Masakazu Isozaki

Person

  • Shunan, JP

Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,825,657
    • Issue date Nov 3, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Kenetsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Ring for a plasma processing apparatus

    • Patent number D891636
    • Issue date Jul 28, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Masakazu Isozaki
    • D24 - Medical and laboratory equipment
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,600,617
    • Issue date Mar 24, 2020
    • Hitachi High-Technologies Corporation
    • Masakazu Isozaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Electrode plate peripheral ring for a plasma processing apparatus

    • Patent number D871609
    • Issue date Dec 31, 2019
    • Hitachi High-Technologies Corporation
    • Masakazu Isozaki
    • D24 - Medical and laboratory equipment
  • Information Patent Grant

    Electrode cover for a plasma processing apparatus

    • Patent number D870314
    • Issue date Dec 17, 2019
    • Hitachi High-Technologies Corporation
    • Masakazu Isozaki
    • D24 - Medical and laboratory equipment
  • Information Patent Grant

    Electrode plate for a plasma processing apparatus

    • Patent number D868993
    • Issue date Dec 3, 2019
    • Hitachi High-Technologies Corporation
    • Masakazu Isozaki
    • D24 - Medical and laboratory equipment
  • Information Patent Grant

    Vacuum processing apparatus

    • Patent number 10,121,686
    • Issue date Nov 6, 2018
    • Hitachi High-Technologies Corporation
    • Yoshifumi Ogawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Vacuum processing apparatus

    • Patent number 8,100,620
    • Issue date Jan 24, 2012
    • Hitachi High-Technologies Corporation
    • Masakazu Isozaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Electrode cover for a plasma processing apparatus

    • Patent number D557226
    • Issue date Dec 11, 2007
    • Hitachi High-Technologies Corporation
    • Takeo Uchino
    • D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

  • Information Patent Application

    VACUUM PROCESSING APPARATUS

    • Publication number 20240297058
    • Publication date Sep 5, 2024
    • Hitachi High-Tech Corporation
    • Chen Pin HSU
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20220157576
    • Publication date May 19, 2022
    • Hitachi High-Tech Corporation
    • Taku Iwase
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20200234924
    • Publication date Jul 23, 2020
    • Hitachi High-Technologies Corporation
    • Kenetsu YOKOGAWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20190214235
    • Publication date Jul 11, 2019
    • Hitachi High-Technologies Corporation
    • Kenetsu YOKOGAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20190189396
    • Publication date Jun 20, 2019
    • Hitachi High-Technologies Corporation
    • Taku IWASE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    VACUUM PROCESSING APPARATUS

    • Publication number 20160379857
    • Publication date Dec 29, 2016
    • Hitachi High-Technologies Corporation
    • Yoshifumi OGAWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20150243486
    • Publication date Aug 27, 2015
    • Hitachi High-Technologies Corporation
    • Kenetsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING APPARATUS AND METHOD OF OPERATING THE SAME

    • Publication number 20140044502
    • Publication date Feb 13, 2014
    • Takashi UEMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

    • Publication number 20120093617
    • Publication date Apr 19, 2012
    • Hitachi High-Technologies Corporation
    • Yutaka Kudou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING SYSTEM

    • Publication number 20120067521
    • Publication date Mar 22, 2012
    • Hitachi High-Technologies Corporation
    • Takahiro SHIMOMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING APPARATUS

    • Publication number 20120067522
    • Publication date Mar 22, 2012
    • Hitachi High-Technologies Corporation
    • Takahiro SHIMOMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus

    • Publication number 20100186672
    • Publication date Jul 29, 2010
    • Koji Okuda
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Vacuum processing apparatus

    • Publication number 20100163185
    • Publication date Jul 1, 2010
    • Michiaki Kobayashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING APPARATUS

    • Publication number 20090324367
    • Publication date Dec 31, 2009
    • Masakazu Isozaki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING APPARATUS

    • Publication number 20090165952
    • Publication date Jul 2, 2009
    • Susumu Tauchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Sample table and plasma processing apparatus provided with the same

    • Publication number 20070267145
    • Publication date Nov 22, 2007
    • Hiroho Kitada
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Vacuum processing system

    • Publication number 20070044916
    • Publication date Mar 1, 2007
    • Masakazu Isozaki
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Electrostatic chuck, wafer processing apparatus and plasma processi...

    • Publication number 20060291132
    • Publication date Dec 28, 2006
    • Seiichiro Kanno
    • H01 - BASIC ELECTRIC ELEMENTS