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Matsutaro Miyamoto

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Patents Grantslast 30 patents

  • Information Patent Grant

    Holder for holding substrate and system for plating
    • Patent number 11,718,925
    • Issue date Aug 8, 2023
    • Ebara Corporation
    • Shota Moriyama
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder
    • Patent number 11,697,886
    • Issue date Jul 11, 2023
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder
    • Patent number 11,676,837
    • Issue date Jun 13, 2023
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Contact structure, substrate holder, apparatus for plating, and met...
    • Patent number 11,668,018
    • Issue date Jun 6, 2023
    • Ebara Corporation
    • Matsutaro Miyamoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Substrate holder
    • Patent number 11,542,625
    • Issue date Jan 3, 2023
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder, plating apparatus, method for manufacturing subst...
    • Patent number 11,384,447
    • Issue date Jul 12, 2022
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Holder for holding substrate and system for plating
    • Patent number 11,299,817
    • Issue date Apr 12, 2022
    • Ebara Corporation
    • Shota Moriyama
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Electrical contact
    • Patent number D948438
    • Issue date Apr 12, 2022
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Substrate holder and plating apparatus with substrate holder
    • Patent number 11,248,308
    • Issue date Feb 15, 2022
    • Ebara Corporation
    • Shoichiro Ogata
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Method for holding substrate on substrate holder
    • Patent number 11,236,435
    • Issue date Feb 1, 2022
    • Ebara Corporation
    • Matsutaro Miyamoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Substrate holder, plating device, and plating method of substrate
    • Patent number 11,232,972
    • Issue date Jan 25, 2022
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Seal used for substrate holder
    • Patent number 11,214,888
    • Issue date Jan 4, 2022
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Electrical contact
    • Patent number D910579
    • Issue date Feb 16, 2021
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Electrical contact
    • Patent number D908640
    • Issue date Jan 26, 2021
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Substrate holder and plating apparatus using the same
    • Patent number 10,793,967
    • Issue date Oct 6, 2020
    • Ebara Corporation
    • Matsutaro Miyamoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Substrate holder and plating apparatus using the same
    • Patent number 10,738,390
    • Issue date Aug 11, 2020
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder, plating apparatus, and method for manufacturing s...
    • Patent number 10,577,713
    • Issue date Mar 3, 2020
    • Ebara Corporation
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Electrical contact
    • Patent number D847762
    • Issue date May 7, 2019
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Electrical contact
    • Patent number D839839
    • Issue date Feb 5, 2019
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Sealing ring
    • Patent number D835760
    • Issue date Dec 11, 2018
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D23 - Environmental heating and cooling
  • Information Patent Grant

    Electrical contact
    • Patent number D825629
    • Issue date Aug 14, 2018
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D15 - Machines not elsewhere specified
  • Information Patent Grant

    Vacuum pump connecting apparatus and method for installing vacuum p...
    • Patent number 9,970,459
    • Issue date May 15, 2018
    • Ebara Corporation
    • Matsutaro Miyamoto
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Sealing ring
    • Patent number D802723
    • Issue date Nov 14, 2017
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D23 - Environmental heating and cooling
  • Information Patent Grant

    Electrical contact
    • Patent number D797674
    • Issue date Sep 19, 2017
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Installation structure of length meter for measuring a displacement...
    • Patent number 9,594,014
    • Issue date Mar 14, 2017
    • Ebara Corporation
    • Matsutaro Miyamoto
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Electrical contact
    • Patent number D776621
    • Issue date Jan 17, 2017
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Top opening-closing mechanism and inspection apparatus
    • Patent number 9,508,526
    • Issue date Nov 29, 2016
    • Ebara Corporation
    • Matsutaro Miyamoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Electrical contact
    • Patent number D771571
    • Issue date Nov 15, 2016
    • Ebara Corporation
    • Matsutaro Miyamoto
    • D13 - Equipment for production, distribution, or transformation of energy
  • Information Patent Grant

    Electron beam apparatus
    • Patent number 8,067,732
    • Issue date Nov 29, 2011
    • Ebara Corporation
    • Mamoru Nakasuji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum pump and semiconductor manufacturing apparatus
    • Patent number 7,645,126
    • Issue date Jan 12, 2010
    • Ebara Corporation
    • Shinichi Sekiguchi
    • F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...

