Nallan C. Padmapani

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of plasma etching of high-K dielectric materials
- Patent number 7,838,434
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removal of metallic residue after plasma etching of a me...
- Patent number 7,320,942
- Issue date Jan 22, 2008
- Applied Materials, Inc.
- Xiaoyi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching high-K dielectric materials with high sele...
- Patent number 7,217,665
- Issue date May 15, 2007
- Applied Materials, Inc.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a magnetic material
- Patent number 7,105,361
- Issue date Sep 12, 2006
- Applied Materials, Inc.
- Xiaoyi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of high-K dielectric materials
- Patent number 7,094,704
- Issue date Aug 22, 2006
- Applied Materials, Inc.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removal of residue from a magneto-resistive random acces...
- Patent number 6,984,585
- Issue date Jan 10, 2006
- Chentsau Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing residue from a magneto-resistive random access...
- Patent number 6,964,928
- Issue date Nov 15, 2005
- Chentsau Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching magnetic and ferroelectric materials using a puls...
- Patent number 6,942,813
- Issue date Sep 13, 2005
- Applied Materials, Inc.
- Chentsau Ying
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching ferroelectric layers
- Patent number 6,943,039
- Issue date Sep 13, 2005
- Applied Materials Inc.
- Chentsau Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma etching of high-K dielectric materials
- Patent number 6,902,681
- Issue date Jun 7, 2005
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing short circuits in magnetic film stacks
- Patent number 6,893,893
- Issue date May 17, 2005
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a gate structure
- Patent number 6,855,643
- Issue date Feb 15, 2005
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of high-K dielectric materials with high s...
- Patent number 6,806,095
- Issue date Oct 19, 2004
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a gate structure of a field effect transistor...
- Patent number 6,767,824
- Issue date Jul 27, 2004
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a trench in a silicon-on-insulator (SOI) structure
- Patent number 6,759,340
- Issue date Jul 6, 2004
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a gate structure of a field effect transistor...
- Patent number 6,759,286
- Issue date Jul 6, 2004
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning a layer of magnetic material
- Patent number 6,759,263
- Issue date Jul 6, 2004
- Chentsau Ying
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for plasma etching at a constant etch rate
- Patent number 6,660,127
- Issue date Dec 9, 2003
- Applied Materials, Inc.
- Padmapani Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for plasma etching silicon-germanium
- Patent number 6,642,151
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dicing a semiconductor wafer
- Patent number 6,642,127
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods used in fabricating gates in integrated circuit device stru...
- Patent number 6,638,874
- Issue date Oct 28, 2003
- Applied Materials, Inc.
- Sang In Yi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall polymer forming gas additives for etching processes
- Patent number 6,583,065
- Issue date Jun 24, 2003
- Applied Materials Inc.
- Raney Williams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching tungsten or tungsten nitride in semiconductor str...
- Patent number 6,579,806
- Issue date Jun 17, 2003
- Applied Materials Inc.
- Padmapani Nallan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching titanium nitride
- Patent number 6,531,404
- Issue date Mar 11, 2003
- Applied Materials Inc.
- Padmapani Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a tantalum nitride layer in a high density plasma
- Patent number 6,503,845
- Issue date Jan 7, 2003
- Applied Materials Inc.
- Padmapani Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching tungsten or tungsten nitride electrode gates in s...
- Patent number 6,440,870
- Issue date Aug 27, 2002
- Applied Materials, Inc.
- Padmapani Nallan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching tungsten or tungsten nitride electrode gates in s...
- Patent number 6,423,644
- Issue date Jul 23, 2002
- Applied Materials, Inc.
- Padmapani Nallan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching of silicon using a chlorine chemistry augmented with...
- Patent number 6,415,198
- Issue date Jul 2, 2002
- Applied Materials, Inc.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stable plasma process for etching of films
- Patent number 6,399,507
- Issue date Jun 4, 2002
- Applied Materials, Inc.
- Padmapani Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen-free method of plasma etching indium tin oxide
- Patent number 6,368,978
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PLASMA ETCHING OF HIGH-K DIELECTRIC MATERIALS
- Publication number 20070077767
- Publication date Apr 5, 2007
- Applied Materials, Inc.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching metals with high selectivity to hafnium-based die...
- Publication number 20060060565
- Publication date Mar 23, 2006
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating a notched gate structure of a field effect t...
- Publication number 20050176191
- Publication date Aug 11, 2005
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a gate structure of a field effect transistor
- Publication number 20040209468
- Publication date Oct 21, 2004
- Applied Materials Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching metals with high selectivity to hafnium-based die...
- Publication number 20040206724
- Publication date Oct 21, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of plasma etching of high-K dielectric materials with high s...
- Publication number 20040173572
- Publication date Sep 9, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching magnetic and ferroelectric materials using a puls...
- Publication number 20040173570
- Publication date Sep 9, 2004
- APPLIED MATERIALS, INC.
- Chentsau Ying
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of etching metallic materials to form a tapered profile
- Publication number 20040171272
- Publication date Sep 2, 2004
- APPLIED MATERIALS, INC.
- Guangxiang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of etching ferroelectric layers
- Publication number 20040157459
- Publication date Aug 12, 2004
- APPLIED MATERIALS, INC.
- Chentsau Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching high-K dielectric materials
- Publication number 20040132311
- Publication date Jul 8, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching a magnetic material
- Publication number 20040129361
- Publication date Jul 8, 2004
- APPLIED MATERIALS, INC.
- Xiaoyi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for etching a deep trench
- Publication number 20040097077
- Publication date May 20, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method of plasma etching high-K dielectric materials with high sele...
- Publication number 20040097092
- Publication date May 20, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for laterally etching a semiconductor structure
- Publication number 20040077178
- Publication date Apr 22, 2004
- APPLIED MATERIALS, INC.
- Chan-Syun Yang
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method of fabricating a gate structure of a field effect transistor...
- Publication number 20040058517
- Publication date Mar 25, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a gate structure of a field effect transistor...
- Publication number 20040053484
- Publication date Mar 18, 2004
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for removing residue from a magneto-resistive random access...
- Publication number 20040043620
- Publication date Mar 4, 2004
- APPLIED MATERIALS, INC.
- Chentsau Ying
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of patterning a layer of magnetic material
- Publication number 20040043526
- Publication date Mar 4, 2004
- APPLIED MATERIALS, INC.
- Chentsau Ying
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for removal of residue from a magneto-resistive random acces...
- Publication number 20040029393
- Publication date Feb 12, 2004
- APPLIED MATERIALS, INC.
- Chentsau Ying
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of etching magnetic materials
- Publication number 20040026369
- Publication date Feb 12, 2004
- Chentsau Ying
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for plasma etching of high-K dielectric materials
- Publication number 20040007561
- Publication date Jan 15, 2004
- APPLIED MATERIALS, INC.
- Padmapani Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a gate structure
- Publication number 20040009634
- Publication date Jan 15, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma etching of high-K dielectric materials
- Publication number 20040002223
- Publication date Jan 1, 2004
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of increasing selectivity to mask when etching tungsten or t...
- Publication number 20030235995
- Publication date Dec 25, 2003
- Hakeem M. Oluseyi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a capacitor using a high K dielectric material
- Publication number 20030222296
- Publication date Dec 4, 2003
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for removal of metallic residue after plasma etching of a me...
- Publication number 20030219912
- Publication date Nov 27, 2003
- Xiaoyi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching a trench in a silicon-on-insulator (SOI) structure
- Publication number 20030211753
- Publication date Nov 13, 2003
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching of high-K dielectric materials
- Publication number 20030211748
- Publication date Nov 13, 2003
- APPLIED MATERIALS, INC.
- Guangxiang Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS USED IN FABRICATING GATES IN INTEGRATED CIRCUIT DEVICE STRU...
- Publication number 20030186556
- Publication date Oct 2, 2003
- APPLIED MATERIALS, INC.
- Sang In Yi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of preventing short circuits in magnetic film stacks
- Publication number 20030180968
- Publication date Sep 25, 2003
- APPLIED MATERIALS, INC.
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS

