Claims
- 1. A method for scrubbing and cleaning a substrate comprising the steps of:
- carrying a substrate to rotatable scrubbing means;
- scrubbing both surfaces of the substrate by the rotatable scrubbing means with said substrate substantially horizontal while applying a cleaning solution onto said both surfaces when the substrate is being carried substantially in a horizontal direction and wherein the substrate is linearly reciprocated during scrubbing both surfaces to have both surfaces of the substrate scrubbed by said rotatable scrubbing means;
- rinsing the substrate by applying a rinsing solution or rinsing water to the substrate; and
- rotating the substrate to remove solution adhered from the substrate by centrifugal force so as to make the substrate dry.
- 2. The method according to claim 1, wherein rinsing the substrate includes pressurizing the rinsing solution or rinsing water to 10-20 Kg/cm.sup.2 and spraying the rinsing solution or rinsing water.
- 3. The method according to claim 1, wherein rinsing the substrate includes jetting pressurized water to the substrate after scrubbing both surfaces of the substrate.
- 4. The method according to claim 1, wherein rinsing the substrate includes spraying water, to which ultrasonic waves have been applied, to the substrate after scrubbing both surfaces of the substrate.
- 5. The method according to claim 1, wherein rinsing the substrate includes jetting pressurized water to the substrate while also spraying water, to which ultrasonic waves have been applied, to the substrate after scrubbing both surfaces of the substrate.
- 6. The method according to claim 1, wherein the cleaning solution is sprayed to the substrate through the rotatable scrubbing means to clean the substrate when the scrubbing means is left inoperative.
- 7. The method according to claim 1, wherein a rotatable brush having an axis perpendicular to the surface of the substrate is used as said rotatable scrubbing means in scrubbing both surfaces of the substrate, said brush revolving on its own axis and not being moved in a horizontal direction.
- 8. The method according to claim 1, wherein said substrate is rectangular having two short sides and is carried such that said two short sides of the substrate are substantially parallel with a carrying direction.
- 9. The method according to claim 8, wherein both of said short sides of the substrate are held by arm means when the substrate is carried.
- 10. The method according to claim 8, wherein both surfaces of the substrate are held by rotatable roller means when the substrate is carried.
Priority Claims (2)
Number |
Date |
Country |
Kind |
4-137160 |
May 1992 |
JPX |
|
4-287292 |
Oct 1992 |
JPX |
|
Parent Case Info
This is a division, of application Ser. No. 08/069,106, filed on May 28, 1993, now U.S. Pat. No. 5,345,639.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
3479222 |
David et al. |
Nov 1969 |
|
4109337 |
Hillman et al. |
Aug 1978 |
|
4178188 |
Dussault et al. |
Dec 1979 |
|
5092011 |
Gommori et al. |
Mar 1992 |
|
Foreign Referenced Citations (3)
Number |
Date |
Country |
57-130580 |
Aug 1982 |
JPX |
61-249582 |
Nov 1986 |
JPX |
3-29919 |
Feb 1991 |
JPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
69106 |
May 1993 |
|