Peter L. G. Ventzek

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing with radio frequency (RF) source and bias signal...
- Patent number 11,942,307
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast neutral generation for plasma processing
- Patent number 11,915,910
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband plasma processing systems and methods
- Patent number 11,830,709
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-phase pulsing systems and methods for plasma processing
- Patent number 11,817,295
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask deposition using direct current superimposed radio freque...
- Patent number 11,773,484
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 11,688,586
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic low temperature film growth processes
- Patent number 11,605,536
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Defect correction on metal resists
- Patent number 11,605,539
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dry etching compound materials
- Patent number 11,605,542
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching metal during processing of a semiconductor structure
- Patent number 11,557,487
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Roberto C. Longo Pazos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-localized and plasma uniformity control in a plasma processin...
- Patent number 11,551,909
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed capacitively coupled plasma processes
- Patent number 11,545,364
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic plasma etch process
- Patent number 11,527,413
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing systems and methods for chemical processing a sub...
- Patent number 11,521,834
- Issue date Dec 6, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantification of processing chamber species by electron energy sweep
- Patent number 11,430,643
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for focus ring thickness determinations and fee...
- Patent number 11,393,663
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatuses and methods for plasma processing
- Patent number 11,393,662
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Impedance matching apparatus and control method
- Patent number 11,348,761
- Issue date May 31, 2022
- Tokyo Electron Limited
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for anisotropic etch of silicon-based materials with select...
- Patent number 11,342,195
- Issue date May 24, 2022
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband plasma processing systems and methods
- Patent number 11,295,937
- Issue date Apr 5, 2022
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion angle detector
- Patent number 11,264,212
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and process for electron beam mediated plasma etch and de...
- Patent number 11,257,685
- Issue date Feb 22, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mode-switching plasma systems and methods of operating thereof
- Patent number 11,251,021
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid electron beam and RF plasma system for controlled content of...
- Patent number 11,205,562
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolayer film mediated precision material etch
- Patent number 11,205,576
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical source with contained plasma
- Patent number 11,201,035
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium hard mask process
- Patent number 11,183,398
- Issue date Nov 23, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband plasma processing systems and methods
- Patent number 11,170,981
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing methods using low frequency bias pulses
- Patent number 11,158,516
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatuses having a dielectric injector
- Patent number 11,152,194
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing with Magnetic Ring X Point
- Publication number 20240038506
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing with Broadband RF Waveforms
- Publication number 20240021410
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK DEPOSITION USING DIRECT CURRENT SUPERIMPOSED RADIO FREQUE...
- Publication number 20230399739
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Equipment and Method for Improved Edge Uniformity of Plasma Process...
- Publication number 20230402255
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Plasma Process
- Publication number 20230386789
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Charles Schlechte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD
- Publication number 20230377853
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING USING MULTIPHASE MULTIFREQUENCY POWER PULSES AND VAR...
- Publication number 20230377895
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Uniformity Control
- Publication number 20230377849
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Edge Control During Plasma Processing
- Publication number 20230360889
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
- Publication number 20230341781
- Publication date Oct 26, 2023
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Plasma Processing
- Publication number 20230230814
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20230187214
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cyclic Low Temperature Film Growth Processes
- Publication number 20230154745
- Publication date May 18, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing with Radio Frequency (RF) Source and Bias Signal...
- Publication number 20230117812
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed Capacitively Coupled Plasma Processes
- Publication number 20230081352
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus with Tunable Electrical Characteristic
- Publication number 20220392749
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METAL DURING PROCESSING OF A SEMICONDUCTOR STRUCTURE
- Publication number 20220392773
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Roberto C. Longo Pazos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS SURFACE MONITORING
- Publication number 20220380896
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems And Methods For Real-Time Pulse Measurement And Pulse Timin...
- Publication number 20220367149
- Publication date Nov 17, 2022
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A FINFET STRUCTURE
- Publication number 20220344162
- Publication date Oct 27, 2022
- TOKYO ELECTRON LIMITED
- Yun HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST NEUTRAL GENERATION FOR PLASMA PROCESSING
- Publication number 20220310357
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC PLASMA ETCH PROCESS
- Publication number 20220246438
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Etch Stop Layer with Improved Etch Stop Capability
- Publication number 20220246747
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect Correction on Metal Resists
- Publication number 20220181153
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Quantification of Processing Chamber Species by Electron Energy Sweep
- Publication number 20220102123
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC LOW TEMPERATURE FILM GROWTH PROCESSES
- Publication number 20220093395
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Impedance Matching Apparatus and Control Method
- Publication number 20220076923
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Systems and Methods for Chemical Processing a Sub...
- Publication number 20220068601
- Publication date Mar 3, 2022
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Cluster Assisted Plasma Processing
- Publication number 20220068607
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED CAPACITIVELY COUPLED PLASMA PROCESSES
- Publication number 20220059358
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS

