Mikhail KOROLIK

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Germanium etching systems and methods
- Patent number 10,593,553
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective etching of a silicon material using HF gas wi...
- Patent number 10,204,796
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating junctions and spacers for horizontal gate al...
- Patent number 10,177,227
- Issue date Jan 8, 2019
- Applied Materials, Inc.
- Naomi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-limiting atomic thermal etching systems and methods
- Patent number 10,043,684
- Issue date Aug 7, 2018
- Applied Materials, Inc.
- Ranga Rao Arnepalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium etching systems and methods
- Patent number 10,043,674
- Issue date Aug 7, 2018
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned shielding of silicon oxide
- Patent number 9,875,907
- Issue date Jan 23, 2018
- Applied Materials, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned shielding of silicon oxide
- Patent number 9,859,128
- Issue date Jan 2, 2018
- Applied Materials, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective etching of a silicon material using HF gas wi...
- Patent number 9,831,097
- Issue date Nov 28, 2017
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch suppression with germanium
- Patent number 9,576,809
- Issue date Feb 21, 2017
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chlorine-based hardmask removal
- Patent number 9,478,434
- Issue date Oct 25, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively etching metals and metal nitrides conformally
- Patent number 9,449,843
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for atomic layer deposition
- Patent number 9,359,673
- Issue date Jun 7, 2016
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluorine-based hardmask removal
- Patent number 9,355,862
- Issue date May 31, 2016
- Applied Materials, Inc.
- Mandar Pandit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-local plasma oxide etch
- Patent number 9,355,863
- Issue date May 31, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etch
- Patent number 9,275,834
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Seung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon germanium processing
- Patent number 9,236,265
- Issue date Jan 12, 2016
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-local plasma oxide etch
- Patent number 9,111,877
- Issue date Aug 18, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten oxide processing
- Patent number 8,951,429
- Issue date Feb 10, 2015
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for cleaning a substrate
- Patent number 8,716,210
- Issue date May 6, 2014
- Lam Research Corporation
- Erik M. Freer
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for removing material from semiconductor wafer and apparatus...
- Patent number 8,691,027
- Issue date Apr 8, 2014
- Lam Research Corporation
- Mikhail Korolik
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for cleaning a substrate using non-newtonian f...
- Patent number 8,671,959
- Issue date Mar 18, 2014
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Methods for atomic layer deposition
- Patent number 8,623,456
- Issue date Jan 7, 2014
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing contamination from a substrate and for making a...
- Patent number 8,608,859
- Issue date Dec 17, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for cleaning contaminants from substrate
- Patent number 8,590,550
- Issue date Nov 26, 2013
- Lam Research Corporation
- Mikhail Korolik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for cleaning a semiconductor substrate
- Patent number 8,591,662
- Issue date Nov 26, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for removing contamination from substrate
- Patent number 8,555,903
- Issue date Oct 15, 2013
- Lam Research Corporation
- Erik M. Freer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and apparatus for cleaning semiconductor wafers using compre...
- Patent number 8,535,451
- Issue date Sep 17, 2013
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Method and apparatus for cleaning a semiconductor substrate
- Patent number 8,522,801
- Issue date Sep 3, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and system for cleaning a substrate
- Patent number 8,522,799
- Issue date Sep 3, 2013
- Lam Research Corporation
- Erik M. Freer
- B08 - CLEANING
Information Patent Grant
Method and apparatus for particle removal
- Patent number 8,480,810
- Issue date Jul 9, 2013
- Lam Research Corporation
- Erik M. Freer
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF SELECTIVELY ETCHING SILICON NITRIDE
- Publication number 20240420962
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Doreen Wei Ying Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR TITANIUM-CONTAINING FILM REMOVAL
- Publication number 20240258116
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOTROPIC SILICON NITRIDE REMOVAL
- Publication number 20240120210
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOTROPIC SILICON NITRIDE REMOVAL
- Publication number 20220293430
- Publication date Sep 15, 2022
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOTROPIC SILICON NITRIDE REMOVAL
- Publication number 20210111033
- Publication date Apr 15, 2021
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GERMANIUM ETCHING SYSTEMS AND METHODS
- Publication number 20190043727
- Publication date Feb 7, 2019
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-LIMITING ATOMIC THERMAL ETCHING SYSTEMS AND METHODS
- Publication number 20180226278
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Ranga Rao Arnepalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...
- Publication number 20180082849
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Nitin K. INGLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...
- Publication number 20170178915
- Publication date Jun 22, 2017
- Applied Materials, Inc.
- Nitin K. INGLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED SHIELDING OF SILICON OXIDE
- Publication number 20170148640
- Publication date May 25, 2017
- Applied Materials, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED SHIELDING OF SILICON OXIDE
- Publication number 20170148642
- Publication date May 25, 2017
- Applied Materials, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHLORINE-BASED HARDMASK REMOVAL
- Publication number 20160086816
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE-BASED HARDMASK REMOVAL
- Publication number 20160086815
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Mandar Pandit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-LOCAL PLASMA OXIDE ETCH
- Publication number 20150357201
- Publication date Dec 10, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH SUPPRESSION WITH GERMANIUM
- Publication number 20150126039
- Publication date May 7, 2015
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON GERMANIUM PROCESSING
- Publication number 20150126040
- Publication date May 7, 2015
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Systems for Cleaning A Substrate
- Publication number 20150040947
- Publication date Feb 12, 2015
- LAM RESEARCH CORPORATION
- Erik M. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Cleaning A Semiconductor Substrate
- Publication number 20150040941
- Publication date Feb 12, 2015
- LAM RESEARCH CORPORATION
- Erik M. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controls of Ambient Environment During Wafer Drying Using Proximity...
- Publication number 20140332037
- Publication date Nov 13, 2014
- LAM RESEARCH CORPORATION
- Mikhail Korolik
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
NON-LOCAL PLASMA OXIDE ETCH
- Publication number 20140166617
- Publication date Jun 19, 2014
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...
- Publication number 20140158167
- Publication date Jun 12, 2014
- LAM RESEARCH CORPORATION
- John M. de Larios
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Apparatus for Cleaning a Semiconductor Substrate
- Publication number 20140059789
- Publication date Mar 6, 2014
- LAM RESEARCH CORPORATION
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Cleaning System Using Stabilized Fluid Solutions
- Publication number 20130284217
- Publication date Oct 31, 2013
- Erik M. Freer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE CLEANING TECHNIQUE EMPLOYING MULTI-PHASE SOLUTION
- Publication number 20130206182
- Publication date Aug 15, 2013
- Erik M. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING MATERIAL FROM SEMICONDUCTOR WAFER AND APPARATUS...
- Publication number 20130061887
- Publication date Mar 14, 2013
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Cleaning a Semiconductor Substrate
- Publication number 20130048021
- Publication date Feb 28, 2013
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR ATOMIC LAYER DEPOSITION
- Publication number 20130040460
- Publication date Feb 14, 2013
- LAM RESEARCH CORPORATION
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION
- Publication number 20120248219
- Publication date Oct 4, 2012
- LAM RESEARCH CORPORATION
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning Compound and Method and System for Using the Cleaning Comp...
- Publication number 20120145202
- Publication date Jun 14, 2012
- LAM RESEARCH CORPORATION
- Erik M. Freer
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...
- Publication number 20120017950
- Publication date Jan 26, 2012
- LAM RESEARCH CORPORATION
- John M. de Larios
- B08 - CLEANING

