Rajinder DHINDSA

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 12,094,752
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback loop for controlling a pulsed voltage waveform
- Patent number 12,057,292
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber and chamber component cleaning methods
- Patent number 11,984,306
- Issue date May 14, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing using pulsed-voltage and radio-frequency power
- Patent number 11,848,176
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature and bias control of edge ring
- Patent number 11,810,768
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,791,140
- Issue date Oct 17, 2023
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 11,776,789
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,728,124
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback loop for controlling a pulsed voltage waveform
- Patent number 11,699,572
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed plasma chamber in dual chamber configuration
- Patent number 11,670,486
- Issue date Jun 6, 2023
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Condition selectable backside gas
- Patent number 11,666,952
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Stephen D. Prouty
- B08 - CLEANING
Information Patent Grant
Apparatus and method for controlling edge ring variation
- Patent number 11,668,553
- Issue date Jun 6, 2023
- Applied Materials Inc.
- Sathyendra Ghantasala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi zone gas injection upper electrode system
- Patent number 11,594,400
- Issue date Feb 28, 2023
- Lam Research Corporation
- Ryan Bise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sheath and temperature control of a process kit in a substrate proc...
- Patent number 11,551,916
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ deposition process
- Patent number 11,521,849
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Sang Wook Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cleaning process for substrate etching
- Patent number 11,521,838
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High voltage filter assembly
- Patent number 11,508,554
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Anurag Kumar Mishra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of enhancing etching selectivity using a pulsed plasma
- Patent number 11,495,470
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Hailong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,482,402
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 11,462,388
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed-voltage hardware assembly for use in a plasma processing system
- Patent number 11,462,389
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 11,393,710
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,342,166
- Issue date May 24, 2022
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generator
- Patent number 11,284,500
- Issue date Mar 22, 2022
- APPLIED MATERIALS, INC.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature and bias control of edge ring
- Patent number 11,232,933
- Issue date Jan 25, 2022
- APPLIED MATERIALS, INC.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Peripheral RF feed and symmetric RF return for symmetric RF delivery
- Patent number 11,127,571
- Issue date Sep 21, 2021
- Lam Research Corporation
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,069,504
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Universal process kit
- Patent number 11,049,760
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Olivier Joubert
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355586
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355587
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS
- Publication number 20240047195
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- AKHIL MEHROTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20240030002
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE AND BIAS CONTROL OF EDGE RING
- Publication number 20230360892
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- James ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Ion Energy Distribution Functions (IEDF)
- Publication number 20230352264
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20230326717
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION
- Publication number 20230317412
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITION SELECTABLE BACKSIDE GAS
- Publication number 20230264238
- Publication date Aug 24, 2023
- Applied Materials, Inc.
- Stephen D. Prouty
- B08 - CLEANING
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING GAS CROSS-FLOW AND PERIPH...
- Publication number 20230162950
- Publication date May 25, 2023
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBERS CONFIGURED FOR TUNABLE SUBSTRATE AND EDG...
- Publication number 20230132339
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Rajinder DHINDSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBERS CONFIGURED FOR TUNABLE SUBSTRATE AND EDG...
- Publication number 20230130986
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Rajinder DHINDSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBERS CONFIGURED FOR TUNABLE SUBSTRATE AND EDG...
- Publication number 20230130829
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Rajinder DHINDSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20230086917
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20230030927
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER AND CHAMBER COMPONENT CLEANING METHODS
- Publication number 20220399194
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Rajinder DHINDSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER AND CHAMBER COMPONENT CLEANING METHODS
- Publication number 20220399185
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Rajinder DHINDSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO REDUCE FEATURE CHARGING IN PLASMA PROCESSIN...
- Publication number 20220399183
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO REDUCE FEATURE CHARGING IN PLASMA PROCESSIN...
- Publication number 20220399186
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENHANCING ETCHING SELECTIVITY USING A PULSED PLASMA
- Publication number 20220336222
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Hailong ZHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20220319904
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN MECHANISM
- Publication number 20220293452
- Publication date Sep 15, 2022
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Confinement Ring for Use in a Plasma Processing System
- Publication number 20220254614
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED-VOLTAGE HARDWARE ASSEMBLY FOR USE IN A PLASMA PROCESSING SYSTEM
- Publication number 20220037120
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20220037119
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER
- Publication number 20220037121
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF FREQUENCY CONTROL AND GROUND PATH RETURN IN SEMICONDUCTOR PROCES...
- Publication number 20210391146
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Timothy Joseph FRANKLIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20210343496
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE AND BIAS CONTROL OF EDGE RING
- Publication number 20210313156
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- James ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHEATH AND TEMPERATURE CONTROL OF A PROCESS KIT IN A SUBSTRATE PROC...
- Publication number 20210296098
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS

