Noriyuki Anai

Person

Kumamoto-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Coating method and apparatus for semiconductor process
- Patent number 6,749,688
- Issue date Jun 15, 2004
- Tokyo Electron Limited
- Kiyohisa Tateyama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating apparatus and coating method
- Patent number 6,635,113
- Issue date Oct 21, 2003
- Tokyo Electron Limited
- Hideyuki Takamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 6,458,208
- Issue date Oct 1, 2002
- Tokyo Electron Limited
- Noriyuki Anai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating method
- Patent number 6,451,515
- Issue date Sep 17, 2002
- Tokyo Electron Limited
- Hideyuki Takamori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate process method and substrate process apparatus
- Patent number 6,443,641
- Issue date Sep 3, 2002
- Tokyo Electron Limited
- Hideyuki Takamori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating and developing method
- Patent number 6,444,409
- Issue date Sep 3, 2002
- Tokyo Electron Limited
- Shinichiro Araki
- G02 - OPTICS
Information Patent Grant
Coating and developing apparatus
- Patent number 6,270,576
- Issue date Aug 7, 2001
- Tokyo Electron Limited
- Shinichiro Araki
- G02 - OPTICS
Information Patent Grant
Substrate process method and substrate process apparatus
- Patent number 6,261,007
- Issue date Jul 17, 2001
- Tokyo Electron Limited
- Hideyuki Takamori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming method
- Patent number 6,165,552
- Issue date Dec 26, 2000
- Tokyo Electron Ltd
- Noriyuki Anai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for removing coated film from peripheral portion of subst...
- Patent number 6,079,428
- Issue date Jun 27, 2000
- Tokyo Electron Limited
- Noriyuki Anai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for manufacturing a semiconductor for a liquid crystal di...
- Patent number D415776
- Issue date Oct 26, 1999
- Tokyo Electron Limited
- Noriyuki Anai
- D15 - Machines not elsewhere specified
Information Patent Grant
Apparatus for manufacturing a semiconductor for a liquid crystal di...
- Patent number D415184
- Issue date Oct 12, 1999
- Tokyo Electron Limited
- Noriyuki Anai
- D15 - Machines not elsewhere specified
Information Patent Grant
Coating method and apparatus for semiconductor process
- Patent number 5,919,520
- Issue date Jul 6, 1999
- Tokyo Electron Limited
- Kiyohisa Tateyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Washing apparatus, and washing method
- Patent number 5,887,604
- Issue date Mar 30, 1999
- Tokyo Electron Limited
- Shinya Murakami
- B08 - CLEANING
Information Patent Grant
Method for washing objects
- Patent number 5,782,990
- Issue date Jul 21, 1998
- Tokyo Electron Limited
- Shinya Murakami
- B08 - CLEANING
Information Patent Grant
Apparatus for coating resist on substrate
- Patent number 5,688,322
- Issue date Nov 18, 1997
- Tokyo Electron Limited
- Kimio Motoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hydrophobic treatment method involving delivery of a liquid process...
- Patent number 5,681,614
- Issue date Oct 28, 1997
- Tokyo Electron Limited
- Tsutae Omori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Washing apparatus, and washing method
- Patent number 5,671,764
- Issue date Sep 30, 1997
- Tokyo Electron Limited
- Shinya Murakami
- B08 - CLEANING
Information Patent Grant
Method for scrubbing and cleaning substrate
- Patent number 5,518,552
- Issue date May 21, 1996
- Tokyo Electron Limited
- Kouichi Tanoue
- G02 - OPTICS
Information Patent Grant
Hydrophobic processing apparatus including a liquid delivery system
- Patent number 5,505,781
- Issue date Apr 9, 1996
- Tokyo Electron Limited
- Tsutae Omori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Washing apparatus, and washing method
- Patent number 5,488,964
- Issue date Feb 6, 1996
- Tokyo Electron Limited
- Shinya Murakami
- B08 - CLEANING
Information Patent Grant
Device and method for scrubbing and cleaning substrate
- Patent number 5,345,639
- Issue date Sep 13, 1994
- Tokyo Electron Limited
- Kouichi Tanoue
- G02 - OPTICS
Information Patent Grant
Coating apparatus and method for applying a liquid to a semiconduct...
- Patent number 5,089,305
- Issue date Feb 18, 1992
- Tokyo Electron Limited
- Mitsuru Ushijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist process apparatus
- Patent number 5,061,144
- Issue date Oct 29, 1991
- Tokyo Electron Limited
- Masami Akimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 5,028,955
- Issue date Jul 2, 1991
- Tokyo Electron Limited
- Yasushi Hayashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating apparatus and method for applying a liquid to a semiconduct...
- Patent number 5,002,008
- Issue date Mar 26, 1991
- Tokyo Electron Limited
- Mitsuru Ushijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Substrate treating method
- Publication number 20020187423
- Publication date Dec 12, 2002
- HIDEYUKI TAKAMORI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COATING APPARATUS AND COATING METHOD
- Publication number 20020152954
- Publication date Oct 24, 2002
- HIDEYUKI TAKAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20020110640
- Publication date Aug 15, 2002
- KIYOHISA TATEYAMA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE TREATING METHOD
- Publication number 20010049070
- Publication date Dec 6, 2001
- HIDEYUKI TAKAMORI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Coating and developing method and apparatus therefor
- Publication number 20010041311
- Publication date Nov 15, 2001
- Shinichiro Araki
- G02 - OPTICS
Information Patent Application
Substrate process method and substrate process apparatus
- Publication number 20010031147
- Publication date Oct 18, 2001
- Hideyuki Takamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate process method and substrate process apparatus
- Publication number 20010026691
- Publication date Oct 4, 2001
- Hideyuki Takamori
- H01 - BASIC ELECTRIC ELEMENTS

Noriyuki Anai

Person

Patents Grantslast 30 patents

Coating method and apparatus for semiconductor process

Coating apparatus and coating method

Film forming apparatus

Substrate treating method

Substrate process method and substrate process apparatus

Coating and developing method

Coating and developing apparatus

Substrate process method and substrate process apparatus

Film forming method

Apparatus for removing coated film from peripheral portion of subst...

Apparatus for manufacturing a semiconductor for a liquid crystal di...

Apparatus for manufacturing a semiconductor for a liquid crystal di...

Coating method and apparatus for semiconductor process

Washing apparatus, and washing method

Method for washing objects

Apparatus for coating resist on substrate

Hydrophobic treatment method involving delivery of a liquid process...

Washing apparatus, and washing method

Method for scrubbing and cleaning substrate

Hydrophobic processing apparatus including a liquid delivery system

Washing apparatus, and washing method

Device and method for scrubbing and cleaning substrate

Coating apparatus and method for applying a liquid to a semiconduct...

Resist process apparatus

Exposure apparatus

Coating apparatus and method for applying a liquid to a semiconduct...

Patents Applicationslast 30 patents

Substrate treating method

COATING APPARATUS AND COATING METHOD

COATING METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS

SUBSTRATE TREATING METHOD

Coating and developing method and apparatus therefor

Substrate process method and substrate process apparatus

Substrate process method and substrate process apparatus