Seiji Miyazaki

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Glass-melting furnace, process for producing molten glass, apparatu...
- Patent number 8,707,738
- Issue date Apr 29, 2014
- Asahi Glass Company, Limited
- Osamu Sakamoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process for producing molten glass, glass-melting furnace, process...
- Patent number 8,573,007
- Issue date Nov 5, 2013
- Asahi Glass Company, Limited
- Osamu Sakamoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Glass-melting furnace, process for producing molten glass, apparatu...
- Patent number 8,544,298
- Issue date Oct 1, 2013
- Asahi Glass Company, Limited
- Osamu Sakamoto
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Alkali free glass and process for its production
- Patent number 7,670,975
- Issue date Mar 2, 2010
- Asahi Glass Company, Limited
- Kazuhiro Suzuki
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Crystallized glass spacer for field emission display and method its...
- Patent number 7,365,036
- Issue date Apr 29, 2008
- Asahi Glass Company, Limited
- Seiji Miyazaki
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
IC card equipped with elliptic curve encryption processing facility
- Patent number 6,714,648
- Issue date Mar 30, 2004
- Hitachi, Ltd.
- Seiji Miyazaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Network system using a threshold secret sharing method
- Patent number 6,477,254
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Seiji Miyazaki
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
IC card equipped with elliptical curve encryption processing facility
- Patent number 6,466,668
- Issue date Oct 15, 2002
- Hitachi, Ltd.
- Seiji Miyazaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanning exposure apparatus and exposure method
- Patent number RE37762
- Issue date Jun 25, 2002
- Nikon Corporation
- Seiji Miyazaki
- 355 - Photocopying
Information Patent Grant
Scanning type exposure apparatus and exposure method
- Patent number RE37361
- Issue date Sep 11, 2001
- Nikon Corporation
- Masamitsu Yanagihara
- 355 - Photocopying
Information Patent Grant
Client-server system for controlling access rights to certain servi...
- Patent number 6,189,032
- Issue date Feb 13, 2001
- Hitachi, Ltd.
- Seiichi Susaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment method, exposure method, and exposure apparatus
- Patent number 6,141,082
- Issue date Oct 31, 2000
- Nikon Corporation
- Kei Nara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus, method for correcting positional dis...
- Patent number 5,999,244
- Issue date Dec 7, 1999
- Nikon Corporation
- Masamitsu Yanagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Glass substrate for plasma display panel
- Patent number 5,888,917
- Issue date Mar 30, 1999
- Asahi Glass Company Ltd.
- Toshiyasu Kawaguchi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for heat-treating a glass substrate
- Patent number 5,882,371
- Issue date Mar 16, 1999
- Asahi Glass Company Ltd.
- Seiji Miyazaki
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Alignment method utilizing plurality of marks, discriminable from e...
- Patent number 5,849,441
- Issue date Dec 15, 1998
- Nikon Corporation
- Kei Nara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 5,798,822
- Issue date Aug 25, 1998
- Nikon Corporation
- Seiji Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method using reference marks on both the mask and the subs...
- Patent number 5,793,472
- Issue date Aug 11, 1998
- Nikon Corporation
- Kazuhiko Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning exposure apparatus and method
- Patent number 5,777,722
- Issue date Jul 7, 1998
- Nikon Corporation
- Seiji Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus with light shielding portion for plotosensitive...
- Patent number 5,760,881
- Issue date Jun 2, 1998
- Nikon Corporation
- Seiji Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method
- Patent number 5,657,130
- Issue date Aug 12, 1997
- Nikon Corporation
- Hiroshi Shirasu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning type exposure apparatus and exposure method
- Patent number 5,625,436
- Issue date Apr 29, 1997
- Nikon Corporation
- Masamitsu Yanagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and apparatus
- Patent number 5,623,343
- Issue date Apr 22, 1997
- Nikon Corporation
- Kei Nara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 5,617,211
- Issue date Apr 1, 1997
- Nikon Corporation
- Kei Nara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning exposure apparatus and exposure method
- Patent number 5,602,620
- Issue date Feb 11, 1997
- Nikon Corporation
- Seiji Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
GLASS-MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...
- Publication number 20120216571
- Publication date Aug 30, 2012
- ASAHI GLASS COMPANY, LIMITED
- Osamu SAKAMOTO
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
GLASS-MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...
- Publication number 20120159992
- Publication date Jun 28, 2012
- ASAHI GLASS COMPANY, LIMITED
- Osamu SAKAMOTO
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
GLASS MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...
- Publication number 20120159994
- Publication date Jun 28, 2012
- ASAHI GLASS COMPANY, LIMITED
- Osamu SAKAMOTO
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
GLASS MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...
- Publication number 20120151966
- Publication date Jun 21, 2012
- ASAHI GLASS COMPANY, LIMITED
- Osamu SAKAMOTO
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PROCESS FOR PRODUCING MOLTEN GLASS, GLASS-MELTING FURNACE, PROCESS...
- Publication number 20120137737
- Publication date Jun 7, 2012
- ASAHI GLASS COMPANY, LIMITED
- Osamu SAKAMOTO
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
GLASS-MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...
- Publication number 20120137736
- Publication date Jun 7, 2012
- ASAHI GLASS COMPANY, LIMITED
- Osamu Sakamoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Exposure system, device production system, exposure method, and dev...
- Publication number 20080266539
- Publication date Oct 30, 2008
- Nikon Corporation
- Kei Nara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALKALI FREE GLASS AND PROCESS FOR ITS PRODUCTION
- Publication number 20080076656
- Publication date Mar 27, 2008
- ASAHI GLASS COMPANY, LIMITED
- Kazuhiro SUZUKI
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
CRYSTALLIZED GLASS SPACER FOR FIELD EMISSION DISPLAY AND METHOD ITS...
- Publication number 20070225144
- Publication date Sep 27, 2007
- Asahi Glass Co., LTD.
- Seiji MIYAZAKI
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
IC card equipped with elliptic curve encryption processing facility
- Publication number 20030021410
- Publication date Jan 30, 2003
- Hitachi, Ltd.
- Seiji Miyazaki
- G06 - COMPUTING CALCULATING COUNTING

