Mitsunori Sakama

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 9,806,096
- Issue date Oct 31, 2017
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 9,196,632
- Issue date Nov 24, 2015
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,610,182
- Issue date Dec 17, 2013
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,304,350
- Issue date Nov 6, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD apparatus
- Patent number 8,278,195
- Issue date Oct 2, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,154,059
- Issue date Apr 10, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
Plasma CVD apparatus
- Patent number 8,053,338
- Issue date Nov 8, 2011
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,821,071
- Issue date Oct 26, 2010
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
Plasma CVD apparatus
- Patent number 7,723,218
- Issue date May 25, 2010
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and a manufacturing method of a thin...
- Patent number 7,691,692
- Issue date Apr 6, 2010
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,504,343
- Issue date Mar 17, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
APCVD method of forming silicon oxide using an organic silane, oxid...
- Patent number 7,491,659
- Issue date Feb 17, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulating film and method of producing semiconductor device
- Patent number 7,465,679
- Issue date Dec 16, 2008
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of a thin film semiconductor device
- Patent number 7,452,794
- Issue date Nov 18, 2008
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD method
- Patent number 7,452,829
- Issue date Nov 18, 2008
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 7,393,723
- Issue date Jul 1, 2008
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, and method of fabricating the same
- Patent number 7,372,114
- Issue date May 13, 2008
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 7,271,082
- Issue date Sep 18, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, and method of fabricating the same
- Patent number 7,166,899
- Issue date Jan 23, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma CVD method
- Patent number 7,071,128
- Issue date Jul 4, 2006
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,064,388
- Issue date Jun 20, 2006
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glass substrate assembly, semiconductor device and method of heat-t...
- Patent number 7,038,302
- Issue date May 2, 2006
- Semiconductor Energy Laboratory Co., Ltd.
- Takeshi Fukada
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Plasma CVD method
- Patent number 6,951,828
- Issue date Oct 4, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 6,919,282
- Issue date Jul 19, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 6,858,898
- Issue date Feb 22, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glass substrate assembly, semiconductor device and method of heat-t...
- Patent number 6,847,097
- Issue date Jan 25, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Takeshi Fukada
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,730,992
- Issue date May 4, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
APCVD method of forming silicon oxide using an organic silane, oxid...
- Patent number 6,706,648
- Issue date Mar 16, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 6,703,264
- Issue date Mar 9, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recording medium device containing recording medium and recording/r...
- Patent number 6,680,817
- Issue date Jan 20, 2004
- Sony Corporation
- Yasuaki Kano
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20160172382
- Publication date Jun 16, 2016
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20140139776
- Publication date May 22, 2014
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20120187411
- Publication date Jul 26, 2012
- Semiconductor Energy Laboratory Co., Ltd
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
PLASMA CVD APPARATUS
- Publication number 20120045593
- Publication date Feb 23, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20110034215
- Publication date Feb 10, 2011
- Semiconductor Energy Laboratory Co., Ltd
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD AND A MANUFACTURING METHO...
- Publication number 20100144077
- Publication date Jun 10, 2010
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20090224260
- Publication date Sep 10, 2009
- Semiconductor Energy Laboratory Co., Ltd
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
PLASMA CVD APPARATUS
- Publication number 20090197012
- Publication date Aug 6, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus and method and a manufacturing metho...
- Publication number 20090029509
- Publication date Jan 29, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus and method and a manufacturing metho...
- Publication number 20070173046
- Publication date Jul 26, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device, and method of fabricating the same
- Publication number 20070029626
- Publication date Feb 8, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- G02 - OPTICS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20060267114
- Publication date Nov 30, 2006
- Semiconductor Energy Laboratory Co., Ltd
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
PLASMA CVD METHOD
- Publication number 20060258062
- Publication date Nov 16, 2006
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film forming method and film forming apparatus
- Publication number 20060035035
- Publication date Feb 16, 2006
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- C30 - CRYSTAL GROWTH
Information Patent Application
Semiconductor device, and method of fabricating the same
- Publication number 20050263835
- Publication date Dec 1, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- G02 - OPTICS
Information Patent Application
Plasma CVD apparatus
- Publication number 20050176221
- Publication date Aug 11, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20050116294
- Publication date Jun 2, 2005
- Semiconductor Energy Laboratory Co., Ltd
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
Glass substrate assembly, semiconductor device and method of heat-t...
- Publication number 20050056844
- Publication date Mar 17, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Takeshi Fukada
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Plasma CVD method
- Publication number 20050009309
- Publication date Jan 13, 2005
- Semiconductor Energy Laboratory Co., Ltd., a Japan corporation
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20040256993
- Publication date Dec 23, 2004
- Semiconductor Energy Laboratory Co,. Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and a method of manufacturing the same
- Publication number 20040238820
- Publication date Dec 2, 2004
- Semiconductor Energy Laboratory Co., Ltd
- Mitsunori Sakama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for manufacturing a semiconductor device
- Publication number 20040127069
- Publication date Jul 1, 2004
- Semiconductor Energy Laboratory Co., Ltd. a Japan corporation
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device, and method of fabricating the same
- Publication number 20040007748
- Publication date Jan 15, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- G02 - OPTICS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20030151119
- Publication date Aug 14, 2003
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsunori Sakama
- G02 - OPTICS
Information Patent Application
Plasma CVD apparatus
- Publication number 20030066485
- Publication date Apr 10, 2003
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus and method and a manufacturing metho...
- Publication number 20020197760
- Publication date Dec 26, 2002
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF HEAT TREATMENT AND HEAT TREATMENT APPARATUS FOR SILICON...
- Publication number 20020160622
- Publication date Oct 31, 2002
- SHUNPEI YAMAZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Insulating film and method of producing semiconductor device
- Publication number 20020153565
- Publication date Oct 24, 2002
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device with a tapered hole formed using multiple laye...
- Publication number 20020113239
- Publication date Aug 22, 2002
- Semiconductor Energy Laboratory Co., Ltd. a Japan corporation
- Hideki Uochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for manufacturing a semiconductor device
- Publication number 20020111040
- Publication date Aug 15, 2002
- Semiconductor Energy Laboratory Co., Ltd., a Japanese Corporation
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mitsunori Sakama

