Shingo Kadomura

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of etching insulating film and method of forming interconnec...
- Patent number 6,943,104
- Issue date Sep 13, 2005
- Sony Corporation
- Masanaga Fukasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aluminum nitride/aluminum base composite material and a method for...
- Patent number 6,805,973
- Issue date Oct 19, 2004
- Sony Corporation
- Shingo Kadomura
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Aluminum nitride/aluminum base composite material and method of pro...
- Patent number 6,668,905
- Issue date Dec 30, 2003
- Sony Corporation
- Shingo Kadomura
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Process for fabricating a semiconductor device having recess portion
- Patent number 6,645,852
- Issue date Nov 11, 2003
- Sony Corporation
- Mitsuru Taguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching insulating film and method of forming interconnec...
- Patent number 6,638,848
- Issue date Oct 28, 2003
- Sony Corporation
- Masanaga Fukasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
COMPOSITE MATERIAL AND MANUFACTURING METHOD THEREOF, SUBSTRATE PROC...
- Patent number 6,391,437
- Issue date May 21, 2002
- Sony Corporation
- Shingo Kadomura
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Interconnection structure and fabrication process therefor
- Patent number 6,380,065
- Issue date Apr 30, 2002
- Sony Corporation
- Naoki Komai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for stripping organic based film
- Patent number 6,352,937
- Issue date Mar 5, 2002
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing multi-layer wiring structure
- Patent number 6,191,031
- Issue date Feb 20, 2001
- Sony Corporation
- Mitsuru Taguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dry etching
- Patent number 6,174,408
- Issue date Jan 16, 2001
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing glass substrate
- Patent number 6,120,661
- Issue date Sep 19, 2000
- Sony Corporation
- Shinsuke Hirano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Helicon wave plasma processing apparatus
- Patent number 6,096,160
- Issue date Aug 1, 2000
- Sony Corporation
- Shingo Kadomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for dry etching with temperature control
- Patent number 6,063,710
- Issue date May 16, 2000
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,994,226
- Issue date Nov 30, 1999
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Static electricity chuck and wafer stage
- Patent number 5,981,913
- Issue date Nov 9, 1999
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer stage for manufacturing a semiconductor device
- Patent number 5,968,273
- Issue date Oct 19, 1999
- Sony Corporation
- Shingo Kadomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD process and semiconductor device having metal film forme...
- Patent number 5,962,084
- Issue date Oct 5, 1999
- Sony Corporation
- Takaaki Miyamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for plasma etching
- Patent number 5,738,752
- Issue date Apr 14, 1998
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method with controlled ion/radical ratio
- Patent number 5,662,819
- Issue date Sep 2, 1997
- Sony Corporation
- Shingo Kadomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interconnection forming method
- Patent number 5,599,742
- Issue date Feb 4, 1997
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for carrying out plasma proc...
- Patent number 5,567,268
- Issue date Oct 22, 1996
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,540,812
- Issue date Jul 30, 1996
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,429,710
- Issue date Jul 4, 1995
- Sony Corporation
- Hari Akiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,401,359
- Issue date Mar 28, 1995
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,401,358
- Issue date Mar 28, 1995
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,397,431
- Issue date Mar 14, 1995
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of ashing
- Patent number 5,393,374
- Issue date Feb 28, 1995
- Sony Corporation
- Junichi Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,391,244
- Issue date Feb 21, 1995
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method of GaAs
- Patent number 5,370,769
- Issue date Dec 6, 1994
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,366,590
- Issue date Nov 22, 1994
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of etching insulating film and method of forming interconnec...
- Publication number 20040043597
- Publication date Mar 4, 2004
- Masanaga Fukasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aluminum nitride/aluminum base composite material and a method for...
- Publication number 20040040687
- Publication date Mar 4, 2004
- Shingo Kadomura
- B22 - CASTING POWDER METALLURGY
Information Patent Application
Composite material manufacturing method thereof, substrate processi...
- Publication number 20020081445
- Publication date Jun 27, 2002
- Shingo Kadomura
- B32 - LAYERED PRODUCTS

Shingo Kadomura

Person

Patents Grantslast 30 patents

Method of etching insulating film and method of forming interconnec...

Aluminum nitride/aluminum base composite material and a method for...

Aluminum nitride/aluminum base composite material and method of pro...

Process for fabricating a semiconductor device having recess portion

Method of etching insulating film and method of forming interconnec...

COMPOSITE MATERIAL AND MANUFACTURING METHOD THEREOF, SUBSTRATE PROC...

Interconnection structure and fabrication process therefor

Method for stripping organic based film

Process for producing multi-layer wiring structure

Method and apparatus for dry etching

Apparatus for processing glass substrate

Helicon wave plasma processing apparatus

Method and apparatus for dry etching with temperature control

Dry etching method

Static electricity chuck and wafer stage

Wafer stage for manufacturing a semiconductor device

Plasma CVD process and semiconductor device having metal film forme...

System and method for plasma etching

Plasma processing method with controlled ion/radical ratio

Interconnection forming method

Plasma processing apparatus and method for carrying out plasma proc...

Dry etching method

Dry etching method

Dry etching method

Dry etching method

Dry etching method

Method of ashing

Dry etching method

Dry etching method of GaAs

Dry etching method

Patents Applicationslast 30 patents

Method of etching insulating film and method of forming interconnec...

Aluminum nitride/aluminum base composite material and a method for...

Composite material manufacturing method thereof, substrate processi...