Shin Hashimoto

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,076,736
- Issue date Dec 13, 2011
- Panasonic Corporation
- Masashi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device using multiple ion im...
- Patent number 7,981,817
- Issue date Jul 19, 2011
- Panasonic Corporation
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,808,077
- Issue date Oct 5, 2010
- Panasonic Corporation
- Kyoko Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with multilayered metal pattern
- Patent number 7,741,207
- Issue date Jun 22, 2010
- Panasonic Corporation
- Shin Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and method for forming pattern
- Patent number 7,582,394
- Issue date Sep 1, 2009
- Panasonic Corporation
- Kenji Noda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,538,005
- Issue date May 26, 2009
- Panasonic Corporation
- Kyoko Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing method
- Patent number 7,331,844
- Issue date Feb 19, 2008
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device with multilayered metal pattern
- Patent number 7,312,530
- Issue date Dec 25, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shin Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for feeding slurry
- Patent number 7,249,995
- Issue date Jul 31, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,190,045
- Issue date Mar 13, 2007
- Matsushita Electric Industrial Co., Ltd.
- Kyoko Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for feeding slurry
- Patent number 7,166,018
- Issue date Jan 23, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for feeding slurry
- Patent number 7,052,377
- Issue date May 30, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 7,037,371
- Issue date May 2, 2006
- Matsushita Electric Industrial Co., Ltd.
- Shin Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and its manufacturing method
- Patent number 6,995,415
- Issue date Feb 7, 2006
- Matsushita Electric Industrial Co., Ltd.
- Hisashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for feeding slurry
- Patent number 6,790,127
- Issue date Sep 14, 2004
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for feeding slurry
- Patent number 6,585,560
- Issue date Jul 1, 2003
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 6,562,716
- Issue date May 13, 2003
- Matsushita Electric Industrial Co., Ltd.
- Shin Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for wafer polishing and method for polishing-pad dressing
- Patent number 6,428,398
- Issue date Aug 6, 2002
- Matsushita Electric Industrial Co., Ltd.
- Shin Hashimoto
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor wafer package, method and apparatus for connecting te...
- Patent number 6,323,663
- Issue date Nov 27, 2001
- Matsushita Electric Industrial Co., Ltd.
- Yoshirou Nakata
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for feeding slurry
- Patent number 6,319,099
- Issue date Nov 20, 2001
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Grant
Method of polishing semiconductor wafer
- Patent number 6,291,350
- Issue date Sep 18, 2001
- Matsushita Electronics Corporation
- Shin Hashimoto
- B24 - GRINDING POLISHING
Information Patent Grant
Method for wafer polishing and method for polishing pad dressing
- Patent number 6,180,423
- Issue date Jan 30, 2001
- Matsushita Electronics Corporation
- Shin Hashimoto
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor wafer package, method and apparatus for connecting te...
- Patent number 6,005,401
- Issue date Dec 21, 1999
- Matsushita Electric Industrial Co., Ltd.
- Yoshirou Nakata
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor wafer package, method and apparatus for connecting te...
- Patent number 5,945,834
- Issue date Aug 31, 1999
- Matsushita Electric Industrial Co., Ltd.
- Yoshirou Nakata
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor integrated circuit device having failure detection ci...
- Patent number 5,892,368
- Issue date Apr 6, 1999
- Matsushita Electric Industrial Co., Ltd.
- Yoshiro Nakata
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor integrated circuit device
- Patent number 5,825,193
- Issue date Oct 20, 1998
- Matsushita Electric Industrial Co., Ltd.
- Yoshiro Nakata
- G01 - MEASURING TESTING
Information Patent Grant
Electroless plating bath used for forming a wiring of a semiconduct...
- Patent number 5,795,828
- Issue date Aug 18, 1998
- Matsushita Electric Industrial Co., Ltd.
- Masayuki Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electroless plating bath used for forming a wiring of a semiconduct...
- Patent number 5,645,628
- Issue date Jul 8, 1997
- Matsushita Electric Industrial Co., Ltd.
- Masayuki Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device having a dummy cell
- Patent number 5,641,699
- Issue date Jun 24, 1997
- Matsushita Electric Industrial Co., Ltd.
- Junji Hirase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing semiconductor device with viscous flow of silic...
- Patent number 5,584,964
- Issue date Dec 17, 1996
- Matsushita Electric Industrial Co., Ltd.
- Hiroyuki Umimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND PROCESS FOR MANUFACTURING THE SAME
- Publication number 20100048004
- Publication date Feb 25, 2010
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20090051007
- Publication date Feb 26, 2009
- Matsushita Electric Industrial Co., Ltd.
- Kyoko Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20080284026
- Publication date Nov 20, 2008
- Matsushita Electric Industrial Co., Ltd.
- Shin Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20070155147
- Publication date Jul 5, 2007
- Matsushita Electric Industrial Co., Ltd.
- Kyoko Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for feeding slurry
- Publication number 20060199480
- Publication date Sep 7, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Application
Photomask and method for forming pattern
- Publication number 20050074682
- Publication date Apr 7, 2005
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Kenji Noda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20050067707
- Publication date Mar 31, 2005
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Shin Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for feeding slurry
- Publication number 20050003745
- Publication date Jan 6, 2005
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20040253783
- Publication date Dec 16, 2004
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Kyoko Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for feeding slurry
- Publication number 20040242127
- Publication date Dec 2, 2004
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor device and its manufacturing method
- Publication number 20040137667
- Publication date Jul 15, 2004
- Hisashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for feeding slurry
- Publication number 20040132386
- Publication date Jul 8, 2004
- Matsushita Electric Industrial Co., Ltd.
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Application
Apparatus and method for feeding slurry
- Publication number 20020039878
- Publication date Apr 4, 2002
- Akihiro Tanoue
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20010003056
- Publication date Jun 7, 2001
- Shin Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for wafer polishing and method for polishing-pad dressing
- Publication number 20010000490
- Publication date Apr 26, 2001
- Matsushita Electronics Corporation
- Shin Hashimoto
- B24 - GRINDING POLISHING
Information Patent Application
Apparatus and method for feeding slurry
- Publication number 20010000166
- Publication date Apr 5, 2001
- Akihiro Tanoue
- B24 - GRINDING POLISHING

