Maurits Van Der Schaar

Person

Veldhoven, NL

People

Patents Applicationslast 30 patents

Information Patent Application
Lithographic apparatus and device manufacturing method using overla...
- Publication number 20070229785
- Publication date Oct 4, 2007
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method using overla...
- Publication number 20070229837
- Publication date Oct 4, 2007
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment tool for a lithographic apparatus
- Publication number 20070222990
- Publication date Sep 27, 2007
- ASML NETHERLANDS B.V.
- Sami Musa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method with double...
- Publication number 20070224525
- Publication date Sep 27, 2007
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device manufacturing method and computer program product
- Publication number 20070187358
- Publication date Aug 16, 2007
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device manufacturing method and computer program product
- Publication number 20070190762
- Publication date Aug 16, 2007
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Latent overlay metrology
- Publication number 20060109463
- Publication date May 25, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for angular-resolved spectroscopic lithography...
- Publication number 20060066855
- Publication date Mar 30, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus, method of determining a model parameter, de...
- Publication number 20050123843
- Publication date Jun 9, 2005
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20040174508
- Publication date Sep 9, 2004
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic projection apparatus, a method for determining a posit...
- Publication number 20040095565
- Publication date May 20, 2004
- ASML NETHERLANDS B.V.
- Maurits van der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Computer program for determining a corrected position of a measured...
- Publication number 20020147520
- Publication date Oct 10, 2002
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Maurits Van Der Schaar

Person

Patents Applicationslast 30 patents

Lithographic apparatus and device manufacturing method using overla...

Lithographic apparatus and device manufacturing method using overla...

Alignment tool for a lithographic apparatus

Lithographic apparatus and device manufacturing method with double...

Device manufacturing method and computer program product

Device manufacturing method and computer program product

Latent overlay metrology

Method and apparatus for angular-resolved spectroscopic lithography...

Lithographic apparatus, method of determining a model parameter, de...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic projection apparatus, a method for determining a posit...

Computer program for determining a corrected position of a measured...