Shinji Ishida

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photo mask and semiconductor device manufacturing method
- Patent number 7,183,128
- Issue date Feb 27, 2007
- NEC Electronics Corporation
- Shinji Tsuboi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method used in a thermal flow process...
- Patent number 6,864,021
- Issue date Mar 8, 2005
- NEC Electronics Corporation
- Haruo Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and pattern forming method used in a thermal flow process...
- Patent number 6,566,041
- Issue date May 20, 2003
- NEC Electronics Corporation
- Haruo Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and exposure method using a photomask
- Patent number 6,355,382
- Issue date Mar 12, 2002
- NEC Corporation
- Tadao Yasuzato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of exposure using same
- Patent number 6,150,059
- Issue date Nov 21, 2000
- NEC Corporation
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask used for projection exposure with phase shifted auxiliary...
- Patent number 6,004,699
- Issue date Dec 21, 1999
- NEC Corporation
- Tadao Yasuzato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting mask, exposure method and method for measuring amoun...
- Patent number 5,935,738
- Issue date Aug 10, 1999
- NEC Corporation
- Tadao Yasuzato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting photomask with two different transparent regions
- Patent number 5,908,718
- Issue date Jun 1, 1999
- NEC Corporation
- Shinji Ishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction halftone type phase shift photomask
- Patent number 5,827,623
- Issue date Oct 27, 1998
- NEC Corporation
- Shinji Ishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 5,792,596
- Issue date Aug 11, 1998
- NEC Corporation
- Tadao Yasuzato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-volatile semiconductor memory having a memory cell array divide...
- Patent number 5,774,398
- Issue date Jun 30, 1998
- NEC Corporation
- Shinji Ishida
- G11 - INFORMATION STORAGE
Information Patent Grant
Photo mask and fabrication process therefor
- Patent number 5,750,290
- Issue date May 12, 1998
- NEC Corporation
- Tadao Yasuzato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROJECT MANAGEMENT DEVICE, PROJECT MANAGEMENT METHOD, AND RECORDING...
- Publication number 20230385770
- Publication date Nov 30, 2023
- JGC CORPORATION
- Hisayasu KAJI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GAME MACHINE
- Publication number 20090291725
- Publication date Nov 26, 2009
- KONAMI DIGITAL ENTERTAINMENT CO., LTD.
- Shinji Ishida
- G07 - CHECKING-DEVICES
Information Patent Application
Photo mask and semiconductor device manufacturing method
- Publication number 20030124759
- Publication date Jul 3, 2003
- NEC ELECTRONICS CORPORATION
- Shinji Tsuboi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method used in a thermal flow process...
- Publication number 20030104289
- Publication date Jun 5, 2003
- Haruo Iwasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method used in a thermal flow process...
- Publication number 20030104290
- Publication date Jun 5, 2003
- Haruo Iwasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for rescuing levenson phase shift mask from abnormal differe...
- Publication number 20020058188
- Publication date May 16, 2002
- NEC Corporation
- Haruo Iwasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method used in a thermal flow process...
- Publication number 20010007732
- Publication date Jul 12, 2001
- NEC Corporation
- Haruo Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS

Shinji Ishida

Person

Patents Grantslast 30 patents

Photo mask and semiconductor device manufacturing method

Photomask and pattern forming method used in a thermal flow process...

Photomask and pattern forming method used in a thermal flow process...

Photomask and exposure method using a photomask

Photomask and method of exposure using same

Photomask used for projection exposure with phase shifted auxiliary...

Phase-shifting mask, exposure method and method for measuring amoun...

Phase shifting photomask with two different transparent regions

Optical proximity correction halftone type phase shift photomask

Pattern forming method

Non-volatile semiconductor memory having a memory cell array divide...

Photo mask and fabrication process therefor

Patents Applicationslast 30 patents

PROJECT MANAGEMENT DEVICE, PROJECT MANAGEMENT METHOD, AND RECORDING...

GAME MACHINE

Photo mask and semiconductor device manufacturing method

Photomask and pattern forming method used in a thermal flow process...

Photomask and pattern forming method used in a thermal flow process...

Method for rescuing levenson phase shift mask from abnormal differe...

Photomask and pattern forming method used in a thermal flow process...