Robert R. Mandal

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 7,825,042
- Issue date Nov 2, 2010
- Applied Materials, Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 7,633,163
- Issue date Dec 15, 2009
- Applied Materials, Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 7,601,631
- Issue date Oct 13, 2009
- Appplied Materials, Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 7,560,377
- Issue date Jul 14, 2009
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 7,399,697
- Issue date Jul 15, 2008
- Applied Materials, Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionic additives for extreme low dielectric constant chemical formul...
- Patent number 7,265,062
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Robert P. Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 7,205,224
- Issue date Apr 17, 2007
- Applied Materials, Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD plasma assisted low dielectric constant films
- Patent number 7,205,249
- Issue date Apr 17, 2007
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 7,094,710
- Issue date Aug 22, 2006
- Applied Materials
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 7,030,039
- Issue date Apr 18, 2006
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 7,018,943
- Issue date Mar 28, 2006
- ASML Holding N.V.
- Gurer Emir
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 7,012,030
- Issue date Mar 14, 2006
- Applied Materials Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 6,977,098
- Issue date Dec 20, 2005
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,930,061
- Issue date Aug 16, 2005
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionic additives for extreme low dielectric constant chemical formul...
- Patent number 6,896,955
- Issue date May 24, 2005
- Air Products and Chemicals, Inc.
- Robert P. Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrally formed bake plate unit for use in wafer fabrication system
- Patent number 6,891,134
- Issue date May 10, 2005
- ASML Netherlands B.V.
- Robert P. Mandal
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 6,890,639
- Issue date May 10, 2005
- Applied Materials, Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,869,896
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mesoporous films having reduced dielectric constants
- Patent number 6,818,289
- Issue date Nov 16, 2004
- Air Products and Chemicals, Inc.
- James Edward MacDougall
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
CVD plasma assisted low dielectric constant films
- Patent number 6,800,571
- Issue date Oct 5, 2004
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer track apparatus and methods for dispensing fluids with rotata...
- Patent number 6,770,424
- Issue date Aug 3, 2004
- ASML Holding N.V.
- Robert P. Mandal
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of improving moisture resistance of low dielectric constant...
- Patent number 6,743,737
- Issue date Jun 1, 2004
- Applied Materials, Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,734,115
- Issue date May 11, 2004
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,660,656
- Issue date Dec 9, 2003
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Computer readable medium for holding a program for performing plasm...
- Patent number 6,660,663
- Issue date Dec 9, 2003
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,596,655
- Issue date Jul 22, 2003
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Very low dielectric constant plasma-enhanced CVD films
- Patent number 6,596,627
- Issue date Jul 22, 2003
- Applied Materials Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mesoporous films having reduced dielectric constants
- Patent number 6,592,980
- Issue date Jul 15, 2003
- Air Products and Chemicals, Inc.
- James Edward MacDougall
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ionic additives for extreme low dielectric constant chemical formul...
- Patent number 6,576,568
- Issue date Jun 10, 2003
- Applied Materials, Inc.
- Robert P Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,562,690
- Issue date May 13, 2003
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Very Low Dielectric Constant Plasma-Enhanced CVD Films
- Publication number 20100081291
- Publication date Apr 1, 2010
- Applied Materials, Inc.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERY LOW DIELECTRIC CONSTANT PLASMA-ENHANCED CVD FILMS
- Publication number 20060240652
- Publication date Oct 26, 2006
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERY LOW DIELECTRIC CONSTANT PLASMA-ENHANCED CVD FILMS
- Publication number 20060226548
- Publication date Oct 12, 2006
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20050191846
- Publication date Sep 1, 2005
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Very low dielectric constant plasma-enhanced CVD films
- Publication number 20050153574
- Publication date Jul 14, 2005
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Very low dielectric constant plasma-enhanced CVD films
- Publication number 20050136240
- Publication date Jun 23, 2005
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD plasma assisted low dielectric constant films
- Publication number 20050059264
- Publication date Mar 17, 2005
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Very low dielectric constant plasma-enhanced CVD films
- Publication number 20040235291
- Publication date Nov 25, 2004
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for processing semiconductor wafers with plas...
- Publication number 20040157430
- Publication date Aug 12, 2004
- ASML NETHERLANDS B.V.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrally formed bake plate unit for use in wafer fabrication system
- Publication number 20040155026
- Publication date Aug 12, 2004
- Robert P. Mandal
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
WAFER TRACK APPARATUS AND METHODS FOR DISPENSING FLUIDS WITH ROTATA...
- Publication number 20040115567
- Publication date Jun 17, 2004
- Robert P. Mandal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ionic additives for extreme low dielectric constant chemical formul...
- Publication number 20040087184
- Publication date May 6, 2004
- APPLIED MATERIALS INC., a Delaware corporation
- Robert P. Mandal
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20040082199
- Publication date Apr 29, 2004
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20040038545
- Publication date Feb 26, 2004
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Very low dielectric constant plasma-enhanced CVD films
- Publication number 20030211728
- Publication date Nov 13, 2003
- APPLIED MATERIALS, INC.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mesoporous films having reduced dielectric constants
- Publication number 20030157311
- Publication date Aug 21, 2003
- James Edward MacDougall
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CVD plasma assisted low dielectric constant films
- Publication number 20030124859
- Publication date Jul 3, 2003
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20030064610
- Publication date Apr 3, 2003
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of improving moisture resistance of low dielectric constant...
- Publication number 20030054667
- Publication date Mar 20, 2003
- APPLIED MATERIALS, INC.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ionic additives for extreme low dielectric constant chemical formul...
- Publication number 20030008525
- Publication date Jan 9, 2003
- Applied Materials Inc.
- Robert P. Mandal
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Very low dielectric constant plasma-enhanced CVD films
- Publication number 20020197849
- Publication date Dec 26, 2002
- APPLIED MATERIALS, INC.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Very low dielectric constant plasma-enhanced CVD films
- Publication number 20020142585
- Publication date Oct 3, 2002
- APPLIED MATERIALS, INC.
- Robert P. Mandal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020127334
- Publication date Sep 12, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020098283
- Publication date Jul 25, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20020045361
- Publication date Apr 18, 2002
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ionic additives for extreme low dielectric constant chemical formul...
- Publication number 20020042210
- Publication date Apr 11, 2002
- Robert P. Mandal
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020004100
- Publication date Jan 10, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of improving moisture resistance of low dielectric constant...
- Publication number 20010026849
- Publication date Oct 4, 2001
- APPLIED MATERIALS, INC.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS
- Publication number 20010005546
- Publication date Jun 28, 2001
- APPLIED MATERIALS, INC.
- DAVID CHEUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS
- Publication number 20010004479
- Publication date Jun 21, 2001
- DAVID CHEUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Robert R. Mandal

