Nicholas Eib

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Maskless vortex phase shift optical direct write lithography
- Patent number 9,188,848
- Issue date Nov 17, 2015
- Avago Technologies General IP (Singapore) Pte. Ltd.
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless vortex phase shift optical direct write lithography
- Patent number 8,377,633
- Issue date Feb 19, 2013
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless vortex phase shift optical direct write lithography
- Patent number 8,057,963
- Issue date Nov 15, 2011
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for providing temperature uniformity of rapid thermal annealing
- Patent number 8,012,873
- Issue date Sep 6, 2011
- SuVolta, Inc.
- Nicholas K. Eib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized mirror design for optical direct write
- Patent number 7,738,078
- Issue date Jun 15, 2010
- LSI Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Grant
Reflectivity optimization for multilayer stacks
- Patent number 7,634,389
- Issue date Dec 15, 2009
- LSI Corporation
- Lav Ivanovic
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method, an integrat...
- Patent number 7,499,146
- Issue date Mar 3, 2009
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process and apparatus for achieving single exposure pattern transfe...
- Patent number 7,372,547
- Issue date May 13, 2008
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window compliant corrections of design layout
- Patent number 7,313,508
- Issue date Dec 25, 2007
- LSI Corporation
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized mirror design for optical direct write
- Patent number 7,270,942
- Issue date Sep 18, 2007
- LSI Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Grant
OPC based illumination optimization with mask error constraints
- Patent number 7,264,906
- Issue date Sep 4, 2007
- LSI Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process and apparatus for generating a strong phase shift optical p...
- Patent number 7,189,498
- Issue date Mar 13, 2007
- LSI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment process for integrated circuit structures on semiconducto...
- Patent number 6,809,824
- Issue date Oct 26, 2004
- LSI Logic Corporation
- Colin D. Yates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching a controllable thickness of oxide on an integra...
- Patent number 6,759,337
- Issue date Jul 6, 2004
- LSI Logic Corporation
- Sheldon Aronowitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for application of proximity correction with r...
- Patent number 6,532,585
- Issue date Mar 11, 2003
- LSI Logic Corporation
- Dusan Petranovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for application of proximity correction with u...
- Patent number 6,499,003
- Issue date Dec 24, 2002
- LSI Logic Corporation
- Edwin Jones
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for performing optical proximity correction on th...
- Patent number 6,425,117
- Issue date Jul 23, 2002
- LSI Logic Corporation
- Nicholas F. Pasch
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
PROCESS FOR FORMING THIN GATE OXIDE WITH ENHANCED RELIABILITY BY NI...
- Patent number 6,413,881
- Issue date Jul 2, 2002
- LSI Logic Corporation
- Sheldon Aronowitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 6,282,696
- Issue date Aug 28, 2001
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method and apparatus
- Patent number 6,269,472
- Issue date Jul 31, 2001
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for general systematic application of proximit...
- Patent number 6,175,953
- Issue date Jan 16, 2001
- LSI Logic Corporation
- Ranko Scepanovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of proximity correction with relative segmentation
- Patent number 6,174,630
- Issue date Jan 16, 2001
- LSI Logic Corporation
- Dusan Petranovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting the density of lines and contact openings acro...
- Patent number 6,109,775
- Issue date Aug 29, 2000
- LSI Logic Corporation
- Prabhakar P. Tripathi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 5,900,338
- Issue date May 4, 1999
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a layer and semiconductor substrate
- Patent number 5,897,381
- Issue date Apr 27, 1999
- LSI Logic Corporation
- Sheldon Aronowitz
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for rapid thermal processing of a wafer
- Patent number 5,893,952
- Issue date Apr 13, 1999
- LSI Logic Corporation
- Sheldon Aronowitz
- B24 - GRINDING POLISHING
Information Patent Grant
Rapid thermal processing using a narrowband infrared source and fee...
- Patent number 5,756,369
- Issue date May 26, 1998
- LSI Logic Corporation
- Sheldon Aronowitz
- B24 - GRINDING POLISHING
Information Patent Grant
Optical proximity correction method and apparatus
- Patent number 5,723,233
- Issue date Mar 3, 1998
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 5,705,301
- Issue date Jan 6, 1998
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for performing optical proximity correction on ma...
- Patent number 5,682,323
- Issue date Oct 28, 1997
- LSI Logic Corporation
- Nicholas Pasch
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
Maskless Vortex Phase Shift Optical Direct Write Lithography
- Publication number 20130107240
- Publication date May 2, 2013
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maskless Vortex Phase Shift Optical Direct Write Lithography
- Publication number 20120038896
- Publication date Feb 16, 2012
- LSI Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZED MIRROR DESIGN FOR OPTICAL DIRECT WRITE
- Publication number 20070247604
- Publication date Oct 25, 2007
- LSI Logic Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method, an integrat...
- Publication number 20060203220
- Publication date Sep 14, 2006
- ASML NETHERLANDS B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maskless vortex phase shift optical direct write lithography
- Publication number 20050275814
- Publication date Dec 15, 2005
- LSI Logic Corporation, a Delaware Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process and apparatus for achieving single exposure pattern transfe...
- Publication number 20050237508
- Publication date Oct 27, 2005
- LSI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPC based illumination optimization with mask error constraints
- Publication number 20050196681
- Publication date Sep 8, 2005
- Ebo H. Croffle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process and apparatus for applying apodization to maskless optical...
- Publication number 20050151949
- Publication date Jul 14, 2005
- LSI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process and apparatus for generating a strong phase shift optical p...
- Publication number 20050153246
- Publication date Jul 14, 2005
- LGI Logic Corporation
- Nicholas K. Eib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflectivity optimization for multilayer stacks
- Publication number 20050114094
- Publication date May 26, 2005
- Lav Ivanovic
- G02 - OPTICS
Information Patent Application
Optimized mirror design for optical direct write
- Publication number 20050088640
- Publication date Apr 28, 2005
- LSI Logic Corporation
- Nicholas K. Eib
- G02 - OPTICS
Information Patent Application
Phase edge darkening binary masks
- Publication number 20050014075
- Publication date Jan 20, 2005
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ion implantation phase shift mask
- Publication number 20040241554
- Publication date Dec 2, 2004
- LSI Logic Corporation, Milpitas, CA
- Paul Rissman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process window compliant corrections of design layout
- Publication number 20040128118
- Publication date Jul 1, 2004
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR APPLICATION OF PROXIMITY CORRECTION WITH U...
- Publication number 20020004714
- Publication date Jan 10, 2002
- EDWIN JONES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Nicholas Eib

