Robert L. Bristol

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Frame reveals with maskless lithography in the manufacture of integ...
- Patent number 12,165,987
- Issue date Dec 10, 2024
- Intel Corporation
- Grant Kloster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxycarbide resists as leave behind plugs
- Patent number 12,107,044
- Issue date Oct 1, 2024
- Intel Corporation
- Marie Krysak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical compositions and methods of patterning microelectronic dev...
- Patent number 12,037,434
- Issue date Jul 16, 2024
- Intel Corporation
- Eungnak Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directed self-assembly structures and techniques
- Patent number 12,012,473
- Issue date Jun 18, 2024
- Intel Corporation
- James Munro Blackwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-stage bake photoresist with releasable quencher
- Patent number 11,955,343
- Issue date Apr 9, 2024
- Intel Corporation
- Robert L. Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lined photobucket structure for back end of line (BEOL) interconnec...
- Patent number 11,953,826
- Issue date Apr 9, 2024
- Intel Corporation
- James M. Blackwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Differential hardmasks for modulation of electrobucket sensitivity
- Patent number 11,955,377
- Issue date Apr 9, 2024
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
- Patent number 11,874,600
- Issue date Jan 16, 2024
- Intel Corporation
- Marie Krysak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Advanced lithography and self-assembled devices
- Patent number 11,854,787
- Issue date Dec 26, 2023
- Intel Corporation
- Richard E. Schenker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Subtractive plug and tab patterning with photobuckets for back end...
- Patent number 11,854,882
- Issue date Dec 26, 2023
- Tahoe Research, LTD.
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chain scission photoresists and methods for forming chain scission...
- Patent number 11,846,883
- Issue date Dec 19, 2023
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quantum dot array devices
- Patent number 11,594,599
- Issue date Feb 28, 2023
- Intel Corporation
- James S. Clarke
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Advanced lithography and self-assembled devices
- Patent number 11,373,950
- Issue date Jun 28, 2022
- Intel Corporation
- Richard E. Schenker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damascene plug and tab patterning with photobuckets
- Patent number 11,373,900
- Issue date Jun 28, 2022
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
- Patent number 11,320,734
- Issue date May 3, 2022
- Intel Corporation
- Marie Krysak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Two-stage bake photoresist with releasable quencher
- Patent number 11,315,798
- Issue date Apr 26, 2022
- Intel Corporation
- Robert L. Bristol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV phase-shift SRAF masks by means of embedded phase shift layers
- Patent number 11,300,885
- Issue date Apr 12, 2022
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Textile patterning for subtractively-patterned self-aligned interco...
- Patent number 11,276,581
- Issue date Mar 15, 2022
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential hardmasks for modulation of electrobucket sensitivity
- Patent number 11,251,072
- Issue date Feb 15, 2022
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer-based patterning for tight-pitch and low-variability random...
- Patent number 11,189,790
- Issue date Nov 30, 2021
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lined photobucket structure for back end of line (BEOL) interconnec...
- Patent number 11,137,681
- Issue date Oct 5, 2021
- Intel Corporation
- James M. Blackwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for forming vias and other interconnects for integrated...
- Patent number 11,069,609
- Issue date Jul 20, 2021
- Intel Corporation
- Sasikanth Manipatruni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magneto-electric spin orbit (MESO) structures having functional oxi...
- Patent number 10,957,844
- Issue date Mar 23, 2021
- Intel Corporation
- Jasmeet S. Chawla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photobucket floor colors with selective grafting
- Patent number 10,892,184
- Issue date Jan 12, 2021
- Intel Corporation
- Robert L. Bristol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced lithography and self-assembled devices
- Patent number 10,892,223
- Issue date Jan 12, 2021
- Intel Corporation
- Richard E. Schenker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Subtractive plug and tab patterning with photobuckets for back end...
- Patent number 10,867,853
- Issue date Dec 15, 2020
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damascene plug and tab patterning with photobuckets for back end of...
- Patent number 10,804,141
- Issue date Oct 13, 2020
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface-aligned lithographic patterning approaches for back end of...
- Patent number 10,796,909
- Issue date Oct 6, 2020
- Intel Corporation
- Robert L. Bristol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Means to decouple the diffusion and solubility switch mechanisms of...
- Patent number 10,692,757
- Issue date Jun 23, 2020
- Intel Corporation
- Marie Krysak
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Quantum dot array devices
- Patent number 10,644,113
- Issue date May 5, 2020
- Intel Corporation
- James S. Clarke
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...