Person

Patents Grantslast 30 patents

Semiconductor device and method for manufacturing the same

Semiconductor device and method for manufacturing the same

Semiconductor device and method for manufacturing the same

Method of manufacturing a semiconductor device

Plasma CVD apparatus

Semiconductor device and method for manufacturing the same

Plasma CVD apparatus

Semiconductor device and method for manufacturing the same

Plasma CVD apparatus

Substrate processing apparatus and a manufacturing method of a thin...

Semiconductor device and method for manufacturing the same

APCVD method of forming silicon oxide using an organic silane, oxid...

Insulating film and method of producing semiconductor device

Manufacturing method of a thin film semiconductor device

Plasma CVD method

Method of manufacturing a semiconductor device

Semiconductor device, and method of fabricating the same

Method of manufacturing a semiconductor device

Semiconductor device, and method of fabricating the same

Plasma CVD method

Semiconductor device and method for manufacturing the same

Glass substrate assembly, semiconductor device and method of heat-t...

Plasma CVD method

Method of fabricating a semiconductor device

Semiconductor device and method for manufacturing the same

Glass substrate assembly, semiconductor device and method of heat-t...

Semiconductor device and method of manufacturing the same

APCVD method of forming silicon oxide using an organic silane, oxid...

Method of manufacturing a semiconductor device

Recording medium device containing recording medium and recording/r...

Patents Applicationslast 30 patents

Semiconductor Device and Method for Manufacturing the Same

Semiconductor Device and Method for Manufacturing the Same

Semiconductor Device and Method for Manufacturing the Same

PLASMA CVD APPARATUS

Semiconductor Device and Method for Manufacturing the Same

SUBSTRATE PROCESSING APPARATUS AND METHOD AND A MANUFACTURING METHO...

Semiconductor Device and Method for Manufacturing the Same

PLASMA CVD APPARATUS

Substrate processing apparatus and method and a manufacturing metho...

Substrate processing apparatus and method and a manufacturing metho...

Semiconductor device, and method of fabricating the same

Semiconductor device and method for manufacturing the same

PLASMA CVD METHOD

Film forming method and film forming apparatus

Semiconductor device, and method of fabricating the same

Plasma CVD apparatus

Semiconductor device and method for manufacturing the same

Glass substrate assembly, semiconductor device and method of heat-t...

Plasma CVD method

Method of manufacturing a semiconductor device

Semiconductor device and a method of manufacturing the same

Method and apparatus for manufacturing a semiconductor device

Semiconductor device, and method of fabricating the same

Semiconductor device and method of manufacturing the same

Plasma CVD apparatus

Substrate processing apparatus and method and a manufacturing metho...

METHODS OF HEAT TREATMENT AND HEAT TREATMENT APPARATUS FOR SILICON...

Insulating film and method of producing semiconductor device

Semiconductor device with a tapered hole formed using multiple laye...

Method and apparatus for manufacturing a semiconductor device