Patents Applicationslast 30 patents

  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS
    • Publication number 20240139909
    • Publication date May 2, 2024
    • EBARA CORPORATION
    • MATSUTARO MIYAMOTO
    • B24 - GRINDING POLISHING
  • Information Patent Application

    SUBSTRATE HOLDER
    • Publication number 20230268209
    • Publication date Aug 24, 2023
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE CONVEYANCE METHOD, SUBSTRATE PROCESSING DEVICE, AND RECOR...
    • Publication number 20230230863
    • Publication date Jul 20, 2023
    • EBARA CORPORATION
    • MATSUTARO MIYAMOTO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HOLDER FOR HOLDING SUBSTRATE AND SYSTEM FOR PLATING
    • Publication number 20220186395
    • Publication date Jun 16, 2022
    • EBARA CORPORATION
    • Shota Moriyama
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    CONTACT STRUCTURE, SUBSTRATE HOLDER, APPARATUS FOR PLATING, AND MET...
    • Publication number 20220098749
    • Publication date Mar 31, 2022
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUBSTRATE HOLDER, PLATING APPARATUS, METHOD FOR MANUFACTURING SUBST...
    • Publication number 20210277534
    • Publication date Sep 9, 2021
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER
    • Publication number 20210180204
    • Publication date Jun 17, 2021
    • EBARA CORPORATION
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER
    • Publication number 20210180205
    • Publication date Jun 17, 2021
    • EBARA CORPORATION
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER AND PLATING APPARATUS WITH SUBSTRATE HOLDER
    • Publication number 20200263316
    • Publication date Aug 20, 2020
    • EBARA CORPORATION
    • Shoichiro Ogata
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    HOLDER FOR HOLDING SUBSTRATE AND SYSTEM FOR PLATING
    • Publication number 20200199770
    • Publication date Jun 25, 2020
    • EBARA CORPORATION
    • Shota Moriyama
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SEAL USED FOR SUBSTRATE HOLDER
    • Publication number 20200190686
    • Publication date Jun 18, 2020
    • EBARA CORPORATION
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    METHOD FOR HOLDING SUBSTRATE ON SUBSTRATE HOLDER
    • Publication number 20200157701
    • Publication date May 21, 2020
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER, PLATING DEVICE, AND PLATING METHOD OF SUBSTRATE
    • Publication number 20200161164
    • Publication date May 21, 2020
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER
    • Publication number 20200006090
    • Publication date Jan 2, 2020
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER, PLATING APPARATUS, AND METHOD FOR MANUFACTURING S...
    • Publication number 20180155847
    • Publication date Jun 7, 2018
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER AND PLATING APPARATUS USING THE SAME
    • Publication number 20180016698
    • Publication date Jan 18, 2018
    • EBARA CORPORATION
    • Matsutaro Miyamoto
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER AND PLATING APPARATUS USING THE SAME
    • Publication number 20170321343
    • Publication date Nov 9, 2017
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    REFLECTING MIRROR POSTURE ADJUSTMENT STRUCTURE, CEILING PLATE OPENI...
    • Publication number 20150275566
    • Publication date Oct 1, 2015
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • E05 - LOCKS KEYS WINDOW OR DOOR FITTINGS SAFES
  • Information Patent Application

    TOP OPENING-CLOSING MECHANISM AND INSPECTION APPARATUS
    • Publication number 20150221469
    • Publication date Aug 6, 2015
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
  • Information Patent Application

    STAGE DEVICE AND ELECTRON BEAM APPLICATION APPARATUS
    • Publication number 20140292111
    • Publication date Oct 2, 2014
    • EBARA CORPORATION
    • Matsutaro Miyamoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PUMP CONNECTING APPARATUS AND METHOD FOR INSTALLING VACUUM P...
    • Publication number 20140291980
    • Publication date Oct 2, 2014
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
  • Information Patent Application

    INSTALLATION STRUCTURE OF LENGTH METER
    • Publication number 20140253914
    • Publication date Sep 11, 2014
    • EBARA CORPORATION
    • Matsutaro MIYAMOTO
    • G01 - MEASURING TESTING
  • Information Patent Application

    ELECTRON BEAM APPARATUS
    • Publication number 20090218506
    • Publication date Sep 3, 2009
    • EBARA CORPORATION
    • Mamoru Nakasuji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ROTARY APPARATUS
    • Publication number 20090108703
    • Publication date Apr 30, 2009
    • EBARA CORPORATION
    • Hiroyuki KAWASAKI
    • F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
  • Information Patent Application

    Vacuum pump and semiconductor manufacturing apparatus
    • Publication number 20050025640
    • Publication date Feb 3, 2005
    • Shinichi Sekiguchi
    • F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
  • Information Patent Application

    Turbo-molecular pump
    • Publication number 20030017047
    • Publication date Jan 23, 2003
    • EBARA CORPORATION
    • Atsushi Shiokawa
    • F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
  • Information Patent Application

    Vacuum pump
    • Publication number 20020039533
    • Publication date Apr 4, 2002
    • EBARA CORPORATION
    • Matsutaro Miyamoto
    • F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
  • Information Patent Application

    Magnetic levitation rotating machine
    • Publication number 20020036435
    • Publication date Mar 28, 2002
    • Atsushi Ooyama
    • F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
  • Information Patent Application

    Turbo-molecular pump
    • Publication number 20020028132
    • Publication date Mar 7, 2002
    • EBARA CORPORATION
    • TETSUMA IKEGAMI
    • F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
  • Information Patent Application

    Substrate processing apparatus
    • Publication number 20020005167
    • Publication date Jan 17, 2002
    • EBARA CORPORATION
    • Matsutaro Miyamoto
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...