Naoshi Adachi

Person

Ogi-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Epitaxial wafer and method of producing the same
- Patent number 8,568,537
- Issue date Oct 29, 2013
- Sumco Corporation
- Naoshi Adachi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Heat treatment jig for semiconductor silicon substrates and method...
- Patent number 8,105,078
- Issue date Jan 31, 2012
- Sumco Corporation
- Naoshi Adachi
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Epitaxial wafer and method of producing the same
- Patent number 8,030,184
- Issue date Oct 4, 2011
- Sumco Corporation
- Naoshi Adachi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Manufacturing method for SIMOX substrate
- Patent number 7,560,363
- Issue date Jul 14, 2009
- Sumco Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment jig for semiconductor silicon substrate
- Patent number 7,442,038
- Issue date Oct 28, 2008
- Sumitomo Mitsubishi Silicaon Corporation
- Naoshi Adachi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment jig for semiconductor wafer
- Patent number 7,331,780
- Issue date Feb 19, 2008
- Sumco Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment jig for semiconductor substrate
- Patent number 7,329,947
- Issue date Feb 12, 2008
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pasted SOI substrate, process for producing the same and semiconduc...
- Patent number 7,253,082
- Issue date Aug 7, 2007
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment jig for silicon semiconductor substrate
- Patent number 7,210,925
- Issue date May 1, 2007
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment jig for semiconductor silicon substrate
- Patent number 7,163,393
- Issue date Jan 16, 2007
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
SOI substrate and manufacturing method thereof
- Patent number 6,875,643
- Issue date Apr 5, 2005
- Sumitomo Mitsubishi Silicon Corporation
- Masanori Akatsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor silicon wafer, semiconductor silicon wafer fabricatio...
- Patent number 6,129,787
- Issue date Oct 10, 2000
- Sumitomo Metal Industries, Ltd.
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon single crystal wafer annealing method and equipment, and si...
- Patent number 6,074,479
- Issue date Jun 13, 2000
- Sumitomo Metal Industries Ltd.
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon single crystal wafer annealing method and equipment and sil...
- Patent number 5,931,662
- Issue date Aug 3, 1999
- Sumitomo Sitix Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of annealing a semiconductor wafer in a hydrogen atmosphere...
- Patent number 5,508,207
- Issue date Apr 16, 1996
- Sumitomo Sitix Corporation
- Masataka Horai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EPITAXIAL WAFER AND METHOD OF PRODUCING THE SAME
- Publication number 20110298094
- Publication date Dec 8, 2011
- SUMCO CORPORATION
- Naoshi Adachi
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR PRODUCING HIGH-RESISTANCE SIMOX WAFER
- Publication number 20100022066
- Publication date Jan 28, 2010
- SUMCO CORPORATION
- Yoshiro Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL WAFER AND PRODUCTION METHOD THEREOF
- Publication number 20090321874
- Publication date Dec 31, 2009
- SUMCO CORPORATION
- Yoshiro AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL WAFER AND METHOD OF PRODUCING THE SAME
- Publication number 20090152685
- Publication date Jun 18, 2009
- SUMCO CORPORATION
- Naoshi Adachi
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for Manufacturing Simox Substrate and Simox Substrate Obtain...
- Publication number 20080251879
- Publication date Oct 16, 2008
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing Method For Simox Substrate
- Publication number 20080090384
- Publication date Apr 17, 2008
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Simox Substrate and Simox Substrate Obtain...
- Publication number 20080044669
- Publication date Feb 21, 2008
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment jig for semiconductor silicon substrates and method...
- Publication number 20070184397
- Publication date Aug 9, 2007
- Naoshi Adachi
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
HEAT TREATMENT JIG FOR SEMICONDUCTOR SILICON SUBSTRATE
- Publication number 20070087299
- Publication date Apr 19, 2007
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for heat treatment of silicon wafers
- Publication number 20060189169
- Publication date Aug 24, 2006
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment jig for semiconductor wafer
- Publication number 20060078839
- Publication date Apr 13, 2006
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment jig for silicon semiconductor substrate
- Publication number 20050282101
- Publication date Dec 22, 2005
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment jig for semiconductor silicon substrate
- Publication number 20050170307
- Publication date Aug 4, 2005
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOI substrate
- Publication number 20050158921
- Publication date Jul 21, 2005
- Masanori Akatsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment jig for semiconductor substrate and method of heat t...
- Publication number 20050098877
- Publication date May 12, 2005
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pasted soi substrate, process for producing the same and semiconduc...
- Publication number 20050081958
- Publication date Apr 21, 2005
- Sumitomo Mitsubishi Silicon Corporation
- Naoshi Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOI substrate and manufacturing method thereof
- Publication number 20040232490
- Publication date Nov 25, 2004
- Masanori Akatsuka
- H01 - BASIC ELECTRIC ELEMENTS

Naoshi Adachi

Person

Patents Grantslast 30 patents

Epitaxial wafer and method of producing the same

Heat treatment jig for semiconductor silicon substrates and method...

Epitaxial wafer and method of producing the same

Manufacturing method for SIMOX substrate

Heat treatment jig for semiconductor silicon substrate

Heat treatment jig for semiconductor wafer

Heat treatment jig for semiconductor substrate

Pasted SOI substrate, process for producing the same and semiconduc...

Heat treatment jig for silicon semiconductor substrate

Heat treatment jig for semiconductor silicon substrate

SOI substrate and manufacturing method thereof

Semiconductor silicon wafer, semiconductor silicon wafer fabricatio...

Silicon single crystal wafer annealing method and equipment, and si...

Silicon single crystal wafer annealing method and equipment and sil...

Method of annealing a semiconductor wafer in a hydrogen atmosphere...

Patents Applicationslast 30 patents

EPITAXIAL WAFER AND METHOD OF PRODUCING THE SAME

METHOD FOR PRODUCING HIGH-RESISTANCE SIMOX WAFER

EPITAXIAL WAFER AND PRODUCTION METHOD THEREOF

EPITAXIAL WAFER AND METHOD OF PRODUCING THE SAME

Method for Manufacturing Simox Substrate and Simox Substrate Obtain...

Manufacturing Method For Simox Substrate

Method for Manufacturing Simox Substrate and Simox Substrate Obtain...

Heat treatment jig for semiconductor silicon substrates and method...

HEAT TREATMENT JIG FOR SEMICONDUCTOR SILICON SUBSTRATE

Method for heat treatment of silicon wafers

Heat treatment jig for semiconductor wafer

Heat treatment jig for silicon semiconductor substrate

Heat treatment jig for semiconductor silicon substrate

SOI substrate

Heat treatment jig for semiconductor substrate and method of heat t...

Pasted soi substrate, process for producing the same and semiconduc...

SOI substrate and manufacturing method thereof