- Publication number 20240360264
- Publication date Oct 31, 2024
- Intel Corporation
- Eungnak Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBTRACTIVE PLUG AND TAB PATTERNING WITH PHOTOBUCKETS FOR BACK END...
- Publication number 20240213095
- Publication date Jun 27, 2024
- Tahoe Research, Ltd.
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES
- Publication number 20240071917
- Publication date Feb 29, 2024
- Intel Corporation
- Richard E. SCHENKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INLINE CIRCUIT EDIT FOR BACKSIDE POWER DELIVERY
- Publication number 20230369222
- Publication date Nov 16, 2023
- Intel Corporation
- Clifford J. ENGEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGNS TO ENABLE INLINE CIRCUIT EDIT
- Publication number 20230369211
- Publication date Nov 16, 2023
- Intel Corporation
- Clifford J. ENGEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INLINE CIRCUIT EDIT FOR BACKSIDE POWER DELIVERY WITH DEEP VIA
- Publication number 20230369221
- Publication date Nov 16, 2023
- Intel Corporation
- Clifford J. ENGEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED ROUTING LAYER FOR INLINE CIRCUIT EDIT
- Publication number 20230369206
- Publication date Nov 16, 2023
- Intel Corporation
- Robert L. BRISTOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INLINE CIRCUIT EDIT
- Publication number 20230369207
- Publication date Nov 16, 2023
- Intel Corporation
- Clifford J. ENGEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES
- Publication number 20220262722
- Publication date Aug 18, 2022
- Intel Corporation
- Richard E. SCHENKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGAND-CAPPED MAIN GROUP NANOPARTICLES AS HIGH ABSORPTION EXTREME U...
- Publication number 20220229364
- Publication date Jul 21, 2022
- Intel Corporation
- Marie KRYSAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TWO-STAGE BAKE PHOTORESIST WITH RELEASABLE QUENCHER
- Publication number 20220216065
- Publication date Jul 7, 2022
- Intel Corporation
- Robert L. BRISTOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FRAME REVEALS WITH MASKLESS LITHOGRAPHY IN THE MANUFACTURE OF INTEG...
- Publication number 20220165677
- Publication date May 26, 2022
- Intel Corporation
- Grant Kloster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEXTILE PATTERNING FOR SUBTRACTIVELY-PATTERNED SELF-ALIGNED INTERCO...
- Publication number 20220157619
- Publication date May 19, 2022
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY
- Publication number 20220130719
- Publication date Apr 28, 2022
- Intel Corporation
- Kevin L. LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINED PHOTOBUCKET STRUCTURE FOR BACK END OF LINE (BEOL) INTERCONNEC...
- Publication number 20210397084
- Publication date Dec 23, 2021
- Intel Corporation
- James M. BLACKWELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...
- Publication number 20210371566
- Publication date Dec 2, 2021
- Intel Corporation
- Eungnak Han
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DIRECTED SELF-ASSEMBLY STRUCTURES AND TECHNIQUES
- Publication number 20210375745
- Publication date Dec 2, 2021
- Intel Corporation, Santa Clara, CA
- James Munro Blackwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES
- Publication number 20210082800
- Publication date Mar 18, 2021
- Intel Corporation
- Richard E. SCHENKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBTRACTIVE PLUG AND TAB PATTERNING WITH PHOTOBUCKETS FOR BACK END...
- Publication number 20210050261
- Publication date Feb 18, 2021
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DAMASCENE PLUG AND TAB PATTERNING WITH PHOTOBUCKETS FOR BACK END OF...
- Publication number 20210005511
- Publication date Jan 7, 2021
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXYCARBIDE RESISTS AS LEAVE BEHIND PLUGS
- Publication number 20200335434
- Publication date Oct 22, 2020
- Intel Corporation
- Marie KRYSAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR FORMING VIAS AND OTHER INTERCONNECTS FOR INTEGRATED...
- Publication number 20200279805
- Publication date Sep 3, 2020
- Intel Corporation
- Sasikanth MANIPATRUNI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAIN SCISSION PHOTORESISTS AND METHODS FOR FORMING CHAIN SCISSION...
- Publication number 20200103754
- Publication date Apr 2, 2020
- Intel Corporation
- Robert BRISTOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLORED SELF-ALIGNED SUBTRACTIVE PATTERNING
- Publication number 20200066521
- Publication date Feb 27, 2020
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES
- Publication number 20200066629
- Publication date Feb 27, 2020
- Intel Corporation
- Richard E. SCHENKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV PHASE-SHIFT SRAF MASKS BY MEANS OF EMBEDDED PHASE SHIFT LAYERS
- Publication number 20200033736
- Publication date Jan 30, 2020
- Intel Corporation
- Robert BRISTOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY
- Publication number 20190318959
- Publication date Oct 17, 2019
- Intel Corporation
- Kevin L. LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOBUCKET FLOOR COLORS WITH SELECTIVE GRAFTING
- Publication number 20190318958
- Publication date Oct 17, 2019
- Intel Corporation
- Robert L. BRISTOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED VIA
- Publication number 20190311984
- Publication date Oct 10, 2019
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGAND-CAPPED MAIN GROUP NANOPARTICLES AS HIGH ABSORPTION EXTREME U...
- Publication number 20190302615
- Publication date Oct 3, 2019
- Intel Corporation
- Marie KRYSAK
- B82 - NANO-TECHNOLOGY

