Ravi Jallepally

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gas distribution ceramic heater for deposition chamber
- Patent number 12,016,092
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Pingyan Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 11,955,319
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-temperature plasma pre-clean for selective gap fill
- Patent number 11,955,381
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Yi Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery for tungsten-containing layer
- Patent number 11,939,668
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Zubin Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shadow ring lift pin
- Patent number D1009817
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Zubin Huang
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Shadow ring lift assembly
- Patent number D997894
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Zubin Huang
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Shadow ring lift plate
- Patent number D997893
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Zubin Huang
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Dual plasma pre-clean for selective gap fill
- Patent number 11,721,542
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Yi Xu
- B08 - CLEANING
Information Patent Grant
High temperature dual chamber showerhead
- Patent number 11,555,244
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Pingyan Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate position calibration for substrate supports in substrate...
- Patent number 11,201,078
- Issue date Dec 14, 2021
- Applied Materials, Inc.
- Tomoharu Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lift pin assembly
- Patent number 10,892,180
- Issue date Jan 12, 2021
- Applied Materials, Inc.
- Bonnie T. Chia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for providing a uniform flow of gas
- Patent number 10,519,546
- Issue date Dec 31, 2019
- Applied Materials, Inc.
- Ravi Jallepally
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for rapidly cooling a substrate
- Patent number 10,312,116
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Jallepally Ravi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target retaining apparatus
- Patent number 10,199,204
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Srinivasa Yedla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for providing a uniform flow of gas
- Patent number 10,167,553
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with improved RF return
- Patent number 10,134,615
- Issue date Nov 20, 2018
- Applied Materials, Inc.
- Aravind Miyar Kamath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with multiple heating zones
- Patent number 9,888,528
- Issue date Feb 6, 2018
- Applied Materials, Inc.
- Tomoharu Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for rapidly cooling a substrate
- Patent number 9,779,971
- Issue date Oct 3, 2017
- Applied Materials, Inc.
- Jallepally Ravi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature uniformity measurement during thermal processing
- Patent number 8,109,669
- Issue date Feb 7, 2012
- Applied Materials, Inc.
- Wolfgang Aderhold
- G01 - MEASURING TESTING
Information Patent Grant
Atomic layer deposition processes for non-volatile memory devices
- Patent number 8,043,907
- Issue date Oct 25, 2011
- Applied Materials, Inc.
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber components with increased pyrometry visibility
- Patent number 7,921,803
- Issue date Apr 12, 2011
- Applied Materials, Inc.
- Joseph Yudovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition processes for non-volatile memory devices
- Patent number 7,659,158
- Issue date Feb 9, 2010
- Applied Materials, Inc.
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring and calibrating temperature in semiconductor...
- Patent number 7,572,052
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Jallepally Ravi
- G01 - MEASURING TESTING
Information Patent Grant
Lamp array for thermal processing exhibiting improved radial unifor...
- Patent number 7,509,035
- Issue date Mar 24, 2009
- Applied Materials, Inc.
- Joseph M. Ranish
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Tailored temperature uniformity
- Patent number 7,127,367
- Issue date Oct 24, 2006
- Applied Materials, Inc.
- Balasubramanian Ramachandran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advances in spike anneal processes for ultra shallow junctions
- Patent number 6,897,131
- Issue date May 24, 2005
- Applied Materials, Inc.
- Balasubramanian Ramachandran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally matched support ring for substrate processing chamber
- Patent number 6,888,104
- Issue date May 3, 2005
- Applied Materials, Inc.
- Joseph M. Ranish
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus and method for fast-cycle atomic layer deposition
- Patent number 6,773,507
- Issue date Aug 10, 2004
- Applied Materials, Inc.
- Ravi Jallepally
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process conditions and precursors for atomic layer deposition (ALD)...
- Patent number 6,620,670
- Issue date Sep 16, 2003
- Applied Materials, Inc.
- Kevin Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon and oxygen ion co-implanation for metallic gettering in epi...
- Patent number 6,569,749
- Issue date May 27, 2003
- SEH America, Inc.
- Witawat Wijaranakula