Nallan C. Padmapani

Person

Patents Grantslast 30 patents

Method of plasma etching of high-K dielectric materials

Method for removal of metallic residue after plasma etching of a me...

Method of plasma etching high-K dielectric materials with high sele...

Method of etching a magnetic material

Method of plasma etching of high-K dielectric materials

Method for removal of residue from a magneto-resistive random acces...

Method for removing residue from a magneto-resistive random access...

Method of etching magnetic and ferroelectric materials using a puls...

Method of etching ferroelectric layers

Method for plasma etching of high-K dielectric materials

Method of preventing short circuits in magnetic film stacks

Method for fabricating a gate structure

Method of plasma etching of high-K dielectric materials with high s...

Method of fabricating a gate structure of a field effect transistor...

Method of etching a trench in a silicon-on-insulator (SOI) structure

Method of fabricating a gate structure of a field effect transistor...

Method of patterning a layer of magnetic material

Apparatus for plasma etching at a constant etch rate

Techniques for plasma etching silicon-germanium

Method for dicing a semiconductor wafer

Methods used in fabricating gates in integrated circuit device stru...

Sidewall polymer forming gas additives for etching processes

Method of etching tungsten or tungsten nitride in semiconductor str...

Method of etching titanium nitride

Method of etching a tantalum nitride layer in a high density plasma

Method of etching tungsten or tungsten nitride electrode gates in s...

Method of etching tungsten or tungsten nitride electrode gates in s...

Plasma etching of silicon using a chlorine chemistry augmented with...

Stable plasma process for etching of films

Hydrogen-free method of plasma etching indium tin oxide

Patents Applicationslast 30 patents

METHOD OF PLASMA ETCHING OF HIGH-K DIELECTRIC MATERIALS

Method of etching metals with high selectivity to hafnium-based die...

Method for fabricating a notched gate structure of a field effect t...

Method for fabricating a gate structure of a field effect transistor

Method of etching metals with high selectivity to hafnium-based die...

Method of plasma etching of high-K dielectric materials with high s...

Method of etching magnetic and ferroelectric materials using a puls...

Method of etching metallic materials to form a tapered profile

Method of etching ferroelectric layers

Method of etching high-K dielectric materials

Method of etching a magnetic material

Method and apparatus for etching a deep trench

Method of plasma etching high-K dielectric materials with high sele...

Method for laterally etching a semiconductor structure

Method of fabricating a gate structure of a field effect transistor...

Method of fabricating a gate structure of a field effect transistor...

Method for removing residue from a magneto-resistive random access...

Method of patterning a layer of magnetic material

Method for removal of residue from a magneto-resistive random acces...

Method of etching magnetic materials

Method for plasma etching of high-K dielectric materials

Method for fabricating a gate structure

Method for plasma etching of high-K dielectric materials

Method of increasing selectivity to mask when etching tungsten or t...

Method of forming a capacitor using a high K dielectric material

Method for removal of metallic residue after plasma etching of a me...

Method of etching a trench in a silicon-on-insulator (SOI) structure

Method of plasma etching of high-K dielectric materials

METHODS USED IN FABRICATING GATES IN INTEGRATED CIRCUIT DEVICE STRU...

Method of preventing short circuits in magnetic film stacks