Naoki Shindo

Person

Kurume-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and etching apparatus
- Patent number 11,764,070
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Satoshi Toda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,335,567
- Issue date May 17, 2022
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle cleaning device, nozzle cleaning method, and substrate proce...
- Patent number 10,700,166
- Issue date Jun 30, 2020
- Tokyo Electron Limited
- Yoshihiro Kai
- B08 - CLEANING
Information Patent Grant
Method of forming titanium oxide film and method of forming hard mask
- Patent number 10,535,528
- Issue date Jan 14, 2020
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus having nozzle with multiple f...
- Patent number 9,922,849
- Issue date Mar 20, 2018
- Tokyo Electron Limited
- Yasuyuki Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid treatment apparatus
- Patent number 9,768,010
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid process apparatus and liquid process method
- Patent number 9,691,602
- Issue date Jun 27, 2017
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system and program st...
- Patent number 9,358,588
- Issue date Jun 7, 2016
- Tokyo Electron Limited
- Tsukasa Watanabe
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus, liquid processing method, and recordin...
- Patent number 9,202,731
- Issue date Dec 1, 2015
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid arm cleaning unit for substrate processing apparatus
- Patent number 9,190,311
- Issue date Nov 17, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- B08 - CLEANING
Information Patent Grant
Liquid process apparatus and liquid process method
- Patent number 9,177,838
- Issue date Nov 3, 2015
- Tokyo Electron Limited
- Norihiro Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate cleaning method, substrate cleaning system and program st...
- Patent number 8,449,684
- Issue date May 28, 2013
- Tokyo Electron Limited
- Tsukasa Watanabe
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method, substrate cleaning system and program st...
- Patent number 8,347,901
- Issue date Jan 8, 2013
- Tokyo Electron Limited
- Tsukasa Watanabe
- B08 - CLEANING
Information Patent Grant
Substrate processing method and non-transitory storage medium for c...
- Patent number 8,303,724
- Issue date Nov 6, 2012
- Tokyo Electron Limited
- Koukichi Hiroshiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning apparatus, control pr...
- Patent number 8,197,606
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Tsukasa Watanabe
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning method, substrate cleaning system and program st...
- Patent number 8,152,928
- Issue date Apr 10, 2012
- Tokyo Electron Limited
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and substrate cleaning apparatus
- Patent number 8,083,857
- Issue date Dec 27, 2011
- Tokyo Electron Limited
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including a drying mechanism using a...
- Patent number 8,015,984
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Koukichi Hiroshiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,896,973
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,897,498
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Glenn Gale
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing system, substrate processing method, recording...
- Patent number 7,836,900
- Issue date Nov 23, 2010
- Tokyo Electron Limited
- Takayuki Toshima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate drying processing apparatus, method, and program recordin...
- Patent number 7,581,335
- Issue date Sep 1, 2009
- Tokyo Electron Limited
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 7,410,543
- Issue date Aug 12, 2008
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,869,499
- Issue date Mar 22, 2005
- Tokyo Electron Limited
- Takayuki Toshima
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,817,368
- Issue date Nov 16, 2004
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,729,041
- Issue date May 4, 2004
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and cleaning equipment
- Patent number 6,592,678
- Issue date Jul 15, 2003
- Tokyo Electron Limited
- Yuji Kamikawa
- B24 - GRINDING POLISHING
Information Patent Grant
Treatment apparatus
- Patent number 6,318,386
- Issue date Nov 20, 2001
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Cleaning method and apparatus
- Patent number 6,293,288
- Issue date Sep 25, 2001
- Tokyo Electron Limited
- Naoki Shindo
- B08 - CLEANING
Information Patent Grant
Cleaning method
- Patent number 6,203,627
- Issue date Mar 20, 2001
- Tokyo Electron Limited
- Naoki Shindo
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20230178378
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Noriaki OKABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20230014819
- Publication date Jan 19, 2023
- Tokyo Electron Limited
- Satoshi TODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20220384178
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Naoki SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220319877
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Naoki SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20220020601
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Satoshi TODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD
- Publication number 20210090912
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Naoki SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20210090898
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Naoki SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING TITANIUM OXIDE FILM AND METHOD OF FORMING HARD MASK
- Publication number 20180108534
- Publication date Apr 19, 2018
- TOKYO ELECTRON LIMITED
- Naoki SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20150318183
- Publication date Nov 5, 2015
- TOKYO ELECTRON LIMITED
- Yasuyuki Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...
- Publication number 20140261570
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCE...
- Publication number 20130319470
- Publication date Dec 5, 2013
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
LIQUID TREATMENT APPARATUS
- Publication number 20130180659
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Norihiro Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND PROGRAM ST...
- Publication number 20130152964
- Publication date Jun 20, 2013
- TOKYO ELECTRON LIMITED
- Tsukasa WATANABE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD
- Publication number 20130014784
- Publication date Jan 17, 2013
- TOKYO ELECTRON LIMITED
- Norihiro ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD
- Publication number 20130014786
- Publication date Jan 17, 2013
- TOKYO ELECTRON LIMITED
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Apparatus and Liquid Processing Method
- Publication number 20120180828
- Publication date Jul 19, 2012
- Jiro HIGASHIJIMA
- B08 - CLEANING
Information Patent Application
Liquid Processing Apparatus, Liquid Processing Method, and Recordin...
- Publication number 20120160274
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY STORAGE MEDIUM FOR C...
- Publication number 20110290280
- Publication date Dec 1, 2011
- TOKYO ELECTRON LIMITED
- Koukichi HIROSHIRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, RECORDING...
- Publication number 20110011425
- Publication date Jan 20, 2011
- TOKYO ELECTRON LIMITED
- Takayuki TOSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, CONTROL PR...
- Publication number 20100206329
- Publication date Aug 19, 2010
- TOKYO ELECTRON LIMITED
- Tsukasa WATANABE
- B24 - GRINDING POLISHING
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20090101186
- Publication date Apr 23, 2009
- Koukichi Hiroshiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning method and substrate cleaning apparatus
- Publication number 20080308120
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Semiconductor Device
- Publication number 20080268655
- Publication date Oct 30, 2008
- Glenn Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning method, substrate cleaning system and program st...
- Publication number 20070267040
- Publication date Nov 22, 2007
- TOKYO ELECTRON LIMITED
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning method, substrate cleaning system and program st...
- Publication number 20070240736
- Publication date Oct 18, 2007
- Tsukasa Watanabe
- B08 - CLEANING
Information Patent Application
Substrate cleaning method, substrate cleaning system and program st...
- Publication number 20070215172
- Publication date Sep 20, 2007
- Tsukasa Watanabe
- B08 - CLEANING
Information Patent Application
Substrate processing system, substrate processing method, recording...
- Publication number 20070175062
- Publication date Aug 2, 2007
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Drying apparatus, drying method, substrate processing apparatus, su...
- Publication number 20070113423
- Publication date May 24, 2007
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20050087133
- Publication date Apr 28, 2005
- TOKYO ELECTRON LIMITED
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20050051246
- Publication date Mar 10, 2005
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS

Naoki Shindo

Person

Patents Grantslast 30 patents

Etching method and etching apparatus

Etching method and etching apparatus

Nozzle cleaning device, nozzle cleaning method, and substrate proce...

Method of forming titanium oxide film and method of forming hard mask

Substrate liquid processing apparatus having nozzle with multiple f...

Liquid treatment apparatus

Liquid process apparatus and liquid process method

Substrate cleaning method, substrate cleaning system and program st...

Liquid processing apparatus, liquid processing method, and recordin...

Liquid arm cleaning unit for substrate processing apparatus

Liquid process apparatus and liquid process method

Substrate cleaning method, substrate cleaning system and program st...

Substrate cleaning method, substrate cleaning system and program st...

Substrate processing method and non-transitory storage medium for c...

Substrate cleaning method, substrate cleaning apparatus, control pr...

Substrate cleaning method, substrate cleaning system and program st...

Substrate cleaning method and substrate cleaning apparatus

Substrate processing apparatus including a drying mechanism using a...

Substrate processing apparatus and substrate processing method

Method for manufacturing semiconductor device

Substrate processing system, substrate processing method, recording...

Substrate drying processing apparatus, method, and program recordin...

Substrate processing method

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Cleaning method and cleaning equipment

Treatment apparatus

Cleaning method and apparatus

Cleaning method

Patents Applicationslast 30 patents

ETCHING METHOD AND ETCHING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

ETCHING METHOD AND ETCHING APPARATUS

ETCHING APPARATUS AND ETCHING METHOD

ETCHING METHOD AND ETCHING APPARATUS

METHOD OF FORMING TITANIUM OXIDE FILM AND METHOD OF FORMING HARD MASK

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...

NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCE...

LIQUID TREATMENT APPARATUS

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND PROGRAM ST...

LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD

LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD

Liquid Processing Apparatus and Liquid Processing Method

Liquid Processing Apparatus, Liquid Processing Method, and Recordin...

SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY STORAGE MEDIUM FOR C...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, RECORDING...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, CONTROL PR...

Substrate Processing Apparatus and Substrate Processing Method

Substrate cleaning method and substrate cleaning apparatus

Method for Manufacturing Semiconductor Device

Substrate cleaning method, substrate cleaning system and program st...

Substrate cleaning method, substrate cleaning system and program st...

Substrate cleaning method, substrate cleaning system and program st...

Substrate processing system, substrate processing method, recording...

Drying apparatus, drying method, substrate processing apparatus, su...

Substrate processing apparatus and substrate processing method

Substrate processing method and substrate processing apparatus