Orest Bula

Person

Shelburne, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mask defect analysis system
- Patent number 7,492,940
- Issue date Feb 17, 2009
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect analysis system
- Patent number 7,492,941
- Issue date Feb 17, 2009
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect analysis system
- Patent number 7,257,247
- Issue date Aug 14, 2007
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interactive optical proximity correction design method
- Patent number 6,704,695
- Issue date Mar 9, 2004
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to control nested to isolated line printing
- Patent number 6,667,136
- Issue date Dec 23, 2003
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assist features for contact hole mask patterns
- Patent number 6,627,361
- Issue date Sep 30, 2003
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure for lithographic focus control features
- Patent number 6,577,406
- Issue date Jun 10, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for edge bias correction of topography-induced linewidth var...
- Patent number 6,539,321
- Issue date Mar 25, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to control nested to isolated line printing
- Patent number 6,458,493
- Issue date Oct 1, 2002
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical Proximity Correction Structures Having Decoupling Capacitors
- Patent number 6,429,469
- Issue date Aug 6, 2002
- International Business Machines Corporation
- Archibald J. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Auto correction of error checked simulated printed images
- Patent number 6,425,112
- Issue date Jul 23, 2002
- International Business Machines Corporation
- Orest Bula
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of etch bias proximity correction
- Patent number 6,395,438
- Issue date May 28, 2002
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for enhanced lithographic imaging
- Patent number 6,383,719
- Issue date May 7, 2002
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Error checking of simulated printed images with process window effe...
- Patent number 6,373,975
- Issue date Apr 16, 2002
- International Business Machines Corporation
- Orest Bula
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Micro adjustable illumination aperture
- Patent number 6,268,908
- Issue date Jul 31, 2001
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of modifying a microchip layout data set to generate a predi...
- Patent number 6,261,724
- Issue date Jul 17, 2001
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmission control mask utilized to reduce foreshortening effects
- Patent number 6,258,490
- Issue date Jul 10, 2001
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming sharp corners in a photoresist layer
- Patent number 6,238,850
- Issue date May 29, 2001
- International Business Machines Corp.
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Serif mask design methodology based on enhancing high spatial frequ...
- Patent number 6,214,494
- Issue date Apr 10, 2001
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Feedback method to repair phase shift masks
- Patent number 6,016,357
- Issue date Jan 18, 2000
- International Business Machines Corporation
- Timothy E. Neary
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for real time data error capture and compressi...
- Patent number 5,317,573
- Issue date May 31, 1994
- International Business Machines Corporation
- Orest Bula
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self calibrating timing circuit
- Patent number 5,093,584
- Issue date Mar 3, 1992
- International Business Machines Corporation
- Justin A. Woyke
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
MASK DEFECT ANALYSIS SYSTEM
- Publication number 20070248257
- Publication date Oct 25, 2007
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT ANALYSIS SYSTEM
- Publication number 20070237384
- Publication date Oct 11, 2007
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask defect analysis system
- Publication number 20030161525
- Publication date Aug 28, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EDGE BIAS CORRECTION OF TOPOGRAPHY-INDUCED LINEWIDTH VAR...
- Publication number 20030018443
- Publication date Jan 23, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Assist features for contact hole mask patterns
- Publication number 20030008216
- Publication date Jan 9, 2003
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to control nested to isolated line printing
- Publication number 20030008220
- Publication date Jan 9, 2003
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structure for lithographic focus control features
- Publication number 20020122187
- Publication date Sep 5, 2002
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO CONTROL NESTED TO ISOLATED LINE PRINTING
- Publication number 20010044053
- Publication date Nov 22, 2001
- OREST BULA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Mask defect analysis system

Mask defect analysis system

Mask defect analysis system

Interactive optical proximity correction design method

Method to control nested to isolated line printing

Assist features for contact hole mask patterns

Structure for lithographic focus control features

Method for edge bias correction of topography-induced linewidth var...

Method to control nested to isolated line printing

Optical Proximity Correction Structures Having Decoupling Capacitors

Auto correction of error checked simulated printed images

Method of etch bias proximity correction

Process for enhanced lithographic imaging

Error checking of simulated printed images with process window effe...

Micro adjustable illumination aperture

Method of modifying a microchip layout data set to generate a predi...

Transmission control mask utilized to reduce foreshortening effects

Method of forming sharp corners in a photoresist layer

Serif mask design methodology based on enhancing high spatial frequ...

Feedback method to repair phase shift masks

Apparatus and method for real time data error capture and compressi...

Self calibrating timing circuit

Patents Applicationslast 30 patents

MASK DEFECT ANALYSIS SYSTEM

MASK DEFECT ANALYSIS SYSTEM

Mask defect analysis system

METHOD FOR EDGE BIAS CORRECTION OF TOPOGRAPHY-INDUCED LINEWIDTH VAR...

Assist features for contact hole mask patterns

Method to control nested to isolated line printing

Structure for lithographic focus control features

METHOD TO CONTROL NESTED TO ISOLATED LINE PRINTING