Mirzafer Abatchev

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 11,935,756
- Issue date Mar 19, 2024
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 11,335,563
- Issue date May 17, 2022
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 10,607,844
- Issue date Mar 31, 2020
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-based deposition for semiconductor processing
- Patent number 10,600,648
- Issue date Mar 24, 2020
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer profile control using atomic layer deposition in a multiple...
- Patent number 10,446,394
- Issue date Oct 15, 2019
- Lam Research Corporation
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 10,181,412
- Issue date Jan 15, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 10,096,483
- Issue date Oct 9, 2018
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post etch treatment to prevent pattern collapse
- Patent number 9,941,123
- Issue date Apr 10, 2018
- Lam Research Corporation
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 9,761,457
- Issue date Sep 12, 2017
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for integrated circuit fabrication with protective coating...
- Patent number 9,679,781
- Issue date Jun 13, 2017
- Micron Technology, Inc.
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single spacer process for multiplying pitch by a factor greater tha...
- Patent number 9,478,497
- Issue date Oct 25, 2016
- Micron Technology, Inc.
- David H Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 9,305,782
- Issue date Apr 5, 2016
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure control valve assembly of plasma processing chamber and ra...
- Patent number 9,267,605
- Issue date Feb 23, 2016
- Lam Research Corporation
- Mirzafer Abatchev
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 9,117,767
- Issue date Aug 25, 2015
- Lam Research Corporation
- Alexei Marakhatanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated circuit structure having arrays of small, closely spaced...
- Patent number 9,099,402
- Issue date Aug 4, 2015
- Micron Technology, Inc.
- Mirzafer Abatchev
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for integrated circuit fabrication with protective coating...
- Patent number 9,003,651
- Issue date Apr 14, 2015
- Micron Technology, Inc.
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask material conversion
- Patent number 8,895,232
- Issue date Nov 25, 2014
- Micron Technology, Inc.
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single spacer process for multiplying pitch by a factor greater tha...
- Patent number 8,883,644
- Issue date Nov 11, 2014
- Micron Technology, Inc.
- David H Wells
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 8,852,851
- Issue date Oct 7, 2014
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for providing an energy assisted magnetic recordi...
- Patent number 8,834,728
- Issue date Sep 16, 2014
- Western Digital (Fremont), LLC
- Yufeng Hu
- G11 - INFORMATION STORAGE
Information Patent Grant
Method and system for providing an energy assisted magnetic recordi...
- Patent number 8,721,902
- Issue date May 13, 2014
- Western Digital (Fremont), LLC
- Zhongyan Wang
- G11 - INFORMATION STORAGE
Information Patent Grant
Integrated circuit having pitch reduced patterns relative to photoi...
- Patent number 8,598,632
- Issue date Dec 3, 2013
- Round Rock Research LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single spacer process for multiplying pitch by a factor greater tha...
- Patent number 8,557,704
- Issue date Oct 15, 2013
- Micron Technology, Inc.
- David H Wells
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask material conversion
- Patent number 8,486,610
- Issue date Jul 16, 2013
- Micron Technology, Inc.
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for integrated circuit fabrication with protective coating...
- Patent number 8,479,384
- Issue date Jul 9, 2013
- Micron Technology, Inc.
- Mirzafer Abatchev
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for integrated circuit fabrication using pitch multiplication
- Patent number 8,216,949
- Issue date Jul 10, 2012
- Round Rock Research, LLC
- Mirzafer K Abatchev
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for forming arrays of small, closely spaced features
- Patent number 8,207,614
- Issue date Jun 26, 2012
- Micron Technology, Inc.
- Mirzafer Abatchev
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,207,576
- Issue date Jun 26, 2012
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming nanodots and/or a patterned material during the...
- Patent number 8,183,138
- Issue date May 22, 2012
- Micron Technology, Inc.
- Krupakar M. Subramanian
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,119,535
- Issue date Feb 21, 2012
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20240222131
- Publication date Jul 4, 2024
- Lodestar Licensing Group LLC
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20220254644
- Publication date Aug 11, 2022
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20200203171
- Publication date Jun 25, 2020
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TRANSFERRING A PATTERN FROM AN ORGANIC MASK
- Publication number 20190378725
- Publication date Dec 12, 2019
- LAM RESEARCH CORPORATION
- Mirzafer ABATCHEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER PROFILE CONTROL USING ATOMIC LAYER DEPOSITION IN A MULTIPLE...
- Publication number 20190237330
- Publication date Aug 1, 2019
- LAM RESEARCH CORPORATION
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING
- Publication number 20180308693
- Publication date Oct 25, 2018
- LAM RESEARCH CORPORATION
- Tom A. KAMP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20180286693
- Publication date Oct 4, 2018
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20170372913
- Publication date Dec 28, 2017
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR REAL TIME CONTROL OF RAPID ALTERNA...
- Publication number 20170031352
- Publication date Feb 2, 2017
- LAM RESEARCH CORPORATION
- Mirzafer Abatchev
- G05 - CONTROLLING REGULATING
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20160203993
- Publication date Jul 14, 2016
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE ION CONTROL FOR DIELECTRIC ETCH
- Publication number 20150357209
- Publication date Dec 10, 2015
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR INTEGRATED CIRCUIT FABRICATION WITH PROTECTIVE COATING...
- Publication number 20150287610
- Publication date Oct 8, 2015
- Micron Technology, Inc.
- MIRZAFER ABATCHEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single Spacer Process for Multiplying Pitch by a Factor Greater Tha...
- Publication number 20150054168
- Publication date Feb 26, 2015
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20150021744
- Publication date Jan 22, 2015
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE SPACER PROCESS FOR MULTIPLYING PITCH BY A FACTOR GREATER THA...
- Publication number 20140038416
- Publication date Feb 6, 2014
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK MATERIAL CONVERSION
- Publication number 20130302987
- Publication date Nov 14, 2013
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR INTEGRATED CIRCUIT FABRICATION WITH PROTECTIVE COATING...
- Publication number 20130295770
- Publication date Nov 7, 2013
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRESSURE CONTROL VALVE ASSEMBLY OF PLASMA PROCESSING CHAMBER AND RA...
- Publication number 20130115776
- Publication date May 9, 2013
- LAM RESEARCH CORPORATION
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR REAL TIME CONTROL OF RAPID ALTERNA...
- Publication number 20130048082
- Publication date Feb 28, 2013
- Mirzafer Abatchev
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Negative Ion Control for Dielectric Etch
- Publication number 20130023064
- Publication date Jan 24, 2013
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated Circuit Having Pitch Reduced Patterns Relative To Photol...
- Publication number 20120256309
- Publication date Oct 11, 2012
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOIMPRINT LITHOGRAPHY TEMPLATES
- Publication number 20120244244
- Publication date Sep 27, 2012
- Micron Technology, Inc.
- Krupakar M. Subramanian
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS FOR FORMING ARRAYS OF SMALL, CLOSELY SPACED FEATURES
- Publication number 20120228742
- Publication date Sep 13, 2012
- Micron Technology, Inc.
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK MATERIAL CONVERSION
- Publication number 20110130006
- Publication date Jun 2, 2011
- Micron Technology, Inc.
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20100210111
- Publication date Aug 19, 2010
- ROUND ROCK RESEARCH, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INTEGRATED CIRCUIT FABRICATION USING PITCH MULTIPLICATION
- Publication number 20100203727
- Publication date Aug 12, 2010
- Micron Technology, Inc.
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRIM PROCESS FOR CRITICAL DIMENSION CONTROL FOR INTEGRATED CIRCUITS
- Publication number 20100173498
- Publication date Jul 8, 2010
- Micron Technology, Inc.
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING NANODOTS AND/OR A PATTERNED MATERIAL DURING THE...
- Publication number 20100144132
- Publication date Jun 10, 2010
- Krupakar M. Subramanian
- B82 - NANO-TECHNOLOGY
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20100092891
- Publication date Apr 15, 2010
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE SPACER PROCESS FOR MULTIPLYING PITCH BY A FACTOR GREATER THA...
- Publication number 20100029081
- Publication date Feb 4, 2010
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS

Mirzafer Abatchev

Person

Patents Grantslast 30 patents

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Silicon-based deposition for semiconductor processing

Spacer profile control using atomic layer deposition in a multiple...

Negative ion control for dielectric etch

Pitch reduction technology using alternating spacer depositions dur...

Post etch treatment to prevent pattern collapse

Pitch reduction technology using alternating spacer depositions dur...

Methods for integrated circuit fabrication with protective coating...

Single spacer process for multiplying pitch by a factor greater tha...

Pitch reduction technology using alternating spacer depositions dur...

Pressure control valve assembly of plasma processing chamber and ra...

Negative ion control for dielectric etch

Integrated circuit structure having arrays of small, closely spaced...

Methods for integrated circuit fabrication with protective coating...

Mask material conversion

Single spacer process for multiplying pitch by a factor greater tha...

Pitch reduction technology using alternating spacer depositions dur...

Method and system for providing an energy assisted magnetic recordi...

Method and system for providing an energy assisted magnetic recordi...

Integrated circuit having pitch reduced patterns relative to photoi...

Single spacer process for multiplying pitch by a factor greater tha...

Mask material conversion

Methods for integrated circuit fabrication with protective coating...

Method for integrated circuit fabrication using pitch multiplication

Methods for forming arrays of small, closely spaced features

Pitch reduced patterns relative to photolithography features

Methods for forming nanodots and/or a patterned material during the...

Pitch reduced patterns relative to photolithography features

Patents Applicationslast 30 patents

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

METHOD FOR TRANSFERRING A PATTERN FROM AN ORGANIC MASK

SPACER PROFILE CONTROL USING ATOMIC LAYER DEPOSITION IN A MULTIPLE...

SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

SYSTEM, METHOD AND APPARATUS FOR REAL TIME CONTROL OF RAPID ALTERNA...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

NEGATIVE ION CONTROL FOR DIELECTRIC ETCH

METHODS FOR INTEGRATED CIRCUIT FABRICATION WITH PROTECTIVE COATING...

Single Spacer Process for Multiplying Pitch by a Factor Greater Tha...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

SINGLE SPACER PROCESS FOR MULTIPLYING PITCH BY A FACTOR GREATER THA...

MASK MATERIAL CONVERSION

METHODS FOR INTEGRATED CIRCUIT FABRICATION WITH PROTECTIVE COATING...

PRESSURE CONTROL VALVE ASSEMBLY OF PLASMA PROCESSING CHAMBER AND RA...

SYSTEM, METHOD AND APPARATUS FOR REAL TIME CONTROL OF RAPID ALTERNA...

Negative Ion Control for Dielectric Etch

Integrated Circuit Having Pitch Reduced Patterns Relative To Photol...

NANOIMPRINT LITHOGRAPHY TEMPLATES

METHODS FOR FORMING ARRAYS OF SMALL, CLOSELY SPACED FEATURES

MASK MATERIAL CONVERSION

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

METHOD FOR INTEGRATED CIRCUIT FABRICATION USING PITCH MULTIPLICATION

TRIM PROCESS FOR CRITICAL DIMENSION CONTROL FOR INTEGRATED CIRCUITS

METHODS FOR FORMING NANODOTS AND/OR A PATTERNED MATERIAL DURING THE...

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

SINGLE SPACER PROCESS FOR MULTIPLYING PITCH BY A FACTOR GREATER THA...