Masahide Okumura

Person

Sagamihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,583,431
- Issue date Jun 24, 2003
- Hitachi, Ltd.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,555,833
- Issue date Apr 29, 2003
- Hitachi, Ltd.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,509,572
- Issue date Jan 21, 2003
- Hitachi, Ltd.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,441,383
- Issue date Aug 27, 2002
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure method and apparatus and semiconductor devic...
- Patent number 6,403,973
- Issue date Jun 11, 2002
- Hitachi, Ltd.
- Hiroyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,329,665
- Issue date Dec 11, 2001
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,320,198
- Issue date Nov 20, 2001
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,262,428
- Issue date Jul 17, 2001
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of fabricating semiconductor circuit devices utilizing multi...
- Patent number 6,159,644
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Hidetoshi Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,121,625
- Issue date Sep 19, 2000
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam writing system
- Patent number 5,650,631
- Issue date Jul 22, 1997
- Hitachi, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 5,424,550
- Issue date Jun 13, 1995
- Hitachi, Ltd.
- Masamichi Kawano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 5,281,827
- Issue date Jan 25, 1994
- Hitachi, Ltd.
- Masamichi Kawano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Piezoelectric actuator control apparatus
- Patent number 4,841,191
- Issue date Jun 20, 1989
- Hitachi, Ltd.
- Keiji Takada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography system
- Patent number 4,829,444
- Issue date May 9, 1989
- Hitachi, Ltd.
- Norio Saitou
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mark position detection system for use in charged particle beam app...
- Patent number 4,808,829
- Issue date Feb 28, 1989
- Hitachi Ltd.
- Masahide Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus
- Patent number 4,701,620
- Issue date Oct 20, 1987
- Hitachi, Ltd.
- Masahide Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography apparatus
- Patent number 4,692,579
- Issue date Sep 8, 1987
- Hitachi, Ltd.
- Norio Saitou
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam microprobe apparatus
- Patent number 4,670,652
- Issue date Jun 2, 1987
- Hitachi, Ltd.
- Mikio Ichihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small-dimension measurement system by scanning electron beam
- Patent number 4,600,839
- Issue date Jul 15, 1986
- Hitachi, Ltd.
- Mikio Ichihashi
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam control system
- Patent number 4,437,008
- Issue date Mar 13, 1984
- Nippon Telegraph & Telephone Public Corporation
- Tadahito Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum valve apparatus
- Patent number 4,099,704
- Issue date Jul 11, 1978
- Hitachi, Ltd.
- Masahide Okumura
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
SEM having D-C bias of video signal controlled by maximum and/or mi...
- Patent number 4,099,054
- Issue date Jul 4, 1978
- Hitachi, Ltd.
- Masahide Okumura
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Charged particle beam lithography apparatus for forming pattern on...
- Publication number 20020179856
- Publication date Dec 5, 2002
- Hitachi, Ltd
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam lithography apparatus for forming pattern on...
- Publication number 20020100881
- Publication date Aug 1, 2002
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam lithography apparatus for forming pattern on...
- Publication number 20020096651
- Publication date Jul 25, 2002
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY

Masahide Okumura

Person

Patents Grantslast 30 patents

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Electron beam exposure method and apparatus and semiconductor devic...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Method of fabricating semiconductor circuit devices utilizing multi...

Charged particle beam lithography apparatus for forming pattern on...

Electron beam writing system

Charged particle beam exposure apparatus

Charged particle beam exposure apparatus

Piezoelectric actuator control apparatus

Charged particle beam lithography system

Mark position detection system for use in charged particle beam app...

Electron beam exposure apparatus

Electron beam lithography apparatus

Charged particle beam microprobe apparatus

Small-dimension measurement system by scanning electron beam

Electron beam control system

Vacuum valve apparatus

SEM having D-C bias of video signal controlled by maximum and/or mi...

Patents Applicationslast 30 patents

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...