Melisa J. Buie

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-step process for etching photomasks
- Patent number 7,371,485
- Issue date May 13, 2008
- Applied Materials, Inc.
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated phase angle and optical critical dimension measurement m...
- Patent number 7,250,309
- Issue date Jul 31, 2007
- Applied Materials, Inc.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for etching photomasks
- Patent number 7,115,523
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Brigitte C. Stoehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for etching metal layers on substrates
- Patent number 7,018,934
- Issue date Mar 28, 2006
- Applied Materials, Inc.
- Melisa J. Buie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-step process for etching photomasks
- Patent number 6,960,413
- Issue date Nov 1, 2005
- Applied Materials, Inc.
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for measuring etch uniformity of a semiconduct...
- Patent number 6,649,075
- Issue date Nov 18, 2003
- Applied Materials, Inc.
- Melisa J. Buie
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...
- Publication number 20070296980
- Publication date Dec 27, 2007
- ALFRED W. MAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and apparatus for etching metal layers on substrates
- Publication number 20060163203
- Publication date Jul 27, 2006
- APPLIED MATERIALS, INC.
- Melisa J. Buie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multi-step process for etching photomasks
- Publication number 20060049137
- Publication date Mar 9, 2006
- APPLIED MATERIALS, INC.
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for etching photomasks
- Publication number 20050181608
- Publication date Aug 18, 2005
- APPLIED MATERIALS, INC.
- Brigitte C. Stoeher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated phase angle and optical critical dimension measurement m...
- Publication number 20050153564
- Publication date Jul 14, 2005
- APPLIED MATERIALS, INC.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-step process for etching photomasks
- Publication number 20050008945
- Publication date Jan 13, 2005
- Cynthia B. Brooks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for etching photolithographic reticles
- Publication number 20040072081
- Publication date Apr 15, 2004
- Thomas P. Coleman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and apparatus for etching metal layers on substrates
- Publication number 20030049934
- Publication date Mar 13, 2003
- APPLIED MATERIALS, INC.
- Melisa J. Buie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch process for photolithographic reticle manufacturing with impro...
- Publication number 20030003374
- Publication date Jan 2, 2003
- APPLIED MATERIALS, INC.
- Melisa Buie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Melisa J. Buie

Person

Patents Grantslast 30 patents

Multi-step process for etching photomasks

Integrated phase angle and optical critical dimension measurement m...

Method and apparatus for etching photomasks

Methods and apparatus for etching metal layers on substrates

Multi-step process for etching photomasks

Method and apparatus for measuring etch uniformity of a semiconduct...

Patents Applicationslast 30 patents

INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...

Methods and apparatus for etching metal layers on substrates

Multi-step process for etching photomasks

Method and apparatus for etching photomasks

Integrated phase angle and optical critical dimension measurement m...

Multi-step process for etching photomasks

Methods for etching photolithographic reticles

Methods and apparatus for etching metal layers on substrates

Etch process for photolithographic reticle manufacturing with impro...