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOW STRESS TUNGSTEN LAYER DEPOSITION
- Publication number 20240266215
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Xi CEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Chamber With Multiple Plasma Units
- Publication number 20240249918
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fluorinated Aluminum Coated Component for a Substrate Processing Ap...
- Publication number 20240247376
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Douglas LONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY FOR TUNGSTEN-CONTAINING LAYER
- Publication number 20240229230
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zubin HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED PVD TUNGSTEN LINER AND SEAMLESS CVD TUNGSTEN FILL
- Publication number 20240087955
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Yi XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Purge Ring for Reduced Substrate Backside Deposition
- Publication number 20240018648
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- Geraldine VASQUEZ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDWARE TO UNIFORMLY DISTRIBUTE ACTIVE SPECIES FOR SEMICONDUCTOR F...
- Publication number 20230374660
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Harpreet SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS TO PROMOTE WAFER EDGE TEMPERATURE UNIFORMITY
- Publication number 20230357929
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Zubin HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY FOR TUNGSTEN-CONTAINING LAYER
- Publication number 20230340662
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Zubin HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BOTTOM COVER PLATE TO REDUCE WAFER PLANAR NONUNIFORMITY
- Publication number 20230130756
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Zubin HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHADOW RING LIFT TO IMPROVE WAFER EDGE PERFORMANCE
- Publication number 20230002894
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Zubin HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing Chamber With Multiple Plasma Units
- Publication number 20220319813
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL
- Publication number 20220319837
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Yi Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITION CALIBRATION FOR SUBSTRATE SUPPORTS IN SUBSTRATE...
- Publication number 20220099426
- Publication date Mar 31, 2022
- Tomoharu MATSUSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-CHANNEL SHOWERHEAD DESIGN AND METHODS IN MANUFACTURING
- Publication number 20220010431
- Publication date Jan 13, 2022
- Applied Materials, Inc.
- Kazuya DAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-TEMPERATURE PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL
- Publication number 20210398850
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Yi Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION CERAMIC HEATER FOR DEPOSITION CHAMBER
- Publication number 20210176831
- Publication date Jun 10, 2021
- Applied Materials, Inc.
- Pingyan LEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL
- Publication number 20210159070
- Publication date May 27, 2021
- Applied Materials, Inc.
- Yi Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Chamber With Multiple Plasma Units
- Publication number 20210159052
- Publication date May 27, 2021
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE DUAL CHAMBER SHOWERHEAD
- Publication number 20210130956
- Publication date May 6, 2021
- Applied Materials, Inc.
- Pingyan LEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR DUAL CHANNEL SHOWERHEADS
- Publication number 20210032753
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Jallepally RAVI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus And Method For Providing A Uniform Flow Of Gas
- Publication number 20190078205
- Publication date Mar 14, 2019
- Applied Materials, Inc.
- Ravi Jallepally
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE POSITION CALIBRATION FOR SUBSTRATE SUPPORTS IN SUBSTRATE...
- Publication number 20180233396
- Publication date Aug 16, 2018
- TOMOHARU MATSUSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual PVD Chamber And Hybrid PVD-CVD Chambers
- Publication number 20180197760
- Publication date Jul 12, 2018
- Applied Materials, Inc.
- Deepak Jadhav
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR RAPIDLY COOLING A SUBSTRATE
- Publication number 20180025924
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Jallepally Ravi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Method For Providing A Uniform Flow Of Gas
- Publication number 20170283947
- Publication date Oct 5, 2017
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED RF RETURN
- Publication number 20160240426
- Publication date Aug 18, 2016
- Applied Materials, Inc.
- ARAVIND MIYAR KAMATH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH MULTIPLE HEATING ZONES
- Publication number 20160192444
- Publication date Jun 30, 2016
- Applied Materials, Inc.
- TOMOHARU MATSUSHITA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE SUPPORT WITH MORE UNIFORM EDGE PURGE
- Publication number 20160002778
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- JALLEPALLY RAVI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIFT PIN ASSEMBLY
- Publication number 20150348823
- Publication date Dec 3, 2015
- Applied Materials, Inc.
- BONNIE T. CHIA
- H01 - BASIC ELECTRIC ELEMENTS