Rajinder DHINDSA

Person

Patents Grantslast 30 patents

Plasma processing chambers configured for tunable substrate and edg...

Wafer edge ring lifting solution

Feedback loop for controlling a pulsed voltage waveform

Sensors and system for in-situ edge ring erosion monitor

Plasma chamber and chamber component cleaning methods

Plasma processing using pulsed-voltage and radio-frequency power

Temperature and bias control of edge ring

Confinement ring for use in a plasma processing system

Plasma processing assembly using pulsed-voltage and radio-frequency...

Creating ion energy distribution functions (IEDF)

Feedback loop for controlling a pulsed voltage waveform

Pulsed plasma chamber in dual chamber configuration

Condition selectable backside gas

Apparatus and method for controlling edge ring variation

Multi zone gas injection upper electrode system

Sheath and temperature control of a process kit in a substrate proc...

In-situ deposition process

Integrated cleaning process for substrate etching

High voltage filter assembly

Method of enhancing etching selectivity using a pulsed plasma

Methods and apparatus for processing a substrate

Plasma processing assembly using pulsed-voltage and radio-frequency...

Pulsed-voltage hardware assembly for use in a plasma processing system

Wafer edge ring lifting solution

Confinement ring for use in a plasma processing system

Method of controlling ion energy distribution using a pulse generator

Temperature and bias control of edge ring

Peripheral RF feed and symmetric RF return for symmetric RF delivery

Creating ion energy distribution functions (IEDF)

Universal process kit

Patents Applicationslast 30 patents

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

TEMPERATURE AND BIAS CONTROL OF EDGE RING

Creating Ion Energy Distribution Functions (IEDF)

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION

CONDITION SELECTABLE BACKSIDE GAS

PLASMA CHAMBER WITH A MULTIPHASE ROTATING GAS CROSS-FLOW AND PERIPH...

PLASMA PROCESSING CHAMBERS CONFIGURED FOR TUNABLE SUBSTRATE AND EDG...

PLASMA PROCESSING CHAMBERS CONFIGURED FOR TUNABLE SUBSTRATE AND EDG...

PLASMA PROCESSING CHAMBERS CONFIGURED FOR TUNABLE SUBSTRATE AND EDG...

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

PLASMA CHAMBER AND CHAMBER COMPONENT CLEANING METHODS

PLASMA CHAMBER AND CHAMBER COMPONENT CLEANING METHODS

METHOD AND APPARATUS TO REDUCE FEATURE CHARGING IN PLASMA PROCESSIN...

METHOD AND APPARATUS TO REDUCE FEATURE CHARGING IN PLASMA PROCESSIN...

METHOD OF ENHANCING ETCHING SELECTIVITY USING A PULSED PLASMA

WAFER EDGE RING LIFTING SOLUTION

LIFT PIN MECHANISM

Confinement Ring for Use in a Plasma Processing System

PULSED-VOLTAGE HARDWARE ASSEMBLY FOR USE IN A PLASMA PROCESSING SYSTEM

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

PLASMA PROCESSING USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER

RF FREQUENCY CONTROL AND GROUND PATH RETURN IN SEMICONDUCTOR PROCES...

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

TEMPERATURE AND BIAS CONTROL OF EDGE RING

SHEATH AND TEMPERATURE CONTROL OF A PROCESS KIT IN A SUBSTRATE PROC...