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Ming-Fea Chow
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Poughguag, NY, US
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last 30 patents
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Patent Grant
Process of making diazoquinone sensitized polyamic acid based photo...
Patent number
4,942,108
Issue date
Jul 17, 1990
International Business Machines Corporation
Wayne M. Moreau
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Thermally stable photoresists with high sensitivity
Patent number
4,939,070
Issue date
Jul 3, 1990
William R. Brunsvold
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Top imaged resists
Patent number
4,810,601
Issue date
Mar 7, 1989
International Business Machines Corporation
Robert D. Allen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for dose calculation of photolithography projection printers...
Patent number
4,474,864
Issue date
Oct 2, 1984
International Business Machines Corporation
Ming-Fea Chow
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for forming resist masks utilizing O-quinone diazide and py...
Patent number
4,464,458
Issue date
Aug 7, 1984
International Business Machines Corporation
Ming-Fea Chow
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY