Seung Park

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High aspect ratio selective lateral etch using cyclic passivation a...
- Patent number 10,276,398
- Issue date Apr 30, 2019
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential silicon oxide etch
- Patent number 9,887,096
- Issue date Feb 6, 2018
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning high aspect ratio vias
- Patent number 9,576,788
- Issue date Feb 21, 2017
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etching
- Patent number 9,449,845
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical-component oxide etch
- Patent number 9,437,451
- Issue date Sep 6, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon etch process with tunable selectivity to SiO2 and other mat...
- Patent number 9,368,364
- Issue date Jun 14, 2016
- Applied Materials, Inc.
- Seung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-local plasma oxide etch
- Patent number 9,355,863
- Issue date May 31, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas-phase tungsten etch
- Patent number 9,299,575
- Issue date Mar 29, 2016
- Applied Materials, Inc.
- Seung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etch
- Patent number 9,275,834
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Seung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-local plasma oxide etch
- Patent number 9,111,877
- Issue date Aug 18, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential silicon oxide etch
- Patent number 9,034,770
- Issue date May 19, 2015
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical-component oxide etch
- Patent number 9,023,734
- Issue date May 5, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten oxide processing
- Patent number 8,951,429
- Issue date Feb 10, 2015
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etching
- Patent number 8,921,234
- Issue date Dec 30, 2014
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...
- Publication number 20190206697
- Publication date Jul 4, 2019
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...
- Publication number 20190043732
- Publication date Feb 7, 2019
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING HIGH ASPECT RATIO VIAS
- Publication number 20160314961
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON ETCH PROCESS WITH TUNABLE SELECTIVITY TO SiO2 AND OTHER MAT...
- Publication number 20160260588
- Publication date Sep 8, 2016
- Applied Materials, Inc.
- SEUNG PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON ETCH PROCESS WITH TUNABLE SELECTIVITY TO SiO2 AND OTHER MAT...
- Publication number 20160086807
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- SEUNG PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-LOCAL PLASMA OXIDE ETCH
- Publication number 20150357201
- Publication date Dec 10, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS-PHASE TUNGSTEN ETCH
- Publication number 20150262829
- Publication date Sep 17, 2015
- Applied Materials, Inc.
- Seung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL SILICON OXIDE ETCH
- Publication number 20150249018
- Publication date Sep 3, 2015
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL-COMPONENT OXIDE ETCH
- Publication number 20150235863
- Publication date Aug 20, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE TITANIUM NITRIDE ETCHING
- Publication number 20150118857
- Publication date Apr 30, 2015
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE TITANIUM NITRIDE ETCHING
- Publication number 20140179111
- Publication date Jun 26, 2014
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-LOCAL PLASMA OXIDE ETCH
- Publication number 20140166617
- Publication date Jun 19, 2014
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL-COMPONENT OXIDE ETCH
- Publication number 20140080308
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL SILICON OXIDE ETCH
- Publication number 20140080309
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

High aspect ratio selective lateral etch using cyclic passivation a...

Differential silicon oxide etch

Cleaning high aspect ratio vias

Selective titanium nitride etching

Radical-component oxide etch

Silicon etch process with tunable selectivity to SiO2 and other mat...

Non-local plasma oxide etch

Gas-phase tungsten etch

Selective titanium nitride etch

Non-local plasma oxide etch

Differential silicon oxide etch

Radical-component oxide etch

Tungsten oxide processing

Selective titanium nitride etching

Patents Applicationslast 30 patents

HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...

HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...

CLEANING HIGH ASPECT RATIO VIAS

SILICON ETCH PROCESS WITH TUNABLE SELECTIVITY TO SiO2 AND OTHER MAT...

SILICON ETCH PROCESS WITH TUNABLE SELECTIVITY TO SiO2 AND OTHER MAT...

NON-LOCAL PLASMA OXIDE ETCH

GAS-PHASE TUNGSTEN ETCH

DIFFERENTIAL SILICON OXIDE ETCH

RADICAL-COMPONENT OXIDE ETCH

SELECTIVE TITANIUM NITRIDE ETCHING

SELECTIVE TITANIUM NITRIDE ETCHING

NON-LOCAL PLASMA OXIDE ETCH

RADICAL-COMPONENT OXIDE ETCH

DIFFERENTIAL SILICON OXIDE ETCH