Naoki Takeyama

Person

Saga, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Negative type resist composition
- Patent number RE40964
- Issue date Nov 10, 2009
- Sumitomo Chemical Company, Limited
- Masumi Suetsugu
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Resist composition
- Patent number 6,656,660
- Issue date Dec 2, 2003
- Sumitomo Chemical Company, Limited
- Fumiyoshi Urano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative type resist composition
- Patent number 6,329,119
- Issue date Dec 11, 2001
- Sumitomo Chemical Company, Limited
- Masumi Suetsugu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive working photoresist compositions comprising a nitrogen-con...
- Patent number 6,280,902
- Issue date Aug 28, 2001
- Sumitomo Chemical Company, Limited
- Yuko Yako
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 6,156,476
- Issue date Dec 5, 2000
- Sumitomo Chemical Company, Limited
- Naoki Takeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 5,985,511
- Issue date Nov 16, 1999
- Sumitomo Chemical Company, Limited
- Yuko Yako
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Succinimide derivative, process for production and use thereof
- Patent number 5,965,748
- Issue date Oct 12, 1999
- Sumitomo Chemical Company, Limited
- Akira Kamabuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition for color filter
- Patent number 5,876,895
- Issue date Mar 2, 1999
- Sumitomo Chemical Company, Limited
- Yoshiki Hishiro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition
- Patent number 5,846,688
- Issue date Dec 8, 1998
- Sumitomo Chemical Company, Limited
- Nobuhito Fukui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,800,966
- Issue date Sep 1, 1998
- Sumitomo Chemical Company, Limited
- Yuji Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition for use in color filters
- Patent number 5,731,110
- Issue date Mar 24, 1998
- Sumitomo Chemical Company, Limited
- Yoshiki Hishiro
- G02 - OPTICS
Information Patent Grant
Azo dyes for use in color filters and method for production of colo...
- Patent number 5,686,585
- Issue date Nov 11, 1997
- Sumitomo Chemical Company, Limited
- Yoshiki Hishiro
- G02 - OPTICS
Information Patent Grant
Curable resin composition for overcoat film of color filter and col...
- Patent number 5,614,594
- Issue date Mar 25, 1997
- Sumitomo Chemical Company, Limited
- Susumu Miyazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition containing alkyletherified polyvinylphenol
- Patent number 5,585,218
- Issue date Dec 17, 1996
- Sumitomo Chemical Company, Limited
- Yuko Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Color filter
- Patent number 5,478,680
- Issue date Dec 26, 1995
- Sumitomo Chemical Company, Limited
- Yoshiki Hishiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cyclic carbonate compounds, method for producing the same and posit...
- Patent number 5,420,331
- Issue date May 30, 1995
- Sumitomo Chemical Company, Limited
- Yuji Ueda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cyclic carbonate compounds, method for producing the same and posit...
- Patent number 5,397,679
- Issue date Mar 14, 1995
- Sumitomo Chemical Company, Limited
- Yuji Ueda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition containing a novolak resin made from an...
- Patent number 5,395,727
- Issue date Mar 7, 1995
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Quinone diazide photoresist composition containing alkali-soluble r...
- Patent number 5,362,598
- Issue date Nov 8, 1994
- Sumitomo Chemical Co., Ltd.
- Naoki Takeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photoresist composition
- Patent number 5,304,456
- Issue date Apr 19, 1994
- Sumitomo Chemical Company, Limited
- Yuji Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition containing alkali-soluble resin, 1,2-quinone dia...
- Patent number 5,198,323
- Issue date Mar 30, 1993
- Sumitomo Chemical Co., Ltd.
- Teijiro Kitao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Naoki Takeyama

Person

Patents Grantslast 30 patents

Negative type resist composition

Resist composition

Negative type resist composition

Positive working photoresist compositions comprising a nitrogen-con...

Positive photoresist composition

Photoresist composition

Succinimide derivative, process for production and use thereof

Photosensitive resin composition for color filter

Photoresist composition

Positive photoresist composition

Photoresist composition for use in color filters

Azo dyes for use in color filters and method for production of colo...

Curable resin composition for overcoat film of color filter and col...

Photoresist composition containing alkyletherified polyvinylphenol

Color filter

Cyclic carbonate compounds, method for producing the same and posit...

Cyclic carbonate compounds, method for producing the same and posit...

Positive resist composition containing a novolak resin made from an...

Quinone diazide photoresist composition containing alkali-soluble r...

Negative photoresist composition

Resist composition containing alkali-soluble resin, 1,2-quinone dia...