Shin Hashimoto

Person

Patents Grantslast 30 patents

Semiconductor device and method for manufacturing the same

Method for manufacturing semiconductor device using multiple ion im...

Semiconductor device and method for fabricating the same

Semiconductor device with multilayered metal pattern

Photomask and method for forming pattern

Semiconductor device and method for fabricating the same

Polishing method

Semiconductor device with multilayered metal pattern

Apparatus and method for feeding slurry

Semiconductor device and method for fabricating the same

Apparatus and method for feeding slurry

Apparatus and method for feeding slurry

Method for fabricating semiconductor device

Semiconductor device and its manufacturing method

Apparatus and method for feeding slurry

Apparatus and method for feeding slurry

Method for fabricating semiconductor device

Method for wafer polishing and method for polishing-pad dressing

Semiconductor wafer package, method and apparatus for connecting te...

Apparatus and method for feeding slurry

Method of polishing semiconductor wafer

Method for wafer polishing and method for polishing pad dressing

Semiconductor wafer package, method and apparatus for connecting te...

Semiconductor wafer package, method and apparatus for connecting te...

Semiconductor integrated circuit device having failure detection ci...

Semiconductor integrated circuit device

Electroless plating bath used for forming a wiring of a semiconduct...

Electroless plating bath used for forming a wiring of a semiconduct...

Method of manufacturing a semiconductor device having a dummy cell

Method of producing semiconductor device with viscous flow of silic...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND PROCESS FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Apparatus and method for feeding slurry

Photomask and method for forming pattern

Semiconductor device and method for fabricating the same

Apparatus and method for feeding slurry

Semiconductor device and method for fabricating the same

Apparatus and method for feeding slurry

Semiconductor device and its manufacturing method

Apparatus and method for feeding slurry

Apparatus and method for feeding slurry

Semiconductor device and method for fabricating the same

Method for wafer polishing and method for polishing-pad dressing

Apparatus and method for feeding slurry