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Hsin Chu, TW
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Patents Grants
last 30 patents
Information
Patent Grant
Temperature controlled loadlock chamber
Patent number
9,698,030
Issue date
Jul 4, 2017
Taiwan Semiconductor Manufacturing Company, Ltd.
Chun-Hsien Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Temperature controlled loadlock chamber
Patent number
8,905,124
Issue date
Dec 9, 2014
Taiwan Semiconductor Manufacturing Company, Ltd.
Chun-Hsien Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
CMP process leaving no residual oxide layer or slurry particles
Patent number
7,125,802
Issue date
Oct 24, 2006
Taiwan Semiconductor Manufacturing Co., Ltd.
Ying-Lang Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
CMP process leaving no residual oxide layer or slurry particles
Patent number
6,903,019
Issue date
Jun 7, 2005
Taiwan Semiconductor Manufacturing Company
Ying-Lang Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method to solve IMD-FSG particle and increase Cp yield by using a n...
Patent number
6,815,007
Issue date
Nov 9, 2004
Taiwan Semiconductor Manufacturing Company
Ming-Hwa Yoo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method to solve particle performance of FSG layer by using UFU seas...
Patent number
6,815,072
Issue date
Nov 9, 2004
Taiwan Semiconductor Manufacturing Company, Ltd.
Ming-Hwa Yoo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of forming in-situ SRO HDP-CVD barrier film
Patent number
6,759,347
Issue date
Jul 6, 2004
Taiwan Semiconductor Manufacturing Co., Ltd
Yi-Lung Cheng
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method to neutralize charge imbalance following a wafer cleaning pr...
Patent number
6,703,317
Issue date
Mar 9, 2004
Taiwan Semiconductor Manufacturing Co., Ltd
Yi-Lung Cheng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
CMP process leaving no residual oxide layer or slurry particles
Patent number
6,660,638
Issue date
Dec 9, 2003
Taiwan Semiconductor Manufacturing Company
Ying-Lang Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for removing residual fluorine in HDP-CVD chamber
Patent number
6,602,560
Issue date
Aug 5, 2003
Taiwan Semiconductor Manufacturing Co., Ltd
Yi-Lung Cheng
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method to solve particle performance of FSG layer by using UFU seas...
Patent number
6,479,098
Issue date
Nov 12, 2002
Taiwan Semiconductor Manufacturing Company
Ming-Hwa Yoo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
Temperature Controlled Loadlock Chamber
Publication number
20150132100
Publication date
May 14, 2015
Taiwan Semiconductor Manufacturing Company, Ltd.
Chun-Hsien Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Temperature Controlled Loadlock Chamber
Publication number
20090000769
Publication date
Jan 1, 2009
Chun-Hsien Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR PREVENTING CLOGGING OF REACTION CHAMBER EXHAUST LINES
Publication number
20080047578
Publication date
Feb 28, 2008
Taiwan Semiconductor Manufacturing Co., LTD
Ming-Feng Yoo
B08 - CLEANING
Information
Patent Application
Gas supply device and apparatus for gas etching or cleaning substrates
Publication number
20070240826
Publication date
Oct 18, 2007
Taiwan Semiconductor Manufacturing Co., LTD
Liang-Gi Yao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Novel method to increase fluorine stability to improve gap fill abi...
Publication number
20050009367
Publication date
Jan 13, 2005
Taiwan Semiconductor Manufacturing Co.
Yi-Lung Cheng
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CMP process leaving no residual oxide layer or slurry particles
Publication number
20040097083
Publication date
May 20, 2004
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Ying-Lang Wang
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
CMP process leaving no residual oxide layer or slurry particles
Publication number
20040084415
Publication date
May 6, 2004
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Ying-Lang Wang
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
Method for reducing contaminants in a CVD chamber
Publication number
20030068448
Publication date
Apr 10, 2003
Taiwan Semiconductor Manufacturing Co. Ltd.
Yi-Lung Cheng
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...