Naoyuki Tamura

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,899,789
- Issue date May 31, 2005
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,838,833
- Issue date Jan 4, 2005
- Hitachi, Ltd.
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,676,805
- Issue date Jan 13, 2004
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,664,738
- Issue date Dec 16, 2003
- Hitachi, Ltd.
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,645,871
- Issue date Nov 11, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,170
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,171
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,544,379
- Issue date Apr 8, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,524,428
- Issue date Feb 25, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,336,991
- Issue date Jan 8, 2002
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,221,201
- Issue date Apr 24, 2001
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,217,705
- Issue date Apr 17, 2001
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding system including an electrostatic chuck
- Patent number 6,048,434
- Issue date Apr 11, 2000
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,985,035
- Issue date Nov 16, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,961,774
- Issue date Oct 5, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,906,684
- Issue date May 25, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,792,304
- Issue date Aug 11, 1998
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing system
- Patent number 5,685,684
- Issue date Nov 11, 1997
- Hitachi, Ltd.
- Shigekazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing method and apparatus
- Patent number 5,673,750
- Issue date Oct 7, 1997
- Hitachi, Ltd.
- Tsunehiko Tsubone
- C30 - CRYSTAL GROWTH
Information Patent Grant
Multiprocessing apparatus
- Patent number 5,663,884
- Issue date Sep 2, 1997
- Hitachi, Ltd.
- Kouji Nishihata
- G05 - CONTROLLING REGULATING
Information Patent Grant
Vacuum processing apparatus
- Patent number 5,607,510
- Issue date Mar 4, 1997
- Hitachi, Ltd.
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and an apparatus for carrying out the same
- Patent number 5,587,205
- Issue date Dec 24, 1996
- Hitachi, Ltd.
- Hiroshi Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating method and apparatus and plasma processing method...
- Patent number 5,580,420
- Issue date Dec 3, 1996
- Hitachi, Ltd.
- Katsuya Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD reactor apparatus
- Patent number 5,574,247
- Issue date Nov 12, 1996
- Hitachi, Ltd.
- Eisuke Nishitani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for detecting the temperature of a sample
- Patent number 5,556,204
- Issue date Sep 17, 1996
- Hitachi, Ltd.
- Naoyuki Tamura
- C30 - CRYSTAL GROWTH
Information Patent Grant
Semiconductor device manufacturing apparatus and method with optica...
- Patent number 5,536,359
- Issue date Jul 16, 1996
- Hitachi, Ltd.
- Hiroki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for securing and cooling/heating a wafer
- Patent number 5,458,687
- Issue date Oct 17, 1995
- Hitachi, Ltd.
- Hiroyuki Shichida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiprocessing apparatus
- Patent number 5,448,470
- Issue date Sep 5, 1995
- Hitachi, Ltd.
- Kouji Nishihata
- G05 - CONTROLLING REGULATING
Information Patent Grant
Vacuum processing system
- Patent number 5,445,484
- Issue date Aug 29, 1995
- Hitachi, Ltd.
- Shigekazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 5,391,260
- Issue date Feb 21, 1995
- Hitachi, Ltd.
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing apparatus
- Publication number 20040061449
- Publication date Apr 1, 2004
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20030192647
- Publication date Oct 16, 2003
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20030160568
- Publication date Aug 28, 2003
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020108574
- Publication date Aug 15, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020104618
- Publication date Aug 8, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020096116
- Publication date Jul 25, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020046706
- Publication date Apr 25, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20010025608
- Publication date Oct 4, 2001
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20010009178
- Publication date Jul 26, 2001
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS

Naoyuki Tamura

Person

Patents Grantslast 30 patents

Method of holding substrate and substrate holding system

Plasma processing apparatus

Method of holding substrate and substrate holding system

Plasma processing apparatus

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Substrate holding system including an electrostatic chuck

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Vacuum processing system

Vacuum processing method and apparatus

Multiprocessing apparatus

Vacuum processing apparatus

Plasma processing method and an apparatus for carrying out the same

Plasma generating method and apparatus and plasma processing method...

CVD reactor apparatus

Method and apparatus for detecting the temperature of a sample

Semiconductor device manufacturing apparatus and method with optica...

Method of and apparatus for securing and cooling/heating a wafer

Multiprocessing apparatus

Vacuum processing system

Vacuum processing apparatus

Patents Applicationslast 30 patents

Plasma processing apparatus

Method of holding substrate and substrate holding system

Plasma processing apparatus

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system