Rhett B. Jucha

Person

Celeste, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low particulate reliability enhanced remote microwave plasma discha...
- Patent number 5,262,610
- Issue date Nov 16, 1993
- The United States of America as represented by the Air Force
- Steve S. Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method using both a remotely generated plasma and an in-...
- Patent number 5,248,636
- Issue date Sep 28, 1993
- Texas Instruments Incorporated
- Cecil J. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing apparatus having independently controllable energy...
- Patent number 5,138,973
- Issue date Aug 18, 1992
- Texas Instruments Incorporated
- Cecil J. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching tungsten
- Patent number 4,997,520
- Issue date Mar 5, 1991
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching semiconductor materials using a remote plasma ge...
- Patent number 4,988,644
- Issue date Jan 29, 1991
- Texas Instruments Incorporated
- Rhett B. Jucha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of etching refractory metals
- Patent number 4,923,562
- Issue date May 8, 1990
- Texas Instruments Incorporated
- Rhett B. Jucha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching tungsten
- Patent number 4,915,777
- Issue date Apr 10, 1990
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and method
- Patent number 4,911,103
- Issue date Mar 27, 1990
- Texas Instruments Incorporated
- Cecil J. Davis
- C30 - CRYSTAL GROWTH
Information Patent Grant
Isolation substrate ring for plasma reactor
- Patent number 4,891,087
- Issue date Jan 2, 1990
- Texas Instruments Incorporated
- Cecil J. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and method
- Patent number 4,891,488
- Issue date Jan 2, 1990
- Texas Instruments Incorporated
- Cecil J. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and method
- Patent number 4,886,570
- Issue date Dec 12, 1989
- Texas Instruments Incorporated
- Cecil J. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching titanium nitride local interconnects
- Patent number 4,878,994
- Issue date Nov 7, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etching of tungsten by remote and in situ plasma generation
- Patent number 4,874,723
- Issue date Oct 17, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etch of polysilicon film
- Patent number 4,867,841
- Issue date Sep 19, 1989
- Texas Instruments Incorporated
- Lee M. Loewenstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching tungsten
- Patent number 4,863,558
- Issue date Sep 5, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching aluminum film doped with copper
- Patent number 4,855,016
- Issue date Aug 8, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching tungsten
- Patent number 4,849,067
- Issue date Jul 18, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma-assisted etching
- Patent number 4,849,068
- Issue date Jul 18, 1989
- Texas Instruments Incorporated
- Cecil J. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching tungsten
- Patent number 4,842,687
- Issue date Jun 27, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for etch of tungsten
- Patent number 4,842,676
- Issue date Jun 27, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing apparatus and method
- Patent number 4,842,686
- Issue date Jun 27, 1989
- Texas Instruments Incorporated
- Cecil J. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for plasma etching tungsten
- Patent number 4,838,990
- Issue date Jun 13, 1989
- Texas Instruments Incorporated
- Rhett B. Jucha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching films of mercury-cadmium-telluride and zinc sulfid
- Patent number 4,838,984
- Issue date Jun 13, 1989
- Texas Instruments Incorporated
- Joseph D. Luttmer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching an aluminum film doped with silicon
- Patent number 4,828,649
- Issue date May 9, 1989
- Texas Instruments Incorporated
- Cecil J. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and method
- Patent number 4,822,450
- Issue date Apr 18, 1989
- Texas Instruments Incorporated
- Cecil J. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleanup processing chamber and vacuum process module
- Patent number 4,820,377
- Issue date Apr 11, 1989
- Texas Instruments Incorporated
- Cecil J. Davis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contact etch method
- Patent number 4,758,305
- Issue date Jul 19, 1988
- Texas Instruments Incorporated
- Thomas D. Bonifield
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma assisted etching
- Patent number 4,685,999
- Issue date Aug 11, 1987
- Texas Instruments Incorporated
- Cecil J. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated single slice cassette load lock plasma reactor
- Patent number 4,659,413
- Issue date Apr 21, 1987
- Texas Instruments Incorporated
- Cecil J. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-step plasma process for selective anisotropic etching of polycr...
- Patent number 4,502,915
- Issue date Mar 5, 1985
- Texas Instruments Incorporated
- Duane E. Carter
- H01 - BASIC ELECTRIC ELEMENTS

Rhett B. Jucha

Person

Patents Grantslast 30 patents

Low particulate reliability enhanced remote microwave plasma discha...

Processing method using both a remotely generated plasma and an in-...

Wafer processing apparatus having independently controllable energy...

Method for etching tungsten

Method for etching semiconductor materials using a remote plasma ge...

Processing of etching refractory metals

Method for etching tungsten

Processing apparatus and method

Isolation substrate ring for plasma reactor

Processing apparatus and method

Processing apparatus and method

Method for etching titanium nitride local interconnects

Selective etching of tungsten by remote and in situ plasma generation

Method for etch of polysilicon film

Method for etching tungsten

Method for etching aluminum film doped with copper

Method for etching tungsten

Apparatus and method for plasma-assisted etching

Method for etching tungsten

Process for etch of tungsten

Wafer processing apparatus and method

Method for plasma etching tungsten

Method for etching films of mercury-cadmium-telluride and zinc sulfid

Method for etching an aluminum film doped with silicon

Processing apparatus and method

Method for cleanup processing chamber and vacuum process module

Contact etch method

Apparatus for plasma assisted etching

Automated single slice cassette load lock plasma reactor

Two-step plasma process for selective anisotropic etching of polycr...