Michael T. Andreas

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Using sacrificial polymer materials in semiconductor processing
- Patent number 11,651,952
- Issue date May 16, 2023
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Using sacrificial polymer materials in semiconductor processing
- Patent number 10,916,418
- Issue date Feb 9, 2021
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Etching process in capacitor process of DRAM using a liquid etchant...
- Patent number 10,593,559
- Issue date Mar 17, 2020
- NANYA TECHNOLOGY CORPORATION
- Michael Tristan Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using sacrificial polymer materials in semiconductor processing
- Patent number 10,497,558
- Issue date Dec 3, 2019
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Surface modification compositions, methods of modifying silicon-bas...
- Patent number 9,653,307
- Issue date May 16, 2017
- Micron Technology, Inc.
- Jerome A. Imonigie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for oscillating exposure of a semiconductor wor...
- Patent number 8,283,257
- Issue date Oct 9, 2012
- Micron Technology, Inc.
- Michael Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing methods
- Patent number 8,025,809
- Issue date Sep 27, 2011
- Micron Technology, Inc.
- Michael T. Andreas
- B24 - GRINDING POLISHING
Information Patent Grant
Method of cleaning a surface of a cobalt-containing material, metho...
- Patent number 7,964,109
- Issue date Jun 21, 2011
- Micron Technology, Inc.
- Michael T. Andreas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP cleaning composition with microbial inhibitor
- Patent number 7,468,105
- Issue date Dec 23, 2008
- Micron Technology, Inc.
- Michael T. Andreas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Chemical-mechanical polishing methods
- Patent number 7,402,259
- Issue date Jul 22, 2008
- Micron Technology, Inc.
- Michael T. Andreas
- B24 - GRINDING POLISHING
Information Patent Grant
Method of cleaning a surface of a cobalt-containing material, metho...
- Patent number 7,367,343
- Issue date May 6, 2008
- Micron Technology, Inc.
- Michael T. Andreas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
CMP cleaning composition with microbial inhibitor
- Patent number 7,235,494
- Issue date Jun 26, 2007
- Micron Technology, Inc.
- Michael T. Andreas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor processing methods
- Patent number 7,151,026
- Issue date Dec 19, 2006
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing methods
- Patent number 7,066,790
- Issue date Jun 27, 2006
- Micron Technology, Inc.
- Michael T. Andreas
- B24 - GRINDING POLISHING
Information Patent Grant
Post-planarization clean-up
- Patent number 7,033,978
- Issue date Apr 25, 2006
- Micron Technology, Inc.
- Michael T. Andreas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Wafer cleaning method and resulting wafer
- Patent number 7,023,099
- Issue date Apr 4, 2006
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a semiconductor substrate
- Patent number 7,014,537
- Issue date Mar 21, 2006
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods, and methods of forming a dynamic...
- Patent number 6,972,227
- Issue date Dec 6, 2005
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the post-etch cleaning of multi-level damascene structur...
- Patent number 6,936,534
- Issue date Aug 30, 2005
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of polishing a semiconductor substrate, post-CMP cleaning pr...
- Patent number 6,936,540
- Issue date Aug 30, 2005
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer Cleaning method and resulting wafer
- Patent number 6,930,017
- Issue date Aug 16, 2005
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium silicide wet etch
- Patent number 6,908,569
- Issue date Jun 21, 2005
- Micron Technology, Inc.
- Brenda D. Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing methods
- Patent number 6,835,121
- Issue date Dec 28, 2004
- Micron Technology, Inc.
- Michael T. Andreas
- B24 - GRINDING POLISHING
Information Patent Grant
Copper post-etch cleaning process
- Patent number 6,835,668
- Issue date Dec 28, 2004
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-planarization clean-up
- Patent number 6,787,473
- Issue date Sep 7, 2004
- Micron Technology, Inc.
- Michael T. Andreas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Ruthenium silicide wet etch
- Patent number 6,740,252
- Issue date May 25, 2004
- Micron Technology, Inc.
- Brenda D. Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and solutions for cleaning polished aluminum-containing layers
- Patent number 6,635,562
- Issue date Oct 21, 2003
- Micron Technology, Inc.
- Michael T. Andreas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Post-planarization clean-up
- Patent number 6,627,550
- Issue date Sep 30, 2003
- Micron Technology, Inc.
- Michael T. Andreas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor processing methods of forming integrated circuitry, a...
- Patent number 6,613,674
- Issue date Sep 2, 2003
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper post-etch cleaning process
- Patent number 6,589,882
- Issue date Jul 8, 2003
