Pei Liu

Person

Clifton Park, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming semiconductor material in trenches having differe...
- Patent number 10,714,376
- Issue date Jul 14, 2020
- GLOBALFOUNDRIES Inc.
- Chih-Chiang Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact structures
- Patent number 10,510,613
- Issue date Dec 17, 2019
- GLOBALFOUNDRIES Inc.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration scheme for gate height control and void free RMG fill
- Patent number 10,354,928
- Issue date Jul 16, 2019
- GLOBALFOUNDRIES Inc.
- Suraj Kumar Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gate contacts and method of fabrication thereof
- Patent number 10,347,541
- Issue date Jul 9, 2019
- GLOBALFOUNDRIES Inc.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, apparatus and system for self-aligned metal hard masks
- Patent number 10,340,142
- Issue date Jul 2, 2019
- GLOBALFOUNDRIES Inc.
- Jinsheng Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming of marking trenches in structure for multiple patterning li...
- Patent number 10,157,796
- Issue date Dec 18, 2018
- GLOBALFOUNDRIES Inc.
- Laertis Economikos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming field effect transistors (FETS) with gate cut is...
- Patent number 10,090,402
- Issue date Oct 2, 2018
- GLOBALFOUNDRIES Inc.
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration scheme for gate height control and void free RMG fill
- Patent number 10,056,303
- Issue date Aug 21, 2018
- GLOBALFOUNDRIES Inc.
- Suraj Kumar Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten gate and method for forming
- Patent number 10,014,180
- Issue date Jul 3, 2018
- GLOBALFOUNDRIES Inc.
- Neal A. Makela
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SILICON SUPER JUNCTION STRUCTURES FOR INCREASED VOLTAGE
- Publication number 20240282809
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Amirhasan NOURBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, APPARATUS, AND SYSTEM TO CONTROL GATE HEIGHT AND CAP THICK...
- Publication number 20200052106
- Publication date Feb 13, 2020
- GLOBALFOUNDRIES INC.
- Laertis Economikos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR MATERIAL IN TRENCHES HAVING DIFFERE...
- Publication number 20190393077
- Publication date Dec 26, 2019
- GLOBALFOUNDRIES INC.
- Chih-Chiang Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT STRUCTURES
- Publication number 20190229019
- Publication date Jul 25, 2019
- GLOBALFOUNDRIES INC.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STACK PROCESSES AND STRUCTURES
- Publication number 20190096679
- Publication date Mar 28, 2019
- GLOBALFOUNDRIES INC.
- Balaji Kannan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION SCHEME FOR GATE HEIGHT CONTROL AND VOID FREE RMG FILL
- Publication number 20180323113
- Publication date Nov 8, 2018
- GLOBALFOUNDRIES INC.
- Suraj Kumar PATIL
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method of forming semiconductor material in trenches having differe...

Contact structures

Integration scheme for gate height control and void free RMG fill

Active gate contacts and method of fabrication thereof

Methods, apparatus and system for self-aligned metal hard masks

Forming of marking trenches in structure for multiple patterning li...

Methods of forming field effect transistors (FETS) with gate cut is...

Integration scheme for gate height control and void free RMG fill

Tungsten gate and method for forming

Patents Applicationslast 30 patents

SILICON SUPER JUNCTION STRUCTURES FOR INCREASED VOLTAGE

METHODS, APPARATUS, AND SYSTEM TO CONTROL GATE HEIGHT AND CAP THICK...

METHOD OF FORMING SEMICONDUCTOR MATERIAL IN TRENCHES HAVING DIFFERE...

CONTACT STRUCTURES

GATE STACK PROCESSES AND STRUCTURES

INTEGRATION SCHEME FOR GATE HEIGHT CONTROL AND VOID FREE RMG FILL