Seiji Miyazaki

Person

Patents Grantslast 30 patents

Glass-melting furnace, process for producing molten glass, apparatu...

Process for producing molten glass, glass-melting furnace, process...

Glass-melting furnace, process for producing molten glass, apparatu...

Alkali free glass and process for its production

Crystallized glass spacer for field emission display and method its...

IC card equipped with elliptic curve encryption processing facility

Network system using a threshold secret sharing method

IC card equipped with elliptical curve encryption processing facility

Scanning exposure apparatus and exposure method

Scanning type exposure apparatus and exposure method

Client-server system for controlling access rights to certain servi...

Alignment method, exposure method, and exposure apparatus

Projection exposure apparatus, method for correcting positional dis...

Glass substrate for plasma display panel

Method for heat-treating a glass substrate

Alignment method utilizing plurality of marks, discriminable from e...

Exposure apparatus

Exposure method using reference marks on both the mask and the subs...

Scanning exposure apparatus and method

Exposure apparatus with light shielding portion for plotosensitive...

Exposure apparatus and method

Scanning type exposure apparatus and exposure method

Exposure method and apparatus

Exposure apparatus

Scanning exposure apparatus and exposure method

Patents Applicationslast 30 patents

GLASS-MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...

GLASS-MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...

GLASS MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...

GLASS MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...

PROCESS FOR PRODUCING MOLTEN GLASS, GLASS-MELTING FURNACE, PROCESS...

GLASS-MELTING FURNACE, PROCESS FOR PRODUCING MOLTEN GLASS, APPARATU...

Exposure system, device production system, exposure method, and dev...

ALKALI FREE GLASS AND PROCESS FOR ITS PRODUCTION

CRYSTALLIZED GLASS SPACER FOR FIELD EMISSION DISPLAY AND METHOD ITS...

IC card equipped with elliptic curve encryption processing facility