Peter L. G. Ventzek

Person

Patents Grantslast 30 patents

Plasma processing with radio frequency (RF) source and bias signal...

Fast neutral generation for plasma processing

Broadband plasma processing systems and methods

Three-phase pulsing systems and methods for plasma processing

Hard mask deposition using direct current superimposed radio freque...

Method and apparatus for plasma processing

Cyclic low temperature film growth processes

Defect correction on metal resists

Method for dry etching compound materials

Etching metal during processing of a semiconductor structure

Ultra-localized and plasma uniformity control in a plasma processin...

Pulsed capacitively coupled plasma processes

Cyclic plasma etch process

Plasma processing systems and methods for chemical processing a sub...

Quantification of processing chamber species by electron energy sweep

Methods and systems for focus ring thickness determinations and fee...

Apparatuses and methods for plasma processing

Impedance matching apparatus and control method

Methods for anisotropic etch of silicon-based materials with select...

Broadband plasma processing systems and methods

Ion angle detector

Apparatus and process for electron beam mediated plasma etch and de...

Mode-switching plasma systems and methods of operating thereof

Hybrid electron beam and RF plasma system for controlled content of...

Monolayer film mediated precision material etch

Radical source with contained plasma

Ruthenium hard mask process

Broadband plasma processing systems and methods

Plasma processing methods using low frequency bias pulses

Plasma processing apparatuses having a dielectric injector

Patents Applicationslast 30 patents

Plasma Processing with Magnetic Ring X Point

Plasma Processing with Broadband RF Waveforms

HARD MASK DEPOSITION USING DIRECT CURRENT SUPERIMPOSED RADIO FREQUE...

Equipment and Method for Improved Edge Uniformity of Plasma Process...

Systems and Methods for Plasma Process

PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD

PLASMA ETCHING USING MULTIPHASE MULTIFREQUENCY POWER PULSES AND VAR...

Method of Uniformity Control

Apparatus for Edge Control During Plasma Processing

Methods for Extreme Ultraviolet (EUV) Resist Patterning Development

Method and Apparatus for Plasma Processing

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

Cyclic Low Temperature Film Growth Processes

Plasma Processing with Radio Frequency (RF) Source and Bias Signal...

Pulsed Capacitively Coupled Plasma Processes

Plasma Processing Apparatus with Tunable Electrical Characteristic

ETCHING METAL DURING PROCESSING OF A SEMICONDUCTOR STRUCTURE

SEMICONDUCTOR PROCESS SURFACE MONITORING

Systems And Methods For Real-Time Pulse Measurement And Pulse Timin...

METHOD OF FORMING A FINFET STRUCTURE

FAST NEUTRAL GENERATION FOR PLASMA PROCESSING

CYCLIC PLASMA ETCH PROCESS

Contact Etch Stop Layer with Improved Etch Stop Capability

Defect Correction on Metal Resists

Quantification of Processing Chamber Species by Electron Energy Sweep

CYCLIC LOW TEMPERATURE FILM GROWTH PROCESSES

Impedance Matching Apparatus and Control Method

Plasma Processing Systems and Methods for Chemical Processing a Sub...

Gas Cluster Assisted Plasma Processing

PULSED CAPACITIVELY COUPLED PLASMA PROCESSES