Shigenori Hayashi

Person

Gose, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating semiconductor device and plasma doping appar...
- Patent number 8,574,972
- Issue date Nov 5, 2013
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method
- Patent number 8,216,922
- Issue date Jul 10, 2012
- Panasonic Corporation
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a field effect transistor using a high...
- Patent number 7,956,413
- Issue date Jun 7, 2011
- Panasonic Corporation
- Yoshinao Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating buffer film and high dielectric constant semiconductor d...
- Patent number 7,816,244
- Issue date Oct 19, 2010
- Panasonic Corporation
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a field effect transistor using a high...
- Patent number 7,554,156
- Issue date Jun 30, 2009
- Panasonic Corporation
- Yoshinao Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating buffer film and high dielectric constant semiconductor d...
- Patent number 7,495,298
- Issue date Feb 24, 2009
- Panasonic Corporation
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 7,488,655
- Issue date Feb 10, 2009
- Matsushita Electric Industrial Co., Ltd.
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,465,618
- Issue date Dec 16, 2008
- Panasonic Corporation
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 7,115,533
- Issue date Oct 3, 2006
- Matsushita Electric Industrial Co., Ltd.
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 7,094,639
- Issue date Aug 22, 2006
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet-etching method and method for manufacturing semiconductor device
- Patent number 6,667,246
- Issue date Dec 23, 2003
- Matsushita Electric Industrial Co., Ltd.
- Riichiro Mitsuhashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a thin film sensor element
- Patent number 6,105,225
- Issue date Aug 22, 2000
- Matsushita Electric Industrial Co., Ltd.
- Hideo Torii
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for applying RF power apparatus and method for...
- Patent number 6,030,667
- Issue date Feb 29, 2000
- Matsushita Electric Industrial Co., Ltd.
- Hideo Nakagawa
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma treatment method and plasma treatment system
- Patent number 5,928,528
- Issue date Jul 27, 1999
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator with antennas attached to top electrodes
- Patent number 5,838,111
- Issue date Nov 17, 1998
- Matsushita Electric Industrial Co., Ltd.
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of forming thin films
- Patent number 5,755,888
- Issue date May 26, 1998
- Matsushita Electric Industrial Co., Ltd.
- Hideo Torii
- C30 - CRYSTAL GROWTH
Information Patent Grant
Capacitance sensor
- Patent number 5,719,740
- Issue date Feb 17, 1998
- Matsushita Electric Industrial Co., Ltd.
- Shigenori Hayashi
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for fabrication of dielectric thin film
- Patent number 5,674,366
- Issue date Oct 7, 1997
- Matsushita Electric Industrial Co., Ltd.
- Shigenori Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for fabrication of dielectric film
- Patent number 5,672,252
- Issue date Sep 30, 1997
- Matsushita Electric Industrial Co., Ltd.
- Shigenori Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film sensor element and method of manufacturing the same
- Patent number 5,612,536
- Issue date Mar 18, 1997
- Matsushita Electric Industrial Co., Ltd.
- Hideo Torii
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing a capacitance sensor
- Patent number 5,507,080
- Issue date Apr 16, 1996
- Matsushita Electric Industrial Co., Ltd.
- Shigenori Hayashi
- G01 - MEASURING TESTING
Information Patent Grant
Method for manufacturing thin film oxide superconductors and superc...
- Patent number 5,145,830
- Issue date Sep 8, 1992
- Matsushita Electric Industrial Co., Ltd.
- Shigemi Kohiki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND PLASMA DOPING APPAR...
- Publication number 20120034750
- Publication date Feb 9, 2012
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD
- Publication number 20110230038
- Publication date Sep 22, 2011
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING BUFFER FILM AND HIGH DIELECTRIC CONSTANT SEMICONDUCTOR D...
- Publication number 20110008954
- Publication date Jan 13, 2011
- PANASONIC CORPORATION
- Shigenori HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A FIELD EFFECT TRANSISTOR USING A HIGH...
- Publication number 20090242983
- Publication date Oct 1, 2009
- PANASONIC CORPORATION
- Yoshinao HARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING BUFFER FILM AND HIGH DIELECTRIC CONSTANT SEMICONDUCTOR D...
- Publication number 20090130833
- Publication date May 21, 2009
- PANASONIC CORPORATION
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20070007564
- Publication date Jan 11, 2007
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20060281264
- Publication date Dec 14, 2006
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating semiconductor device
- Publication number 20060205131
- Publication date Sep 14, 2006
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a field effect transistor using a high...
- Publication number 20060125006
- Publication date Jun 15, 2006
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Yoshinao Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating semiconductor device
- Publication number 20040157473
- Publication date Aug 12, 2004
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating semiconductor device
- Publication number 20040087124
- Publication date May 6, 2004
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing method
- Publication number 20030113972
- Publication date Jun 19, 2003
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wet-etching method and method for manufacturing semiconductor device
- Publication number 20030104706
- Publication date Jun 5, 2003
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Riichiro Mitsuhashi
- H01 - BASIC ELECTRIC ELEMENTS

Shigenori Hayashi

Person

Patents Grantslast 30 patents

Method for fabricating semiconductor device and plasma doping appar...

Plasma doping method

Semiconductor device having a field effect transistor using a high...

Insulating buffer film and high dielectric constant semiconductor d...

Semiconductor device having a field effect transistor using a high...

Insulating buffer film and high dielectric constant semiconductor d...

Method for fabricating semiconductor device

Semiconductor device and method for fabricating the same

Semiconductor device manufacturing method

Method for fabricating semiconductor device

Wet-etching method and method for manufacturing semiconductor device

Method of manufacturing a thin film sensor element

Apparatus and method for applying RF power apparatus and method for...

Plasma treatment method and plasma treatment system

Plasma generator with antennas attached to top electrodes

Method and apparatus of forming thin films

Capacitance sensor

Method and apparatus for fabrication of dielectric thin film

Method and apparatus for fabrication of dielectric film

Thin film sensor element and method of manufacturing the same

Method of manufacturing a capacitance sensor

Method for manufacturing thin film oxide superconductors and superc...

Patents Applicationslast 30 patents

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND PLASMA DOPING APPAR...

PLASMA DOPING METHOD

INSULATING BUFFER FILM AND HIGH DIELECTRIC CONSTANT SEMICONDUCTOR D...

SEMICONDUCTOR DEVICE HAVING A FIELD EFFECT TRANSISTOR USING A HIGH...

INSULATING BUFFER FILM AND HIGH DIELECTRIC CONSTANT SEMICONDUCTOR D...

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Method for fabricating semiconductor device

Semiconductor device having a field effect transistor using a high...

Method for fabricating semiconductor device

Method for fabricating semiconductor device

Semiconductor device manufacturing method

Wet-etching method and method for manufacturing semiconductor device