Mikhail KOROLIK

Person

Patents Grantslast 30 patents

Germanium etching systems and methods

Methods for selective etching of a silicon material using HF gas wi...

Method for fabricating junctions and spacers for horizontal gate al...

Self-limiting atomic thermal etching systems and methods

Germanium etching systems and methods

Self-aligned shielding of silicon oxide

Self-aligned shielding of silicon oxide

Methods for selective etching of a silicon material using HF gas wi...

Etch suppression with germanium

Chlorine-based hardmask removal

Selectively etching metals and metal nitrides conformally

Apparatus and method for atomic layer deposition

Fluorine-based hardmask removal

Non-local plasma oxide etch

Selective titanium nitride etch

Silicon germanium processing

Non-local plasma oxide etch

Tungsten oxide processing

Material for cleaning a substrate

Method for removing material from semiconductor wafer and apparatus...

Method and apparatus for cleaning a substrate using non-newtonian f...

Methods for atomic layer deposition

Method for removing contamination from a substrate and for making a...

Apparatus for cleaning contaminants from substrate

Methods for cleaning a semiconductor substrate

Method and apparatus for removing contamination from substrate

Method and apparatus for cleaning semiconductor wafers using compre...

Method and apparatus for cleaning a semiconductor substrate

Apparatus and system for cleaning a substrate

Method and apparatus for particle removal

Patents Applicationslast 30 patents

METHODS OF SELECTIVELY ETCHING SILICON NITRIDE

SYSTEMS AND METHODS FOR TITANIUM-CONTAINING FILM REMOVAL

ISOTROPIC SILICON NITRIDE REMOVAL

ISOTROPIC SILICON NITRIDE REMOVAL

ISOTROPIC SILICON NITRIDE REMOVAL

GERMANIUM ETCHING SYSTEMS AND METHODS

SELF-LIMITING ATOMIC THERMAL ETCHING SYSTEMS AND METHODS

METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...

METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...

SELF-ALIGNED SHIELDING OF SILICON OXIDE

SELF-ALIGNED SHIELDING OF SILICON OXIDE

CHLORINE-BASED HARDMASK REMOVAL

FLUORINE-BASED HARDMASK REMOVAL

NON-LOCAL PLASMA OXIDE ETCH

ETCH SUPPRESSION WITH GERMANIUM

SILICON GERMANIUM PROCESSING

Method and Systems for Cleaning A Substrate

Method and Apparatus for Cleaning A Semiconductor Substrate

Controls of Ambient Environment During Wafer Drying Using Proximity...

NON-LOCAL PLASMA OXIDE ETCH

METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...

Apparatus for Cleaning a Semiconductor Substrate

Substrate Cleaning System Using Stabilized Fluid Solutions

SUBSTRATE CLEANING TECHNIQUE EMPLOYING MULTI-PHASE SOLUTION

METHOD FOR REMOVING MATERIAL FROM SEMICONDUCTOR WAFER AND APPARATUS...

Apparatus for Cleaning a Semiconductor Substrate

METHODS FOR ATOMIC LAYER DEPOSITION

APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION

Cleaning Compound and Method and System for Using the Cleaning Comp...

METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...