Person

Patents Grantslast 30 patents

Very low dielectric constant plasma-enhanced CVD films

Very low dielectric constant plasma-enhanced CVD films

Very low dielectric constant plasma-enhanced CVD films

Plasma processes for depositing low dielectric constant films

Very low dielectric constant plasma-enhanced CVD films

Ionic additives for extreme low dielectric constant chemical formul...

Very low dielectric constant plasma-enhanced CVD films

CVD plasma assisted low dielectric constant films

Very low dielectric constant plasma-enhanced CVD films

Method of uniformly coating a substrate

Method of uniformly coating a substrate

Very low dielectric constant plasma-enhanced CVD films

Method of uniformly coating a substrate

Plasma processes for depositing low dielectric constant films

Ionic additives for extreme low dielectric constant chemical formul...

Integrally formed bake plate unit for use in wafer fabrication system

Very low dielectric constant plasma-enhanced CVD films

Plasma processes for depositing low dielectric constant films

Mesoporous films having reduced dielectric constants

CVD plasma assisted low dielectric constant films

Wafer track apparatus and methods for dispensing fluids with rotata...

Method of improving moisture resistance of low dielectric constant...

Plasma processes for depositing low dielectric constant films

Plasma processes for depositing low dielectric constant films

Computer readable medium for holding a program for performing plasm...

Plasma processes for depositing low dielectric constant films

Very low dielectric constant plasma-enhanced CVD films

Mesoporous films having reduced dielectric constants

Ionic additives for extreme low dielectric constant chemical formul...

Plasma processes for depositing low dielectric constant films

Patents Applicationslast 30 patents

Very Low Dielectric Constant Plasma-Enhanced CVD Films

VERY LOW DIELECTRIC CONSTANT PLASMA-ENHANCED CVD FILMS

VERY LOW DIELECTRIC CONSTANT PLASMA-ENHANCED CVD FILMS

Plasma processes for depositing low dielectric constant films

Very low dielectric constant plasma-enhanced CVD films

Very low dielectric constant plasma-enhanced CVD films

CVD plasma assisted low dielectric constant films

Very low dielectric constant plasma-enhanced CVD films

Methods and apparatus for processing semiconductor wafers with plas...

Integrally formed bake plate unit for use in wafer fabrication system

WAFER TRACK APPARATUS AND METHODS FOR DISPENSING FLUIDS WITH ROTATA...

Ionic additives for extreme low dielectric constant chemical formul...

Plasma processes for depositing low dielectric constant films

Plasma processes for depositing low dielectric constant films

Very low dielectric constant plasma-enhanced CVD films

Mesoporous films having reduced dielectric constants

CVD plasma assisted low dielectric constant films

Plasma processes for depositing low dielectric constant films

Method of improving moisture resistance of low dielectric constant...

Ionic additives for extreme low dielectric constant chemical formul...

Very low dielectric constant plasma-enhanced CVD films

Very low dielectric constant plasma-enhanced CVD films

Method of uniformly coating a substrate

Method of uniformly coating a substrate

Plasma processes for depositing low dielectric constant films

Ionic additives for extreme low dielectric constant chemical formul...

Method of uniformly coating a substrate

Method of improving moisture resistance of low dielectric constant...

PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS

PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS