Masaki Hasegawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam device
- Patent number 11,515,121
- Issue date Nov 29, 2022
- HITACHI HIGH-TECH CORPORATION
- Tomohiko Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer inspection apparatus and wafer inspection method
- Patent number 11,342,211
- Issue date May 24, 2022
- HITACHI HIGH-TECH CORPORATION
- Akira Doi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor substrate for evaluation and method using same to eva...
- Patent number 11,193,895
- Issue date Dec 7, 2021
- HITACHI HIGH-TECH CORPORATION
- Kentaro Ohira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device
- Patent number 11,107,655
- Issue date Aug 31, 2021
- Hitachi High-Technologies Corporation
- Tomohiko Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect inspection method and defect inspection device
- Patent number 11,002,687
- Issue date May 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, and method of adjusting charged pa...
- Patent number 10,923,315
- Issue date Feb 16, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and method for adjusting charged parti...
- Patent number 10,522,320
- Issue date Dec 31, 2019
- Hitachi High-Technologies Corporation
- Tomohiko Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mirror ion microscope and ion beam control method
- Patent number 10,304,657
- Issue date May 28, 2019
- Hitachi, Ltd.
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection equipment
- Patent number 9,460,891
- Issue date Oct 4, 2016
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 8,766,185
- Issue date Jul 1, 2014
- Hitachi, Ltd.
- Tomokazu Shimakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphical user interface for use with electron beam wafer inspection
- Patent number 8,502,141
- Issue date Aug 6, 2013
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device
- Patent number 8,410,438
- Issue date Apr 2, 2013
- Hitachi, Ltd.
- Tomokazu Shimakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection method and electron beam inspection apparatus
- Patent number 8,288,722
- Issue date Oct 16, 2012
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Ion beam system and machining method
- Patent number 7,952,083
- Issue date May 31, 2011
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection method and electron beam inspection apparatus
- Patent number 7,863,565
- Issue date Jan 4, 2011
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system and inspection method
- Patent number 7,755,776
- Issue date Jul 13, 2010
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for pattern inspection
- Patent number 7,566,871
- Issue date Jul 28, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern defect inspection method and apparatus thereof
- Patent number 7,547,884
- Issue date Jun 16, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting pattern defects and mirror elec...
- Patent number 7,521,676
- Issue date Apr 21, 2009
- Hitachi High-Technologies Corporation
- Hirohito Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and electron beam inspection system
- Patent number 7,394,066
- Issue date Jul 1, 2008
- Hitachi High-Technologies Corporation
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam system and machining method
- Patent number 7,326,942
- Issue date Feb 5, 2008
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 7,288,948
- Issue date Oct 30, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 7,242,015
- Issue date Jul 10, 2007
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 6,979,823
- Issue date Dec 27, 2005
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 6,797,954
- Issue date Sep 28, 2004
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern usin...
- Patent number 6,476,390
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Hisaya Murakoshi
- G01 - MEASURING TESTING
Information Patent Grant
Cement, cement products, molding material, concrete member and a me...
- Patent number 5,651,816
- Issue date Jul 29, 1997
- Maeta Concrete Industry Ltd.
- Tadashi Kobayashi
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Cement, cement products, molding material, a concrete member and a...
- Patent number 5,614,009
- Issue date Mar 25, 1997
- Maeta Concrete Industry Ltd.
- Tadashi Kobayashi
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Cement, cement products, molding material, a concrete member and a...
- Patent number 5,609,680
- Issue date Mar 11, 1997
- Maeta Concrete Industry Ltd.
- Tadashi Kobayashi
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Tetravinylpyrazine compound, method for preparing same and electrol...
- Patent number 5,416,213
- Issue date May 16, 1995
- Mitsui Toatsu Chemicals, Inc.
- Masaki Hasegawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
LABELED TRAINING DATA CREATION ASSISTANCE DEVICE AND LABELED TRAINI...
- Publication number 20250054270
- Publication date Feb 13, 2025
- Hitachi High-Tech Corporation
- Toshinori YAMAUCHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMAGE RECOGNITION SYSTEM
- Publication number 20220392187
- Publication date Dec 8, 2022
- HITACHI HIGH-TECH CORPORATION
- Toshinori YAMAUCHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Defect Inspection Device and Defect Inspection Method
- Publication number 20220107280
- Publication date Apr 7, 2022
- Hitachi High-Tech Corporation
- Kentaro OHIRA
- G01 - MEASURING TESTING
Information Patent Application
MIRROR ELECTRONIC INSPECTION DEVICE
- Publication number 20210313138
- Publication date Oct 7, 2021
- HITACHI HIGH-TECH CORPORATION
- Masahiro YAMAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER INSPECTION APPARATUS AND WAFER INSPECTION METHOD
- Publication number 20210118710
- Publication date Apr 22, 2021
- HITACHI HIGH-TECH CORPORATION
- Akira DOI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Substrate for Evaluation and Method Using Same to Eva...
- Publication number 20200340930
- Publication date Oct 29, 2020
- Hitachi High-Tech Corporation
- Kentaro OHIRA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Defect Inspection Method and Defect Inspection Device
- Publication number 20200292466
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Masaki HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20200279714
- Publication date Sep 3, 2020
- Hitachi High-Technologies Corporation
- Tomohiko OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam Device
- Publication number 20200152415
- Publication date May 14, 2020
- Hitachi High-Technologies Corporation
- Tomohiko OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus, and Method of Adjusting Charged Pa...
- Publication number 20190378685
- Publication date Dec 12, 2019
- Hitachi High-Technologies Corporation
- Masaki HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Method for Adjusting Charged Parti...
- Publication number 20190108969
- Publication date Apr 11, 2019
- Hitachi High-Technologies Corporation
- Tomohiko OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect Inspection Device
- Publication number 20190079025
- Publication date Mar 14, 2019
- Masaki HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mirror Ion Microscope and Ion Beam Control Method
- Publication number 20180025888
- Publication date Jan 25, 2018
- Hitachi, Ltd
- Hiroyasu SHICHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection Equipment
- Publication number 20160203946
- Publication date Jul 14, 2016
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20110284746
- Publication date Nov 24, 2011
- Hitachi, Ltd
- Tomokazu SHIMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION Beam System and Machining Method
- Publication number 20110204225
- Publication date Aug 25, 2011
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection method and electron beam inspection apparatus
- Publication number 20110068267
- Publication date Mar 24, 2011
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20100181480
- Publication date Jul 22, 2010
- Hitachi, Ltd
- Tomokazu SHIMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for pattern inspection
- Publication number 20090261252
- Publication date Oct 22, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron beam inspection method and electron beam inspection apparatus
- Publication number 20080315093
- Publication date Dec 25, 2008
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Electron Microscope And Electron Beam Inspection System
- Publication number 20080265161
- Publication date Oct 30, 2008
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam System And Machining method
- Publication number 20080135779
- Publication date Jun 12, 2008
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
Inspection system and inspection method
- Publication number 20080073533
- Publication date Mar 27, 2008
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for pattern inspection
- Publication number 20070272857
- Publication date Nov 29, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for inspecting pattern defects and mirror elec...
- Publication number 20070194229
- Publication date Aug 23, 2007
- Hirohito Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron microscope and electron bean inspection system.
- Publication number 20070181808
- Publication date Aug 9, 2007
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern defect inspection method and apparatus thereof
- Publication number 20070085005
- Publication date Apr 19, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Ion beam system and machining method
- Publication number 20060065854
- Publication date Mar 30, 2006
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20060017014
- Publication date Jan 26, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Electron microscope and electron beam inspection system
- Publication number 20060011835
- Publication date Jan 19, 2006
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS

Masaki Hasegawa

Person

Patents Grantslast 30 patents

Electron beam device

Wafer inspection apparatus and wafer inspection method

Semiconductor substrate for evaluation and method using same to eva...

Charged particle beam device

Defect inspection method and defect inspection device

Charged particle beam apparatus, and method of adjusting charged pa...

Charged particle beam device and method for adjusting charged parti...

Mirror ion microscope and ion beam control method

Inspection equipment

Charged particle beam device

Graphical user interface for use with electron beam wafer inspection

Charged particle beam device

Electron beam inspection method and electron beam inspection apparatus

Ion beam system and machining method

Electron beam inspection method and electron beam inspection apparatus

Inspection system and inspection method

Method and apparatus for pattern inspection

Pattern defect inspection method and apparatus thereof

Method and apparatus for inspecting pattern defects and mirror elec...

Electron microscope and electron beam inspection system

Ion beam system and machining method

Patterned wafer inspection method and apparatus therefor

Patterned wafer inspection method and apparatus therefor

Patterned wafer inspection method and apparatus therefor

Patterned wafer inspection method and apparatus therefor

Method and apparatus for inspecting integrated circuit pattern usin...

Cement, cement products, molding material, concrete member and a me...

Cement, cement products, molding material, a concrete member and a...

Cement, cement products, molding material, a concrete member and a...

Tetravinylpyrazine compound, method for preparing same and electrol...

Patents Applicationslast 30 patents

LABELED TRAINING DATA CREATION ASSISTANCE DEVICE AND LABELED TRAINI...

IMAGE RECOGNITION SYSTEM

Defect Inspection Device and Defect Inspection Method

MIRROR ELECTRONIC INSPECTION DEVICE

WAFER INSPECTION APPARATUS AND WAFER INSPECTION METHOD

Semiconductor Substrate for Evaluation and Method Using Same to Eva...

Defect Inspection Method and Defect Inspection Device

Charged Particle Beam Device

Electron Beam Device

Charged Particle Beam Apparatus, and Method of Adjusting Charged Pa...

Charged Particle Beam Device and Method for Adjusting Charged Parti...

Defect Inspection Device

Mirror Ion Microscope and Ion Beam Control Method

Inspection Equipment

CHARGED PARTICLE BEAM DEVICE

ION Beam System and Machining Method

Electron beam inspection method and electron beam inspection apparatus

CHARGED PARTICLE BEAM DEVICE

Method and apparatus for pattern inspection

Electron beam inspection method and electron beam inspection apparatus

Electron Microscope And Electron Beam Inspection System

Ion Beam System And Machining method

Inspection system and inspection method

Method and apparatus for pattern inspection

Method and apparatus for inspecting pattern defects and mirror elec...

Electron microscope and electron bean inspection system.

Pattern defect inspection method and apparatus thereof

Ion beam system and machining method

Patterned wafer inspection method and apparatus therefor

Electron microscope and electron beam inspection system