Robert L. Bristol

Person

Patents Grantslast 30 patents

Frame reveals with maskless lithography in the manufacture of integ...

Metal oxycarbide resists as leave behind plugs

Chemical compositions and methods of patterning microelectronic dev...

Directed self-assembly structures and techniques

Two-stage bake photoresist with releasable quencher

Lined photobucket structure for back end of line (BEOL) interconnec...

Differential hardmasks for modulation of electrobucket sensitivity

Ligand-capped main group nanoparticles as high absorption extreme u...

Advanced lithography and self-assembled devices

Subtractive plug and tab patterning with photobuckets for back end...

Chain scission photoresists and methods for forming chain scission...

Quantum dot array devices

Advanced lithography and self-assembled devices

Damascene plug and tab patterning with photobuckets

Ligand-capped main group nanoparticles as high absorption extreme u...

Two-stage bake photoresist with releasable quencher

EUV phase-shift SRAF masks by means of embedded phase shift layers

Textile patterning for subtractively-patterned self-aligned interco...

Differential hardmasks for modulation of electrobucket sensitivity

Spacer-based patterning for tight-pitch and low-variability random...

Lined photobucket structure for back end of line (BEOL) interconnec...

Techniques for forming vias and other interconnects for integrated...

Magneto-electric spin orbit (MESO) structures having functional oxi...

Photobucket floor colors with selective grafting

Advanced lithography and self-assembled devices

Subtractive plug and tab patterning with photobuckets for back end...

Damascene plug and tab patterning with photobuckets for back end of...

Surface-aligned lithographic patterning approaches for back end of...

Means to decouple the diffusion and solubility switch mechanisms of...

Quantum dot array devices

Patents Applicationslast 30 patents

CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...

SUBTRACTIVE PLUG AND TAB PATTERNING WITH PHOTOBUCKETS FOR BACK END...

ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES

INLINE CIRCUIT EDIT FOR BACKSIDE POWER DELIVERY

DESIGNS TO ENABLE INLINE CIRCUIT EDIT

INLINE CIRCUIT EDIT FOR BACKSIDE POWER DELIVERY WITH DEEP VIA

EMBEDDED ROUTING LAYER FOR INLINE CIRCUIT EDIT

INLINE CIRCUIT EDIT

ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES

LIGAND-CAPPED MAIN GROUP NANOPARTICLES AS HIGH ABSORPTION EXTREME U...

TWO-STAGE BAKE PHOTORESIST WITH RELEASABLE QUENCHER

FRAME REVEALS WITH MASKLESS LITHOGRAPHY IN THE MANUFACTURE OF INTEG...

TEXTILE PATTERNING FOR SUBTRACTIVELY-PATTERNED SELF-ALIGNED INTERCO...

DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY

LINED PHOTOBUCKET STRUCTURE FOR BACK END OF LINE (BEOL) INTERCONNEC...

CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...

DIRECTED SELF-ASSEMBLY STRUCTURES AND TECHNIQUES

ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES

SUBTRACTIVE PLUG AND TAB PATTERNING WITH PHOTOBUCKETS FOR BACK END...

DAMASCENE PLUG AND TAB PATTERNING WITH PHOTOBUCKETS FOR BACK END OF...

METAL OXYCARBIDE RESISTS AS LEAVE BEHIND PLUGS

TECHNIQUES FOR FORMING VIAS AND OTHER INTERCONNECTS FOR INTEGRATED...

CHAIN SCISSION PHOTORESISTS AND METHODS FOR FORMING CHAIN SCISSION...

COLORED SELF-ALIGNED SUBTRACTIVE PATTERNING

ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES

EUV PHASE-SHIFT SRAF MASKS BY MEANS OF EMBEDDED PHASE SHIFT LAYERS

DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY

PHOTOBUCKET FLOOR COLORS WITH SELECTIVE GRAFTING

SELF-ALIGNED VIA

LIGAND-CAPPED MAIN GROUP NANOPARTICLES AS HIGH ABSORPTION EXTREME U...