Ravi Jallepally

Person

Patents Grantslast 30 patents

Gas distribution ceramic heater for deposition chamber

Processing chamber with multiple plasma units

Low-temperature plasma pre-clean for selective gap fill

Gas delivery for tungsten-containing layer

Shadow ring lift pin

Shadow ring lift assembly

Shadow ring lift plate

Dual plasma pre-clean for selective gap fill

High temperature dual chamber showerhead

Substrate position calibration for substrate supports in substrate...

Lift pin assembly

Apparatus and method for providing a uniform flow of gas

Methods and apparatus for rapidly cooling a substrate

Target retaining apparatus

Apparatus and method for providing a uniform flow of gas

Substrate support with improved RF return

Substrate support with multiple heating zones

Methods and apparatus for rapidly cooling a substrate

Temperature uniformity measurement during thermal processing

Atomic layer deposition processes for non-volatile memory devices

Chamber components with increased pyrometry visibility

Atomic layer deposition processes for non-volatile memory devices

Method for monitoring and calibrating temperature in semiconductor...

Lamp array for thermal processing exhibiting improved radial unifor...

Tailored temperature uniformity

Advances in spike anneal processes for ultra shallow junctions

Thermally matched support ring for substrate processing chamber

Apparatus and method for fast-cycle atomic layer deposition

Process conditions and precursors for atomic layer deposition (ALD)...

Silicon and oxygen ion co-implanation for metallic gettering in epi...

Patents Applicationslast 30 patents

LOW STRESS TUNGSTEN LAYER DEPOSITION

Processing Chamber With Multiple Plasma Units

Fluorinated Aluminum Coated Component for a Substrate Processing Ap...

GAS DELIVERY FOR TUNGSTEN-CONTAINING LAYER

INTEGRATED PVD TUNGSTEN LINER AND SEAMLESS CVD TUNGSTEN FILL

Purge Ring for Reduced Substrate Backside Deposition

HARDWARE TO UNIFORMLY DISTRIBUTE ACTIVE SPECIES FOR SEMICONDUCTOR F...

APPARATUS AND METHODS TO PROMOTE WAFER EDGE TEMPERATURE UNIFORMITY

GAS DELIVERY FOR TUNGSTEN-CONTAINING LAYER

BOTTOM COVER PLATE TO REDUCE WAFER PLANAR NONUNIFORMITY

SHADOW RING LIFT TO IMPROVE WAFER EDGE PERFORMANCE

Processing Chamber With Multiple Plasma Units

DUAL PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL

SUBSTRATE POSITION CALIBRATION FOR SUBSTRATE SUPPORTS IN SUBSTRATE...

MULTIPLE-CHANNEL SHOWERHEAD DESIGN AND METHODS IN MANUFACTURING

LOW-TEMPERATURE PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL

GAS DISTRIBUTION CERAMIC HEATER FOR DEPOSITION CHAMBER

DUAL PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL

Processing Chamber With Multiple Plasma Units

HIGH TEMPERATURE DUAL CHAMBER SHOWERHEAD

METHODS AND APPARATUS FOR DUAL CHANNEL SHOWERHEADS

Apparatus And Method For Providing A Uniform Flow Of Gas

SUBSTRATE POSITION CALIBRATION FOR SUBSTRATE SUPPORTS IN SUBSTRATE...

Dual PVD Chamber And Hybrid PVD-CVD Chambers

METHODS AND APPARATUS FOR RAPIDLY COOLING A SUBSTRATE

Apparatus And Method For Providing A Uniform Flow Of Gas

SUBSTRATE SUPPORT WITH IMPROVED RF RETURN

SUBSTRATE SUPPORT WITH MULTIPLE HEATING ZONES

SUBSTRATE SUPPORT WITH MORE UNIFORM EDGE PURGE

LIFT PIN ASSEMBLY