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Satoru Kobayashi
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Santa Clara, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Low temperature chuck for plasma processing systems
Patent number
12,009,228
Issue date
Jun 11, 2024
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
Patent number
11,972,930
Issue date
Apr 30, 2024
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Device and method for tuning plasma distribution using phase control
Patent number
11,908,662
Issue date
Feb 20, 2024
Applied Materials, Inc.
Xiaopu Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Low temperature chuck for plasma processing systems
Patent number
11,594,428
Issue date
Feb 28, 2023
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for dynamical control of radial uniformity in...
Patent number
11,355,317
Issue date
Jun 7, 2022
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for dynamical control of radial uniformity wi...
Patent number
11,348,783
Issue date
May 31, 2022
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
Patent number
11,195,699
Issue date
Dec 7, 2021
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for radial and azimuthal control of plasma unif...
Patent number
10,903,052
Issue date
Jan 26, 2021
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetic induction plasma source for semiconductor processes and eq...
Patent number
10,593,560
Issue date
Mar 17, 2020
Applied Materials, Inc.
Tae Seung Cho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Ceramic ring test device
Patent number
10,551,328
Issue date
Feb 4, 2020
Applied Materials, Inc.
Satoru Kobayashi
G01 - MEASURING TESTING
Information
Patent Grant
High temperature chuck for plasma processing systems
Patent number
10,468,285
Issue date
Nov 5, 2019
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Rotatable substrate support having radio frequency applicator
Patent number
10,460,915
Issue date
Oct 29, 2019
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor having digital control over rotation frequency of a...
Patent number
10,453,655
Issue date
Oct 22, 2019
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for radial and azimuthal control of plasma unif...
Patent number
10,431,429
Issue date
Oct 1, 2019
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
Patent number
10,340,124
Issue date
Jul 2, 2019
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor having digital control over rotation frequency of a...
Patent number
10,153,133
Issue date
Dec 11, 2018
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for generating a variable clock used to contro...
Patent number
9,960,776
Issue date
May 1, 2018
Applied Materials, Inc.
Kenneth S. Collins
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Grant
Ceramic ring test device
Patent number
9,846,130
Issue date
Dec 19, 2017
Applied Materials, Inc.
Satoru Kobayashi
G01 - MEASURING TESTING
Information
Patent Grant
Radial waveguide systems and methods for post-match control of micr...
Patent number
9,837,249
Issue date
Dec 5, 2017
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
High temperature chuck for plasma processing systems
Patent number
9,728,437
Issue date
Aug 8, 2017
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radial waveguide systems and methods for post-match control of micr...
Patent number
9,564,296
Issue date
Feb 7, 2017
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Digital phase controller for two-phase operation of a plasma reactor
Patent number
9,312,106
Issue date
Apr 12, 2016
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radial waveguide systems and methods for post-match control of micr...
Patent number
9,299,537
Issue date
Mar 29, 2016
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radial waveguide systems and methods for post-match control of micr...
Patent number
9,299,538
Issue date
Mar 29, 2016
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Independent control of RF phases of separate coils of an inductivel...
Patent number
9,161,428
Issue date
Oct 13, 2015
Applied Materials, Inc.
Kenneth S. Collins
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
In-situ VHF current sensor for a plasma reactor
Patent number
8,970,226
Issue date
Mar 3, 2015
Applied Materials, Inc.
Hiroji Hanawa
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
In-situ VHF voltage sensor for a plasma reactor
Patent number
8,513,939
Issue date
Aug 20, 2013
Applied Materials, Inc.
Hiroji Hanawa
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Plasma reactor with reduced electrical skew using electrical bypass...
Patent number
7,988,815
Issue date
Aug 2, 2011
Applied Materials, Inc.
Shahid Rauf
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
Publication number
20240222084
Publication date
Jul 4, 2024
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20230223281
Publication date
Jul 13, 2023
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
Publication number
20220093364
Publication date
Mar 24, 2022
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CHAMBER WITH INDUCTIVE POWER SOURCE
Publication number
20210183620
Publication date
Jun 17, 2021
Applied Materials, Inc.