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
- Publication number 20210159069
- Publication date May 27, 2021
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
- Publication number 20200075316
- Publication date Mar 5, 2020
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
- Publication number 20190267232
- Publication date Aug 29, 2019
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ETCHING PROCESS IN CAPACITOR PROCESS OF DRAM USING A LIQUID ETCHANT...
- Publication number 20160293448
- Publication date Oct 6, 2016
- NANYA TECHNOLOGY CORPORATION
- Michael Tristan Andreas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LIQUID ETCHANT COMPOSITION, AND ETCHING PROCESS IN CAPACITOR PROCES...
- Publication number 20150203753
- Publication date Jul 23, 2015
- NANYA TECHNOLOGY CORPORATION
- Michael Tristan Andreas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SYSTEMS AND METHODS FOR OSCILLATING EXPOSURE OF A SEMICONDUCTOR WOR...
- Publication number 20130008601
- Publication date Jan 10, 2013
- Micron Technology, Inc.
- Michael Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing Methods
- Publication number 20090023291
- Publication date Jan 22, 2009
- Micron Technology, Inc.
- Michael T. Andreas
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR OSCILLATING EXPOSURE OF A SEMICONDUCTOR WOR...
- Publication number 20080318434
- Publication date Dec 25, 2008
- Micron Technology, Inc.
- Michael Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of cleaning a surface of a cobalt-containing material, metho...
- Publication number 20080176405
- Publication date Jul 24, 2008
- Michael T. Andreas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of cleaning a surface of a cobalt-containing material, metho...
- Publication number 20070173062
- Publication date Jul 26, 2007
- Micron Technology, Inc.
- Michael T. Andreas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor processing methods
- Publication number 20060134860
- Publication date Jun 22, 2006
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for the post-etch cleaning of multi-level damascene structur...
- Publication number 20060003589
- Publication date Jan 5, 2006
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ruthenium silicide wet etch
- Publication number 20050263489
- Publication date Dec 1, 2005
- Brenda D. Kraus
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP cleaning composition with microbial inhibitor
- Publication number 20050199264
- Publication date Sep 15, 2005
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a semiconductor substrate
- Publication number 20050085080
- Publication date Apr 21, 2005
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF POLISHING A SEMICONDUCTOR SUBSTRATE, POST-CMP CLEANING PR...
- Publication number 20050064712
- Publication date Mar 24, 2005
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR THE POST-ETCH CLEANING OF MULTI-LEVEL DAMASCENE STRUCTUR...
- Publication number 20050059232
- Publication date Mar 17, 2005
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer cleaning method and resulting wafer
- Publication number 20050040443
- Publication date Feb 24, 2005
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer cleaning method and resulting wafer
- Publication number 20050040442
- Publication date Feb 24, 2005
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical-mechanical polishing methods
- Publication number 20050023247
- Publication date Feb 3, 2005
- Michael T. Andreas
- B08 - CLEANING
Information Patent Application
Solutions for cleaning polished aluminum-containing layers
- Publication number 20030224958
- Publication date Dec 4, 2003
- Michael T. Andreas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ruthenium silicide wet etch
- Publication number 20030205689
- Publication date Nov 6, 2003
- Brenda D. Kraus
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Post-planarization clean-up
- Publication number 20030143857
- Publication date Jul 31, 2003
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-planarization clean-up
- Publication number 20030139059
- Publication date Jul 24, 2003
- Micron Technology, Inc.
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP cleaning composition with microbial inhibitor
- Publication number 20030089891
- Publication date May 15, 2003
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Copper post-etch cleaning process
- Publication number 20030077902
- Publication date Apr 24, 2003
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Copper post-etch cleaning process
- Publication number 20030077903
- Publication date Apr 24, 2003
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods, and methods of forming a dynamic...
- Publication number 20020192963
- Publication date Dec 19, 2002
- Michael T. Andreas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical-mechanical polishing methods
- Publication number 20020164927
- Publication date Nov 7, 2002
- Michael T. Andreas
- B24 - GRINDING POLISHING
Information Patent Application
Ruthenium silicide wet etch
- Publication number 20020148998
- Publication date Oct 17, 2002
- Brenda D. Kraus
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Michael T. Andreas

