237
- Issue date Jan 2, 2007
- Carl Zeiss SMT AG
- Martin Schriever
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 7,113,260
- Issue date Sep 26, 2006
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,972,831
- Issue date Dec 6, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,950,174
- Issue date Sep 27, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Process for the decontamination of microlithographic projection exp...
- Patent number 6,936,825
- Issue date Aug 30, 2005
- Carl Zeiss SMT AG
- Michael Gerhard
- B08 - CLEANING
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,930,758
- Issue date Aug 16, 2005
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system for microlithography and method for gene...
- Patent number 6,822,729
- Issue date Nov 23, 2004
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Measuring System for Measuring an Imaging Quality of an EUV Lens
- Publication number 20150009492
- Publication date Jan 8, 2015
- Carl Zeiss SMT GMBH
- Ralf Frese
- G01 - MEASURING TESTING
Information Patent Application
DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...
- Publication number 20140022524
- Publication date Jan 23, 2014
- Carl Zeiss SMT GMBH
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...
- Publication number 20120113429
- Publication date May 10, 2012
- Carl Zeiss SMT GMBH
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...
- Publication number 20090257049
- Publication date Oct 15, 2009
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL APPARATUS AND METHOD FOR MODIFYING THE IMAGING BEHAVIOR OF...
- Publication number 20090174876
- Publication date Jul 9, 2009
- Carl Zeiss SMT AG
- Martin Schriever
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...
- Publication number 20090021726
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR WAVEFRONT DETECTION
- Publication number 20080144043
- Publication date Jun 19, 2008
- Carl Zeiss SMT AG
- Ulrich WEGMANN
- G01 - MEASURING TESTING
Information Patent Application
Method For Structuring A Substrate Using Multiple Exposure
- Publication number 20080036982
- Publication date Feb 14, 2008
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING THE INFLUENCING OF THE STATE O...
- Publication number 20080037905
- Publication date Feb 14, 2008
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G02 - OPTICS
Information Patent Application
Method of optimizing imaging performance
- Publication number 20080007706
- Publication date Jan 10, 2008
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFEROMETRIC MEASURING DEVICE AND PROJECTION EXPOSURE INSTALLATI...
- Publication number 20070046912
- Publication date Mar 1, 2007
- Carl Zeiss SMT AG
- Martin Schriever
- G02 - OPTICS
Information Patent Application
Method of determining optical properties and projection exposure sy...
- Publication number 20060231731
- Publication date Oct 19, 2006
- Carl Zeiss SMT AG
- Steffen Lauer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical measuring apparatus and operating method for an optical ima...
- Publication number 20060119838
- Publication date Jun 8, 2006
- Carl Zeiss SMT AG
- Wolfgang Emer
- G01 - MEASURING TESTING
Information Patent Application
Diffuser, wavefront source, wavefront sensor and projection exposur...
- Publication number 20060109533
- Publication date May 25, 2006
- Carl Zeiss SMT AG
- Martin Schriever
- G02 - OPTICS
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20060023193
- Publication date Feb 2, 2006
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Interferometric measuring device and projection exposure installati...
- Publication number 20050264827
- Publication date Dec 1, 2005
- Carl Zeiss SMT AG
- Martin Schriever
- G02 - OPTICS
Information Patent Application
Device and method for the optical measurement of an optical system,...
- Publication number 20050243328
- Publication date Nov 3, 2005
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of optimizing imaging performance
- Publication number 20050237506
- Publication date Oct 27, 2005
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20050083506
- Publication date Apr 21, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20050083507
- Publication date Apr 21, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Device and method for wavefront measurement of an optical imaging s...
- Publication number 20050007602
- Publication date Jan 13, 2005
- Carl Zeiss SMT AG
- Helmut Haidner
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for determining the influencing of the state o...
- Publication number 20040114150
- Publication date Jun 17, 2004
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G02 - OPTICS
Information Patent Application
Apparatus for wavefront detection
- Publication number 20020001088
- Publication date Jan 3, 2002
- Ulrich Wegmann
- G01 - MEASURING TESTING
Information Patent Application
Process for the decontamination of microlithographic projection exp...
- Publication number 20010026402
- Publication date Oct 4, 2001
- Michael Gerhard
- B08 - CLEANING
Information Patent Application
Projection exposure system for microlithography and method for gene...
- Publication number 20010019404
- Publication date Sep 6, 2001
- Karl-Heinz Schuster
- G02 - OPTICS

Martin Schriever

Person

Patents Grantslast 30 patents

Measuring system for measuring an imaging quality of an EUV lens

Device and method for the optical measurement of an optical system...

Optical apparatus and method for modifying the imaging behavior of...

Device and method for the optical measurement of an optical system...

Method of optimizing imaging performance

Optical measuring apparatus and operating method for imaging error...

Device and method for wavefront measurement of an optical imaging s...

Device and method for the optical measurement of an optical system...

Diffuser, wavefront source, wavefront sensor and projection exposur...

Apparatus and method for measuring the wavefront of an optical system

Apparatus for wavefront detection

Method and apparatus for determining the influencing of the state o...

Method of optimizing imaging performance

Method of determining optical properties and projection exposure sy...

Interferometric measuring device and projection exposure installati...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Process for the decontamination of microlithographic projection exp...

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Patents Applicationslast 30 patents

Measuring System for Measuring an Imaging Quality of an EUV Lens

DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...

DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...

DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...

OPTICAL APPARATUS AND METHOD FOR MODIFYING THE IMAGING BEHAVIOR OF...

DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM...

APPARATUS FOR WAVEFRONT DETECTION

Method For Structuring A Substrate Using Multiple Exposure

METHOD AND APPARATUS FOR DETERMINING THE INFLUENCING OF THE STATE O...

Method of optimizing imaging performance

INTERFEROMETRIC MEASURING DEVICE AND PROJECTION EXPOSURE INSTALLATI...

Method of determining optical properties and projection exposure sy...

Optical measuring apparatus and operating method for an optical ima...

Diffuser, wavefront source, wavefront sensor and projection exposur...

Projection exposure system for microlithography and method for gene...

Interferometric measuring device and projection exposure installati...

Device and method for the optical measurement of an optical system,...

Method of optimizing imaging performance

Projection exposure system for microlithography and method for gene...

Projection exposure system for microlithography and method for gene...

Device and method for wavefront measurement of an optical imaging s...

Method and apparatus for determining the influencing of the state o...

Apparatus for wavefront detection

Process for the decontamination of microlithographic projection exp...

Projection exposure system for microlithography and method for gene...