Person

Patents Grantslast 30 patents

Maskless vortex phase shift optical direct write lithography

Maskless vortex phase shift optical direct write lithography

Maskless vortex phase shift optical direct write lithography

Method for providing temperature uniformity of rapid thermal annealing

Optimized mirror design for optical direct write

Reflectivity optimization for multilayer stacks

Lithographic apparatus and device manufacturing method, an integrat...

Process and apparatus for achieving single exposure pattern transfe...

Process window compliant corrections of design layout

Optimized mirror design for optical direct write

OPC based illumination optimization with mask error constraints

Process and apparatus for generating a strong phase shift optical p...

Alignment process for integrated circuit structures on semiconducto...

Process for etching a controllable thickness of oxide on an integra...

Method and apparatus for application of proximity correction with r...

Method and apparatus for application of proximity correction with u...

System and method for performing optical proximity correction on th...

PROCESS FOR FORMING THIN GATE OXIDE WITH ENHANCED RELIABILITY BY NI...

Performing optical proximity correction with the aid of design rule...

Optical proximity correction method and apparatus

Method and apparatus for general systematic application of proximit...

Method of proximity correction with relative segmentation

Method for adjusting the density of lines and contact openings acro...

Performing optical proximity correction with the aid of design rule...

Method of forming a layer and semiconductor substrate

Apparatus for rapid thermal processing of a wafer

Rapid thermal processing using a narrowband infrared source and fee...

Optical proximity correction method and apparatus

Performing optical proximity correction with the aid of design rule...

System and method for performing optical proximity correction on ma...

Patents Applicationslast 30 patents

Maskless Vortex Phase Shift Optical Direct Write Lithography

Maskless Vortex Phase Shift Optical Direct Write Lithography

OPTIMIZED MIRROR DESIGN FOR OPTICAL DIRECT WRITE

Lithographic apparatus and device manufacturing method, an integrat...

Maskless vortex phase shift optical direct write lithography

Process and apparatus for achieving single exposure pattern transfe...

OPC based illumination optimization with mask error constraints

Process and apparatus for applying apodization to maskless optical...

Process and apparatus for generating a strong phase shift optical p...

Reflectivity optimization for multilayer stacks

Optimized mirror design for optical direct write

Phase edge darkening binary masks

Ion implantation phase shift mask

Process window compliant corrections of design layout

METHOD AND APPARATUS FOR APPLICATION OF PROXIMITY CORRECTION WITH U...