Person

Patents Grantslast 30 patents

Using sacrificial polymer materials in semiconductor processing

Using sacrificial polymer materials in semiconductor processing

Etching process in capacitor process of DRAM using a liquid etchant...

Using sacrificial polymer materials in semiconductor processing

Surface modification compositions, methods of modifying silicon-bas...

Systems and methods for oscillating exposure of a semiconductor wor...

Polishing methods

Method of cleaning a surface of a cobalt-containing material, metho...

CMP cleaning composition with microbial inhibitor

Chemical-mechanical polishing methods

Method of cleaning a surface of a cobalt-containing material, metho...

CMP cleaning composition with microbial inhibitor

Semiconductor processing methods

Chemical-mechanical polishing methods

Post-planarization clean-up

Wafer cleaning method and resulting wafer

Method of processing a semiconductor substrate

Semiconductor processing methods, and methods of forming a dynamic...

Method for the post-etch cleaning of multi-level damascene structur...

Method of polishing a semiconductor substrate, post-CMP cleaning pr...

Wafer Cleaning method and resulting wafer

Ruthenium silicide wet etch

Chemical-mechanical polishing methods

Copper post-etch cleaning process

Post-planarization clean-up

Ruthenium silicide wet etch

Methods and solutions for cleaning polished aluminum-containing layers

Post-planarization clean-up

Semiconductor processing methods of forming integrated circuitry, a...

Copper post-etch cleaning process

Patents Applicationslast 30 patents

USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING

USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING

USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING

ETCHING PROCESS IN CAPACITOR PROCESS OF DRAM USING A LIQUID ETCHANT...

LIQUID ETCHANT COMPOSITION, AND ETCHING PROCESS IN CAPACITOR PROCES...

SYSTEMS AND METHODS FOR OSCILLATING EXPOSURE OF A SEMICONDUCTOR WOR...

Polishing Methods

SYSTEMS AND METHODS FOR OSCILLATING EXPOSURE OF A SEMICONDUCTOR WOR...

Method of cleaning a surface of a cobalt-containing material, metho...

Method of cleaning a surface of a cobalt-containing material, metho...

Semiconductor processing methods

Method for the post-etch cleaning of multi-level damascene structur...

Ruthenium silicide wet etch

CMP cleaning composition with microbial inhibitor

Method of processing a semiconductor substrate

METHOD OF POLISHING A SEMICONDUCTOR SUBSTRATE, POST-CMP CLEANING PR...

METHOD FOR THE POST-ETCH CLEANING OF MULTI-LEVEL DAMASCENE STRUCTUR...

Wafer cleaning method and resulting wafer

Wafer cleaning method and resulting wafer

Chemical-mechanical polishing methods

Solutions for cleaning polished aluminum-containing layers

Ruthenium silicide wet etch

Post-planarization clean-up

Post-planarization clean-up

CMP cleaning composition with microbial inhibitor

Copper post-etch cleaning process

Copper post-etch cleaning process

Semiconductor processing methods, and methods of forming a dynamic...

Chemical-mechanical polishing methods

Ruthenium silicide wet etch