Wei Tian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR DYNAMICAL CONTROL OF RADIAL UNIFORMITY WI...
Publication number
20210074539
Publication date
Mar 11, 2021
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DEVICE AND METHOD FOR TUNING PLASMA DISTRIBUTION USING PHASE CONTROL
Publication number
20200161093
Publication date
May 21, 2020
Applied Materials, Inc.
Xiaopu LI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...
Publication number
20190362944
Publication date
Nov 28, 2019
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
Publication number
20190326099
Publication date
Oct 24, 2019
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RF TAILORED VOLTAGE ON BIAS OPERATION
Publication number
20190311884
Publication date
Oct 10, 2019
Applied Materials, Inc.
Satoru KOBAYASHI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQ...
Publication number
20190272999
Publication date
Sep 5, 2019
Applied Materials, Inc.
Tae Seung Cho
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
METHODS AND APPARATUS FOR DYNAMICAL CONTROL OF RADIAL UNIFORMITY IN...
Publication number
20190189399
Publication date
Jun 20, 2019
Applied Materials, Inc.
SATORU KOBAYASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA REACTOR HAVING DIGITAL CONTROL OVER ROTATION FREQUENCY OF A...
Publication number
20190108981
Publication date
Apr 11, 2019
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...
Publication number
20180226230
Publication date
Aug 9, 2018
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CERAMIC RING TEST DEVICE
Publication number
20180073994
Publication date
Mar 15, 2018
Applied Materials, Inc.
Satoru Kobayashi
G01 - MEASURING TESTING
Information
Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20170309509
Publication date
Oct 26, 2017
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR
Publication number
20170236693
Publication date
Aug 17, 2017
Applied Materials, Inc.
Satoru KOBAYASHI
H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information
Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20170229326
Publication date
Aug 10, 2017
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
Publication number
20170125219
Publication date
May 4, 2017
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIAL WAVEGUIDE SYSTEMS AND METHODS FOR POST-MATCH CONTROL OF MICR...
Publication number
20170110290
Publication date
Apr 20, 2017
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA REACTOR HAVING DIGITAL CONTROL OVER ROTATION FREQUENCY OF A...
Publication number
20160284519
Publication date
Sep 29, 2016
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20160225652
Publication date
Aug 4, 2016
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
Publication number
20160225651
Publication date
Aug 4, 2016
Applied Materials, Inc.
Toan Q. Tran
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIAL WAVEGUIDE SYSTEMS AND METHODS FOR POST-MATCH CONTROL OF MICR...
Publication number
20160189933
Publication date
Jun 30, 2016
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIAL WAVEGUIDE SYSTEMS AND METHODS FOR POST-MATCH CONTROL OF MICR...
Publication number
20150270105
Publication date
Sep 24, 2015
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIAL WAVEGUIDE SYSTEMS AND METHODS FOR POST-MATCH CONTROL OF MICR...
Publication number
20150270106
Publication date
Sep 24, 2015
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CERAMIC RING TEST DEVICE
Publication number
20150241362
Publication date
Aug 27, 2015
Applied Materials, Inc.
Satoru Kobayashi
G01 - MEASURING TESTING
Information
Patent Application
ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR
Publication number
20150083042
Publication date
Mar 26, 2015
Applied Materials, Inc.
Satoru KOBAYASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR GENERATING A VARIABLE CLOCK USED TO CONTRO...
Publication number
20140262032
Publication date
Sep 18, 2014
Applied Materials, Inc.
KENNETH S. COLLINS
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
DIGITAL PHASE CONTROLLER FOR TWO-PHASE OPERATION OF A PLASMA REACTOR
Publication number
20140265910
Publication date
Sep 18, 2014
Applied Materials, Inc.
Satoru Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
IN-SITU VHF CURRENT SENSOR FOR A PLASMA REACTOR
Publication number
20130320998
Publication date
Dec 5, 2013
Applied Materials, Inc.
Hiroji Hanawa
G01 - MEASURING TESTING