Richard M. Ness

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
6 KHz and above gas discharge laser system
- Patent number 8,855,166
- Issue date Oct 7, 2014
- Cymer, LLC
- Richard C. Ujazdowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for a two chamber gas discharge laser system
- Patent number RE42588
- Issue date Aug 2, 2011
- Cymer, Inc.
- John P. Fallon
- 372 - Coherent light generators
Information Patent Grant
Timing control for two-chamber gas discharge laser system
- Patent number 7,852,899
- Issue date Dec 14, 2010
- Cymer, Inc.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas discharge laser system electrodes and power supply for deliveri...
- Patent number 7,706,424
- Issue date Apr 27, 2010
- Cymer, Inc.
- Yoshiho Amada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 7,596,164
- Issue date Sep 29, 2009
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,567,607
- Issue date Jul 28, 2009
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Extreme ultraviolet light source
- Patent number 7,368,741
- Issue date May 6, 2008
- Cymer, Inc.
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,218,661
- Issue date May 15, 2007
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Timing control for two-chamber gas discharge laser system
- Patent number 7,203,216
- Issue date Apr 10, 2007
- Cymer Inc.
- Alexander I. Ershov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 7,079,564
- Issue date Jul 18, 2006
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,061,961
- Issue date Jun 13, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,058,107
- Issue date Jun 6, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 7,039,086
- Issue date May 2, 2006
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cooling magnetic circuit elements
- Patent number 7,002,443
- Issue date Feb 21, 2006
- Cymer, Inc.
- Richard M. Ness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high reprate gas discharge laser system
- Patent number 6,985,508
- Issue date Jan 10, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Extreme ultraviolet light source
- Patent number 6,972,421
- Issue date Dec 6, 2005
- Cymer, Inc.
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Six to ten KHz, or greater gas discharge laser system
- Patent number 6,914,919
- Issue date Jul 5, 2005
- Cymer, Inc.
- Tom A. Watson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Four KHz gas discharge laser system
- Patent number 6,882,674
- Issue date Apr 19, 2005
- Cymer, Inc.
- Christian J. Wittak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Timing control for two-chamber gas discharge laser system
- Patent number 6,865,210
- Issue date Mar 8, 2005
- Cymer, Inc.
- Alexander I. Ershov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma focus light source with improved pulse power system
- Patent number 6,815,700
- Issue date Nov 9, 2004
- Cymer, Inc.
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 6,801,560
- Issue date Oct 5, 2004
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Four KHz gas discharge laser
- Patent number 6,757,316
- Issue date Jun 29, 2004
- Cymer, Inc.
- Peter C. Newman
- G01 - MEASURING TESTING
Information Patent Grant
Pulse power system for extreme ultraviolet and x-ray sources
- Patent number 6,744,060
- Issue date Jun 1, 2004
- Cymer, Inc.
- Richard M. Ness
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 6,690,704
- Issue date Feb 10, 2004
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,625,191
- Issue date Sep 23, 2003
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Injection seeded F2 laser with line selection and discrimination
- Patent number 6,590,922
- Issue date Jul 8, 2003
- Cymer, Inc.
- Eckehard D. Onkels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma focus light source with active and buffer gas control
- Patent number 6,586,757
- Issue date Jul 1, 2003
- Cymer, Inc.
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma focus light source with improved pulse power system
- Patent number 6,566,667
- Issue date May 20, 2003
- Cymer, Inc.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,567,450
- Issue date May 20, 2003
- Cymer, Inc.
- David W. Myers
- G01 - MEASURING TESTING
Information Patent Grant
Plasma focus light source with tandem ellipsoidal mirror units
- Patent number 6,566,668
- Issue date May 20, 2003
- Cymer, Inc.
- John E. Rauch
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Laser Cutter and Safe Power System Therefor
- Publication number 20210316394
- Publication date Oct 14, 2021
- Gregory A. Herman
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
6 KHZ AND ABOVE GAS DISCHARGE LASER SYSTEM
- Publication number 20120120974
- Publication date May 17, 2012
- Richard C. Ujazdowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme ultraviolet light source
- Publication number 20100176313
- Publication date Jul 15, 2010
- Cymer, Inc.
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
6K pulse repetition rate and above gas discharge laser system solid...
- Publication number 20090238225
- Publication date Sep 24, 2009
- Cymer, Inc.
- Chaofeng Huang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Extreme ultraviolet light source
- Publication number 20080023657
- Publication date Jan 31, 2008
- Cymer, Inc.
- Stephen T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Gas discharge laser system electrodes and power supply for deliveri...
- Publication number 20070071058
- Publication date Mar 29, 2007
- Cymer, Inc.
- Yoshiho Amada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
6K pulse repetition rate and above gas discharge laser system solid...
- Publication number 20070071047
- Publication date Mar 29, 2007
- Cymer, Inc.
- Chaofeng Huang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Timing control for two-chamber gas discharge laser system
- Publication number 20060251135
- Publication date Nov 9, 2006
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
6 Khz and above gas discharge laser system
- Publication number 20060222034
- Publication date Oct 5, 2006
- Cymer, Inc.
- Richard C. Ujazdowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20060209917
- Publication date Sep 21, 2006
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Publication number 20060126697
- Publication date Jun 15, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...
- Publication number 20050271109
- Publication date Dec 8, 2005
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20050265417
- Publication date Dec 1, 2005
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme ultraviolet light source
- Publication number 20050230645
- Publication date Oct 20, 2005
- Cymer, Inc.
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Timing control for two-chamber gas discharge laser system
- Publication number 20050018739
- Publication date Jan 27, 2005
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for cooling magnetic circuit elements
- Publication number 20040264521
- Publication date Dec 30, 2004
- Richard M. Ness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040258122
- Publication date Dec 23, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040174919
- Publication date Sep 9, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Extreme ultraviolet light source
- Publication number 20040108473
- Publication date Jun 10, 2004
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20040057489
- Publication date Mar 25, 2004
- John P. Fallon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Very narrow band, two chamber, high reprate gas discharge laser system
- Publication number 20040047385
- Publication date Mar 11, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Four KHz gas discharge laser system
- Publication number 20030118072
- Publication date Jun 26, 2003
- Christian J. Wittak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Timing control for two-chamber gas discharge laser system
- Publication number 20030099269
- Publication date May 29, 2003
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20030031216
- Publication date Feb 13, 2003
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Six to ten KHz, or greater gas discharge laser system
- Publication number 20030012234
- Publication date Jan 16, 2003
- Tom A. Watson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma focus light source with improved pulse power system
- Publication number 20030006383
- Publication date Jan 9, 2003
- Stephan T. Melnychuk
- B82 - NANO-TECHNOLOGY
Information Patent Application
Injection seeded F2 laser with wavelength control
- Publication number 20020186739
- Publication date Dec 12, 2002
- Richard L. Sandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulse power system for extreme ultraviolet and x-ray sources
- Publication number 20020163313
- Publication date Nov 7, 2002
- Richard M. Ness
- B82 - NANO-TECHNOLOGY
Information Patent Application
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Publication number 20020154668
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20020154671
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING

Richard M. Ness

Person

Patents Grantslast 30 patents

6 KHz and above gas discharge laser system

Control system for a two chamber gas discharge laser system

Timing control for two-chamber gas discharge laser system

Gas discharge laser system electrodes and power supply for deliveri...

Control system for a two chamber gas discharge laser

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

Extreme ultraviolet light source

Line selected F2 two chamber laser system

Timing control for two-chamber gas discharge laser system

Control system for a two chamber gas discharge laser

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

Line selected F2 two chamber laser system

Control system for a two chamber gas discharge laser

Method and apparatus for cooling magnetic circuit elements

Very narrow band, two chamber, high reprate gas discharge laser system

Extreme ultraviolet light source

Six to ten KHz, or greater gas discharge laser system

Four KHz gas discharge laser system

Timing control for two-chamber gas discharge laser system

Plasma focus light source with improved pulse power system

Line selected F2 two chamber laser system

Four KHz gas discharge laser

Pulse power system for extreme ultraviolet and x-ray sources

Control system for a two chamber gas discharge laser

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Injection seeded F2 laser with line selection and discrimination

Plasma focus light source with active and buffer gas control

Plasma focus light source with improved pulse power system

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Plasma focus light source with tandem ellipsoidal mirror units

Patents Applicationslast 30 patents

Laser Cutter and Safe Power System Therefor

6 KHZ AND ABOVE GAS DISCHARGE LASER SYSTEM

Extreme ultraviolet light source

6K pulse repetition rate and above gas discharge laser system solid...

Extreme ultraviolet light source

Gas discharge laser system electrodes and power supply for deliveri...

6K pulse repetition rate and above gas discharge laser system solid...

Timing control for two-chamber gas discharge laser system

6 Khz and above gas discharge laser system

Control system for a two chamber gas discharge laser

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...

Control system for a two chamber gas discharge laser

Extreme ultraviolet light source

Timing control for two-chamber gas discharge laser system

Method and apparatus for cooling magnetic circuit elements

Line selected F2 two chamber laser system

Line selected F2 two chamber laser system

Extreme ultraviolet light source

Control system for a two chamber gas discharge laser

Very narrow band, two chamber, high reprate gas discharge laser system

Four KHz gas discharge laser system

Timing control for two-chamber gas discharge laser system

Control system for a two chamber gas discharge laser

Six to ten KHz, or greater gas discharge laser system

Plasma focus light source with improved pulse power system

Injection seeded F2 laser with wavelength control

Pulse power system for extreme ultraviolet and x-ray sources

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Line selected F2 two chamber laser system