Ramakanth Alapati

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Simplified pitch doubling process flow
- Patent number 9,184,159
- Issue date Nov 10, 2015
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano-crystal etch process
- Patent number 8,809,198
- Issue date Aug 19, 2014
- Micron Technology, Inc.
- Ramakanth Alapati
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of forming semiconductor constructions
- Patent number 8,598,043
- Issue date Dec 3, 2013
- Micron Technology Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit having pitch reduced patterns relative to photoi...
- Patent number 8,598,632
- Issue date Dec 3, 2013
- Round Rock Research LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming high density structures and low density structur...
- Patent number 8,431,456
- Issue date Apr 30, 2013
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 8,338,959
- Issue date Dec 25, 2012
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,207,576
- Issue date Jun 26, 2012
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor constructions
- Patent number 8,207,570
- Issue date Jun 26, 2012
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication processes for forming dual depth trenches using a dry e...
- Patent number 8,143,167
- Issue date Mar 27, 2012
- Micron Technology, Inc.
- Xiaolong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,119,535
- Issue date Feb 21, 2012
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 8,048,812
- Issue date Nov 1, 2011
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 8,030,217
- Issue date Oct 4, 2011
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 7,902,074
- Issue date Mar 8, 2011
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structures for flash memory and methods of making same
- Patent number 7,867,843
- Issue date Jan 11, 2011
- Intel Corporation
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor constructions
- Patent number 7,799,694
- Issue date Sep 21, 2010
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming multiple lines
- Patent number 7,790,360
- Issue date Sep 7, 2010
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insitu formation of inverse floating gate poly structures
- Patent number 7,737,031
- Issue date Jun 15, 2010
- Intel Corporation
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 7,732,343
- Issue date Jun 8, 2010
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 7,718,540
- Issue date May 18, 2010
- Round Rock Research, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano-crystal etch process
- Patent number 7,659,210
- Issue date Feb 9, 2010
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduced patterns relative to photolithography features
- Patent number 7,651,951
- Issue date Jan 26, 2010
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20130105937
- Publication date May 2, 2013
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuit Having Pitch Reduced Patterns Relative To Photol...
- Publication number 20120256309
- Publication date Oct 11, 2012
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming High Density Structures and Low Density Structur...
- Publication number 20120238077
- Publication date Sep 20, 2012
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20110316114
- Publication date Dec 29, 2011
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Semiconductor Constructions
- Publication number 20110008970
- Publication date Jan 13, 2011
- Micron Technology Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Constructions
- Publication number 20100295114
- Publication date Nov 25, 2010
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20100216307
- Publication date Aug 26, 2010
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20100210111
- Publication date Aug 19, 2010
- ROUND ROCK RESEARCH, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANO-CRYSTAL ETCH PROCESS
- Publication number 20100105211
- Publication date Apr 29, 2010
- Ramakanth Alapati
- B82 - NANO-TECHNOLOGY
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20100092891
- Publication date Apr 15, 2010
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication processes for forming dual depth trenches using a dry e...
- Publication number 20100062580
- Publication date Mar 11, 2010
- Micron Technology, Inc.
- Xiaolong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSITU FORMATION OF INVERSE FLOATING GATE POLY STRUCTURES
- Publication number 20090035905
- Publication date Feb 5, 2009
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLATINUM NANODET ETCH PROCESS
- Publication number 20080286975
- Publication date Nov 20, 2008
- Ramakanth Alapati
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor constructions, methods of forming multiple lines, and...
- Publication number 20080220600
- Publication date Sep 11, 2008
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURES FOR FLASH MEMORY AND METHODS OF MAKING SAME
- Publication number 20080149987
- Publication date Jun 26, 2008
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual depth shallow trench isolation and methods to form same
- Publication number 20070246795
- Publication date Oct 25, 2007
- Micron Technology, Inc.
- Xiaolong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Simplified pitch doubling process flow
- Publication number 20070238308
- Publication date Oct 11, 2007
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming semiconductor constructions
- Publication number 20070238295
- Publication date Oct 11, 2007
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20070238299
- Publication date Oct 11, 2007
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20070161251
- Publication date Jul 12, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20070138526
- Publication date Jun 21, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES
- Publication number 20070128856
- Publication date Jun 7, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch reduced patterns relative to photolithography features
- Publication number 20060211260
- Publication date Sep 21, 2006
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS

Ramakanth Alapati

Person

Patents Grantslast 30 patents

Simplified pitch doubling process flow

Nano-crystal etch process

Methods of forming semiconductor constructions

Integrated circuit having pitch reduced patterns relative to photoi...

Methods of forming high density structures and low density structur...

Simplified pitch doubling process flow

Pitch reduced patterns relative to photolithography features

Semiconductor constructions

Fabrication processes for forming dual depth trenches using a dry e...

Pitch reduced patterns relative to photolithography features

Pitch reduced patterns relative to photolithography features

Simplified pitch doubling process flow

Simplified pitch doubling process flow

Gate structures for flash memory and methods of making same

Methods of forming semiconductor constructions

Methods of forming multiple lines

Insitu formation of inverse floating gate poly structures

Simplified pitch doubling process flow

Pitch reduced patterns relative to photolithography features

Nano-crystal etch process

Pitch reduced patterns relative to photolithography features

Patents Applicationslast 30 patents

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

Integrated Circuit Having Pitch Reduced Patterns Relative To Photol...

Methods of Forming High Density Structures and Low Density Structur...

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

Methods of Forming Semiconductor Constructions

Semiconductor Constructions

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

NANO-CRYSTAL ETCH PROCESS

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

Fabrication processes for forming dual depth trenches using a dry e...

INSITU FORMATION OF INVERSE FLOATING GATE POLY STRUCTURES

PLATINUM NANODET ETCH PROCESS

Semiconductor constructions, methods of forming multiple lines, and...

GATE STRUCTURES FOR FLASH MEMORY AND METHODS OF MAKING SAME

Dual depth shallow trench isolation and methods to form same

Simplified pitch doubling process flow

Methods of forming semiconductor constructions

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES

Pitch reduced patterns relative to photolithography features